Patents by Inventor Markus Rolf Werner MATTHES

Markus Rolf Werner MATTHES has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Patent number: 10268128
    Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: April 23, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph Janssen, Johannes Paul Marie De La Rosette, Edwin Cornelis Kadijk, Nicolas Alban Lallemant, Jan Liefooghe, Markus Rolf Werner Matthes, Marcel Johannus Elisabeth Hubertus Muitjens, Hubert Matthieu Richard Steijns, André Gillis Van De Velde, Marinus Aart Van Den Brink
  • Lithographic Apparatus
    Publication number: 20180196361
    Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam, a support structure constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto the substrate, the lithographic apparatus being provided with a first cooling fluid circuit which is configured to cool components to a first temperature, and provided with a second cooling fluid circuit which is configured to cool components to a second temperature that is lower than the first temperature.
    Type: Application
    Filed: June 14, 2016
    Publication date: July 12, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Franciscus Johannes Joseph JANSSEN, Johannes Paul Marie DE LA ROSETTE, Edwin Cornelis KADIJK, Nicolas Alban LALLEMANT, Jan LIEFOOGHE, Markus Rolf Werner MATTHES, Marcel Johannus Elisabeth MUITJENS, Hubert Matthieu Richard STEIJNS, André Gillis VAN DE VELDE, Marinus Aart VAN DEN BRINK