Patents by Inventor Markus Tilsch

Markus Tilsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080006529
    Abstract: A device for mounting and removing a substrate from a baseplate, in particular a substrate holder assembly device, including automated features for latching and unlatching a substrate, for use in a coating mechanism, from a baseplate, which includes an adjustable snap ring holder.
    Type: Application
    Filed: September 7, 2007
    Publication date: January 10, 2008
    Applicant: JDS Uniphase Corporation
    Inventors: Richard Seddon, Russell Barbaria, Ralf Erz, Markus Tilsch
  • Publication number: 20060081468
    Abstract: The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic, which is moveable between a latching position, in which the permanent magnet magnetizes the latch for attracting a substrate holder, and an unlatching position, in which the permanent magnet is connected in a bypass circuit, thereby demagnetizing the latch for releasing the substrate holder.
    Type: Application
    Filed: October 19, 2004
    Publication date: April 20, 2006
    Applicant: JDS Uniphase Corporation
    Inventors: Richard Seddon, Markus Tilsch, Jeremy Hayes
  • Publication number: 20060070877
    Abstract: The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized increased production by reducing cycle time. Increased coating rates are achieved by coupling a planetary drive system with a large cathode. The cathode diameter is greater than the diameter of a planet and less than twice the diameter of the planet. Lower defect rates are obtained through the lower power density at the cathode which suppresses arcing, while runoff is minimized by the cathode to planet geometry without the use of a mask.
    Type: Application
    Filed: August 17, 2005
    Publication date: April 6, 2006
    Applicant: JDS Uniphase Corporation, State of Incorporation: Delaware
    Inventors: Markus Tilsch, Richard Seddon, Georg Ockenfuss, Jeremy Hayes, Robert Klinger
  • Publication number: 20060049042
    Abstract: A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
    Type: Application
    Filed: July 8, 2005
    Publication date: March 9, 2006
    Applicant: JDS Uniphase Corporation
    Inventors: Markus Tilsch, Georg Ockenfuss, Richard Seddon, Robert Hahn
  • Publication number: 20060049041
    Abstract: A sputtering anode is disclosed wherein the anode is in the form of a container or vessel; and, wherein the conducting surface communicating with a cathode is the inside surface of the container or vessel. The anode can be mounted outside of a coating chamber having its opening communicating with the chamber or alternatively may be mounted within the chamber. The anode may be an inlet port for receiving inert gas for use in forming the plasma and for pressurizing the anode.
    Type: Application
    Filed: March 7, 2005
    Publication date: March 9, 2006
    Applicant: JDS Uniphase Corporation
    Inventors: Georg Ockenfuss, Markus Tilsch, Richard Seddon, Robert Hahn
  • Patent number: 6721100
    Abstract: Thin film filters have been a basic building block of many wavelength division multiplexed (WDM) systems providing the means by which a signal, defined by a center wavelength, can be separated from a group of WDM signals. In an effort to maintain the same performance over a range of operating temperatures, thin film filters have been coated onto specially designed substrates, which expand and contract with the change in temperature to counteract the effects that the temperature change has on the thin film filters. Unfortunately, only very few materials provide the necessary thermal expansion characteristics to counteract the shift in center wavelength. Moreover, the application of a force onto only one side of the filter causes the thin film filter to bend or curve. Accordingly, the present invention solves the aforementioned problems by providing a thin film filter sandwiched between a substrate and a superstrate, which apply equal forces to each side of the filter.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: April 13, 2004
    Assignee: JDS Uniphase Corporation
    Inventor: Markus Tilsch
  • Publication number: 20030086176
    Abstract: Thin film filters have been a basic building block of many wavelength division multiplexed (WDM) systems providing the means by which a signal, defined by a center wavelength, can be separated from a group of WDM signals. In an effort to maintain the same performance over a range of operating temperatures, thin film filters have been coated onto specially designed substrates, which expand and contract with the change in temperature to counteract the effects that the temperature change has on the thin film filters. Unfortunately, only very few materials provide the necessary thermal expansion characteristics to counteract the shift in center wavelength. Moreover, the application of a force onto only one side of the filter causes the thin film filter to bend or curve. Accordingly, the present invention solves the aforementioned problems by providing a thin film filter sandwiched between a substrate and a superstrate, which apply equal forces to each side of the filter.
    Type: Application
    Filed: July 19, 2002
    Publication date: May 8, 2003
    Inventor: Markus Tilsch