Patents by Inventor Markus Seibel

Markus Seibel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4842982
    Abstract: Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.
    Type: Grant
    Filed: June 9, 1987
    Date of Patent: June 27, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Markus Seibel, Guenther Kaempf
  • Patent number: 4783247
    Abstract: Method and manufacture for electrically insulating base material used for perforated plated-through printed circiut panels with a metal core. The method includes applying a radiation-curable layer of insulating material to the preperforated metal core by an electrostatic spray method and precuring by irradiation or heat, coating with a further thin, thermally curable layer of insulating material by electrophoresis, drying the layer by heating and likewise partially curing it so that it is no longer capable of flowing, but yet is still reactive, optionally applying further curable insulating layers, and finally, fully thermally curing the entire coating of insulating material. The coatings obtained are impervious and are of uniform thickness even at the hole walls.
    Type: Grant
    Filed: May 15, 1986
    Date of Patent: November 8, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Markus Seibel
  • Patent number: 4770900
    Abstract: A process for the manufacture of through-hole plated electric printed-circuit boards is described, in which a board of an insulating material is provided with plated-through holes which are arranged in a grid pattern and the walls of which are coated with a conductive metal layer. The board is covered with a conductive metal layer on at least one side thereof. After metallizing the holes, the metal layer is covered imagewise and the areas of the metal layer which are not covered are either reinforced by metal deposition or removed by etching. Together with the metal layer, part of the holes are covered in such a way that only the required portion of all holes act as conductive connections in the final product. The process of the present invention permits the large-scale manufacture of a predrilled or prepunched and premetallized base material for printed circuits.
    Type: Grant
    Filed: March 16, 1987
    Date of Patent: September 13, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Markus Seibel
  • Patent number: 4389480
    Abstract: This invention relates to an improvement in a light-sensitive layer transfer material comprising a temporary film support and a light-sensitive thermoplastic photoresist layer detachably connected therewith, the improvement being that the underside of the film support has a lower adhesion to the photoresist layer than its upper side. The invention also relates to a process for transferring a light-sensitive photoresist layer from a temporary to a permanent support.
    Type: Grant
    Filed: January 12, 1981
    Date of Patent: June 21, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Werner Franke, Markus Seibel
  • Patent number: 4387148
    Abstract: An electrophotographic recording material comprising an electrically conductive support, a photoconductor layer and an about 1 to about 50 .mu.m thick protective layer comprising a radiation-hardened, crosslinked polyester which is formed from trimethylol propane, adipic acid and acrylic acid and which has a surface resistance ranging from about 5.5.multidot.10.sup.12 to about 2.5.multidot.10.sup.13 ohm and a volume resistivity ranging from about 7.multidot.10.sup.10 to about 5.multidot.10.sup.13 ohm cm, measured at 23.degree. C. and 50 percent relative humidity, and a process for producing such a recording material.
    Type: Grant
    Filed: August 17, 1981
    Date of Patent: June 7, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Werner Franke, Markus Seibel, Richard Brahm, Hans Trittler
  • Patent number: 4339520
    Abstract: A light-sensitive vesicular recording material comprising a support and a layer comprised of a binder and a light-sensitive compound applied to the support, said binder comprising a butanone soluble copolymer of methacrylonitrile and vinylidene chloride; particularly, a mixture of a butanone soluble methacrylonitrile/vinylidene chloride copolymer and a vinylidene chloride/acrylonitrile copolymer, said copolymers being miscible with each other in butanone.
    Type: Grant
    Filed: March 31, 1981
    Date of Patent: July 13, 1982
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Markus Seibel, Bernd Huber, Irmgard Bindrum, Dieter Bodenheimer