Patents by Inventor Marlene Strobl

Marlene Strobl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7419549
    Abstract: The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: September 2, 2008
    Assignees: Steag HamaTech APE GmbH & Co. KG, Infineon Technologies AG
    Inventors: Anatol Schwersenz, Werner Saule, Andreas Nöring, Peter Dress, Christian Bürgel, Martin Tschinkl, Marlene Strobl
  • Patent number: 7310129
    Abstract: The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.
    Type: Grant
    Filed: September 24, 2004
    Date of Patent: December 18, 2007
    Assignee: Infineon Technologies, AG
    Inventors: Jens Stäcker, Heiko Hommen, Jens Uwe Bruch, Marlene Strobl, Karl Schumacher
  • Publication number: 20050220931
    Abstract: The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
    Type: Application
    Filed: July 10, 2003
    Publication date: October 6, 2005
    Inventors: Anatol Schwersenz, Werner Saule, Andreas Noring, Peter Dress, Christian Burgel, Martin Tschinkl, Marlene Strobl
  • Publication number: 20050105073
    Abstract: The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.
    Type: Application
    Filed: September 24, 2004
    Publication date: May 19, 2005
    Inventors: Jens Stacker, Heiko Hommen, Jens Bruch, Marlene Strobl, Karl Schumacher
  • Patent number: 6852473
    Abstract: A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: February 8, 2005
    Assignees: Infineon Technologies Richmond, LP, Brewer Science Incorporated
    Inventors: William Roberts, Marlene Strobl, Paul Williams, Douglas J. Guerrero, Alice F. Martin
  • Publication number: 20040058278
    Abstract: A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent.
    Type: Application
    Filed: April 28, 2003
    Publication date: March 25, 2004
    Applicants: Infineon Technologies Richmond, LP, Brewer Science Incorporated
    Inventors: William Roberts, Marlene Strobl, Paul Williams, Douglas J. Guerrero, Alice F. Martin
  • Publication number: 20020015910
    Abstract: A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent.
    Type: Application
    Filed: January 9, 2001
    Publication date: February 7, 2002
    Inventors: William Roberts, Marlene Strobl