Abstract: A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.

Abstract: A method for operating a vehicle equipped for an automated driving operation. In a regular operating mode of the automated driving operation the vehicle is guided to a target position in an automated manner by a main control device, and in an emergency operating mode of the automated driving operation, it is moved into a safe stopping position in an automated manner by an auxiliary control device. A functional readiness of the auxiliary control device is continuously checked by the main control device. Depending on the checked functional readiness, a decision is made regarding whether a release for the automated driving operation should be granted or withdrawn. The automated driving operation is exclusively activated when the release has been granted, and is deactivated when the release is withdrawn.

Abstract: A method of operating at least one solid-state actuator in a microlithographic projection exposure apparatus comprises the following steps: requesting a target variable for the at least one solid-state actuator; ascertaining a control variable using a stored or storable correction model, the correction model comprising a correction function for creep; and actuating the at least one solid-state actuator using the control variable and switching the at least one solid-state actuator from a switched-off state into a switched-on state by feeding energy from an energy source.

Abstract: An adaptive optical module has at least one actuator for altering a shape of an optical surface of the optical module. The actuator comprises: a dielectric medium, which is deformable via an electric field, and electrodes for generating the electric field in the dielectric medium by applying an electrical working voltage. The adaptive optical module further comprises a measuring device that measures an impedance present at different values of the working voltage between the electrodes depending on a frequency of an AC voltage applied to the electrodes for measurement purposes, and an evaluation device configured to ascertain from the measured impedance approximately a respective gradient value of characteristic curves each representing a capacitance of the actuator depending on the frequency for the different values of the working voltage and to determine therefrom a deflection of the actuator at at least one operating point of the working voltage.

Abstract: An adaptive optical module for a microlithographic projection exposure apparatus comprises at least one actuator for modifying an optical surface of the optical module. The actuator comprises a dielectric medium that is deformable via an electric field and electrodes for creating the electric field in the dielectric medium by applying a working voltage. Furthermore, the adaptive optical module comprises a measuring device configured to measure an electric charge located on the electrodes when the working voltage is applied, and a processing device configured to use the charge measurement to determine a quantity relating to a displacement of the actuator. The measuring device comprises a measuring capacitor and a voltage measuring unit and is configured to determine the electric charge on the electrodes by way of a voltage measurement. The voltage measuring unit is configured to perform the voltage measurement at the measuring capacitor.

Abstract: An optical assembly for semiconductor lithography comprises an optical element and an actuator for deforming the optical element. The actuator is constructed from at least three sections, which include at least first and second group of sections that are controllable in each case via a controller are present. The first group serves for coarse actuation, and the second group serves for fine actuation. The controller is configured to control the groups independently of one another and the sections of a group jointly. The controller is furthermore configured to variably set the number of sections controlled jointly per group. Furthermore, the disclosure relates to a projection exposure apparatus equipped with the assembly, and to a method for controlling the optical assembly.

Abstract: An optical system, such as in a microlithographic projection exposure apparatus, comprising at least one optical element and a heating device for heating the optical element. The heating device comprises a plurality of heating segments to which electric current can be applied in order to generate heat. A continuous thermally induced deformation profile of the optical active surface having a deformation amplitude of at least 1? can be adjusted by the heating segments so that the integral of the Fourier decomposition over at least one decadic spatial wavelength range is less than 10 m?.

Abstract: A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

Abstract: A mirror device, such as for a microlithographic projection exposure system, comprises a mirror, a sensor unit and a control unit. The mirror comprises a mirror body and a reflective surface provided on the mirror body. The sensor unit comprises a sensor element and a signal path extending to the control unit to transmit a measurement signal representing the temperature of the sensor element to the control unit. The sensor element is provided in the substrate of the mirror body. The sensor element comprises a plurality of electrical conductor paths integrated in the substrate of the mirror body. The conductor paths form a plurality of crossing points electrically conductively connecting the conductor paths to one another.

Abstract: An optical assembly of a projection exposure apparatus for semiconductor lithography comprises an optical element and an actuator for deforming the optical element. The actuator is subjected to a bias voltage by a controller that is present. A projection exposure apparatus for semiconductor lithography comprises an optical assembly. A method for operating an actuator for deforming an optical element for semiconductor lithography comprises subjecting the actuator to a bias voltage by a controller.

Abstract: An optical element for a projection exposure apparatus for semiconductor lithography comprises a main body and at least two actuators connected to the main body. The actuators are designed for deforming an optical effective surface of the optical element. The at least two actuators are ring actuators. A corresponding apparatus comprises such an optical element.

Abstract: A method for driving an actuator for a component of a projection exposure apparatus for semiconductor lithography comprises: characterizing the actuator; parameterizing an actuator model; implementing the actuator model in a control structure; and driving the in actuator using the actuator model.

Abstract: The invention relates to a method for operating a braiding, winding or spiraling machine for braiding around, wrapping around or spiraling around a strand-like material, in particular a cable, with at least one elongate material strand formed from at least one elongate material fibre, in particular from at least one wire. In the method, a diameter of the strand-like material is measured and a feed rate of the strand-like material and/or a rotational speed at which the at least one elongate material strand moves about the longitudinal axis of the strand-like material is controlled by open-loop or closed-loop control depending on said diameter measured. A predefined degree of coverage of the strand-like material by the at least one elongate material strand can be kept substantially constant by means of an open-loop or closed-loop control of the relative feed rate of the strand-like material depending on the diameter measured.

Abstract: An optical system comprises at least one mirror having a mirror body and a mirror surface, and at least one actuator device coupled to the mirror body and serving for deforming the mirror surface. The actuator device comprises at least one electrostrictive actuator element for generating a mechanical stress in the mirror body for deforming the mirror surface depending on an electrical drive voltage, and at least one electrostrictive sensor element for outputting a sensor signal depending on a deformation of the sensor element. The at least one sensor element is arranged directly adjacent to the actuator element and/or is arranged in such a way that it is configured at least partly for transferring the mechanical stress generated by the actuator element to the mirror body.

Abstract: A method for operating a vehicle equipped for an automated driving operation. In a regular operating mode of the automated driving operation the vehicle is guided to a target position in an automated manner by a main control device, and in an emergency operating mode of the automated driving operation, it is moved into a safe stopping position in an automated manner by an auxiliary control device. A functional readiness of the auxiliary control device is continuously checked by the main control device. Depending on the checked functional readiness, a decision is made regarding whether a release for the automated driving operation should be granted or withdrawn. The automated driving operation is exclusively activated when the release has been granted, and is deactivated when the release is withdrawn.

Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

Abstract: An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.

Abstract: A projection exposure apparatus comprises an optical element. The optical element comprises a main body and an actuator for deforming an optically effective surface formed on the main body. The actuator is in a recess in the rear side of the main body.

Abstract: A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.

Abstract: An adaptive optical element for microlithography comprises at least one manipulator for changing the shape of an optical surface of the optical element. The manipulator comprises a dielectric medium which is deformable via an electric field, work electrodes for generating the electric field in the dielectric medium, and a measuring electrode for measuring temperature. The measuring electrode is arranged in a direct assemblage with the dielectric medium. The measuring electrode has a temperature-dependent resistance.