Patents by Inventor Markus Thomann

Markus Thomann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen
    Patent number: 11495433
    Abstract: A charged particle beam apparatus for inspecting a specimen with a plurality of beamlets is described. The charged particle beam apparatus includes a charged particle beam emitter (105) for generating a charged particle beam (11) propagating along an optical axis (A) and a multi-beamlet generation- and correction-assembly (120), including a first multi-aperture electrode (121) with a first plurality of apertures for creating the plurality of beamlets from the charged particle beam, at least one second multi-aperture electrode (122) with a second plurality of apertures of varying diameters for the plurality of beamlets for providing a field curvature correction, and a plurality of multipoles (123) for individually influencing each of the plurality of beamlets, wherein the multi-beamlet generation- and correction-assembly (120) is configured to focus the plurality of beamlets to provide a plurality of intermediate beamlet crossovers.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: November 8, 2022
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventors: Benjamin John Cook, Dieter Winkler, Markus Thomann, Thomas Kemen, Roman Barday
  • CHARGED PARTICLE BEAM APPARATUS, MULTI-BEAMLET ASSEMBLY, AND METHOD OF INSPECTING A SPECIMEN
    Publication number: 20220336186
    Abstract: A charged particle beam apparatus for inspecting a specimen with a plurality of beamlets is described. The charged particle beam apparatus includes a charged particle beam emitter (105) for generating a charged particle beam (11) propagating along an optical axis (A) and a multi-beamlet generation- and correction-assembly (120), including a first multi-aperture electrode (121) with a first plurality of apertures for creating the plurality of beamlets from the charged particle beam, at least one second multi-aperture electrode (122) with a second plurality of apertures of varying diameters for the plurality of beamlets for providing a field curvature correction, and a plurality of multipoles (123) for individually influencing each of the plurality of beamlets, wherein the multi-beamlet generation- and correction-assembly (120) is configured to focus the plurality of beamlets to provide a plurality of intermediate beamlet crossovers.
    Type: Application
    Filed: April 15, 2021
    Publication date: October 20, 2022
    Inventors: Benjamin John Cook, Dieter Winkler, Markus Thomann, Thomas Kemen, Roman Barday