Patents by Inventor Marshal A. Miller

Marshal A. Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process-metrology reproducibility bands for lithographic photomasks
    Patent number: 10210292
    Abstract: A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
    Type: Grant
    Filed: December 12, 2017
    Date of Patent: February 19, 2019
    Assignee: International Business Machines Corporation
    Inventors: Todd C. Bailey, Ioana C. Graur, Scott D. Halle, Marshal A. Miller
  • PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
    Publication number: 20180101630
    Abstract: A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
    Type: Application
    Filed: December 12, 2017
    Publication date: April 12, 2018
    Inventors: Todd C. Bailey, Ioana C. Graur, Scott D. Halle, Marshal A. Miller
  • Process-metrology reproducibility bands for lithographic photomasks
    Patent number: 9928316
    Abstract: A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: March 27, 2018
    Assignee: International Business Machines Corporation
    Inventors: Todd C. Bailey, Ioana C. Graur, Scott D. Halle, Marshal A. Miller
  • PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
    Publication number: 20160283617
    Abstract: A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.
    Type: Application
    Filed: March 26, 2015
    Publication date: September 29, 2016
    Inventors: Todd C. Bailey, Ioana C. Graur, Scott D. Halle, Marshal A. Miller