Patents by Inventor Marshall B. Grill

Marshall B. Grill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240028055
    Abstract: A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
    Type: Application
    Filed: October 5, 2023
    Publication date: January 25, 2024
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Joseph Penley, Michael Maeder, Patti J. Mudd, Zachariah Ezekiel McIntyre, Tyler James Wright, Matthew Eric Kovacic, Christopher Bryant Davis
  • Publication number: 20220004209
    Abstract: A gas flow control system for delivering a plurality of gas flows. The gas flow control system has a gas flow path extending from a gas inlet to first and second gas outlets. First and second flow restrictors are operably coupled to the gas flow path. First and second valves are operably coupled to the gas flow path such that when both first and second valves are in a fully open state, flows of gas from the first and second gas outlets are split according to the impedances of the first and second flow restrictors.
    Type: Application
    Filed: September 7, 2021
    Publication date: January 6, 2022
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Joseph Penley, Michael Maeder, Patti J. Mudd, Zachariah Ezekiel McIntyre, Tyler James Wright, Matthew Eric Kovacic, Christopher Bryant Davis
  • Patent number: 11144075
    Abstract: A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The third flow component mounting region has a first sensing port fluidly coupled to the gas outlet of the monolithic base.
    Type: Grant
    Filed: September 21, 2020
    Date of Patent: October 12, 2021
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Penley, Michael Maeder, Patti J. Mudd
  • Publication number: 20210004027
    Abstract: A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The third flow component mounting region has a first sensing port fluidly coupled to the gas outlet of the monolithic base.
    Type: Application
    Filed: September 21, 2020
    Publication date: January 7, 2021
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Penley, Michael Maeder, Patti J. Mudd, Zachariah Ezekiel McIntyre, Tyler James Wright, Matthew Eric Kovacic, Christopher Bryant Davis
  • Patent number: 10838437
    Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, an apparatus for controlling gas flow is disclosed, the apparatus delivering two gas flows at a known ratio. Specifically, the apparatus has first and second on/off valves and first and second flow restrictors. The first and second on/off valves may be altered between an open state and a closed state. When both the first and second on/off valves are in an open state, first and second gas flows are delivered to first and second outlets. The first and second gas flows are provided at a known ratio to one another, this ratio determined by the ratio of the resistance to flow of the first and second flow restrictors.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: November 17, 2020
    Assignee: ICHOR SYSTEMS, INC.
    Inventors: Sean Penley, Marshall B Grill
  • Patent number: 10782710
    Abstract: A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The second flow component mounting region has a second inlet port, a second outlet port, and a first auxiliary port.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: September 22, 2020
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II
  • Publication number: 20190258279
    Abstract: Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, an apparatus for controlling gas flow is disclosed, the apparatus delivering two gas flows at a known ratio. Specifically, the apparatus has first and second on/off valves and first and second flow restrictors. The first and second on/off valves may be altered between an open state and a closed state. When both the first and second on/off valves are in an open state, first and second gas flows are delivered to first and second outlets. The first and second gas flows are provided at a known ratio to one another, this ratio determined by the ratio of the resistance to flow of the first and second flow restrictors.
    Type: Application
    Filed: February 22, 2019
    Publication date: August 22, 2019
    Applicant: Reno Technologies, Inc.
    Inventors: Sean Penley, Marshall B. Grill
  • Publication number: 20190243393
    Abstract: A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The second flow component mounting region has a second inlet port, a second outlet port, and a first auxiliary port.
    Type: Application
    Filed: April 15, 2019
    Publication date: August 8, 2019
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II
  • Patent number: 10303189
    Abstract: In one embodiment, a modular method of making mass flow controllers for delivery of a plurality of process gases includes providing a plurality of monolithic bases, each of the monolithic bases having a plurality of flow component mounting regions. A first set of flow components are coupled to the flow component mounting regions of a first of the monolithic bases to form a mass flow controller having a first set of operating characteristics. A second set of flow components are coupled to the flow component mounting regions of a second of the monolithic bases to form a mass flow controller having a second set of operating characteristics which are different from the first set of operating characteristics.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: May 28, 2019
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II
  • Publication number: 20180004235
    Abstract: In one embodiment, a modular method of making mass flow controllers for delivery of a plurality of process gases includes providing a plurality of monolithic bases, each of the monolithic bases having a plurality of flow component mounting regions. A first set of flow components are coupled to the flow component mounting regions of a first of the monolithic bases to form a mass flow controller having a first set of operating characteristics. A second set of flow components are coupled to the flow component mounting regions of a second of the monolithic bases to form a mass flow controller having a second set of operating characteristics which are different from the first set of operating characteristics.
    Type: Application
    Filed: June 30, 2017
    Publication date: January 4, 2018
    Inventors: Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II