Patents by Inventor Marteijn De Jong

Marteijn De Jong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8514365
    Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: August 20, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
  • Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
    Patent number: 7804582
    Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: September 28, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080297744
    Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
    Type: Application
    Filed: June 1, 2007
    Publication date: December 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
  • Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method
    Publication number: 20080024748
    Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.
    Type: Application
    Filed: July 28, 2006
    Publication date: January 31, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
  • Picture display device with reduced deflection power
    Patent number: 6720725
    Abstract: A picture display device comprising a cathode ray tube (1) with an elongated display screen (8) and a deflection system (9) is described. The deflection power is reduced by two means. The deflection system (9) is arranged to scan the lines in the direction of the short axis (22) of the display screen (8), and the cone portion (3) of the cathode ray tube (1) has an elongated cross-section (54) whose aspect ratio is larger than or equal to the aspect ratio of the display screen (8), thereby enabling the deflection system (9), and in particular the line deflection subsystem (12), to be positioned closer to the electron beam envelope (51), which reduces magnetic losses.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: April 13, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Marteijn De Jong, Marcellinus Petrus Carolus Michael Krijn, Pim Theo Tuyls, Boris Skoric, Michel Cornelis Josephus Marie Vissenberg
  • Picture display device with reduced deflection power
    Publication number: 20020063508
    Abstract: A picture display device comprising a cathode ray tube (1) with an elongated display screen (8) and a deflection system (9) is described. The deflection power is reduced by two means. The deflection system (9) is arranged to scan the lines in the direction of the short axis (22) of the display screen (8), and the cone portion (3) of the cathode ray tube (1) has an elongated cross-section (54) whose aspect ratio is larger than or equal to the aspect ratio of the display screen (8), thereby enabling the deflection system (9), and in particular the line deflection subsystem (12), to be positioned closer to the electron beam envelope (51), which reduces magnetic losses.
    Type: Application
    Filed: November 27, 2001
    Publication date: May 30, 2002
    Applicant: KONINKLIJKE PHILIPS ELECTRONIC N.V.
    Inventors: Marteijn De Jong, Marcellinus Petrus Carolus Michael Krijn, Pim Theo Tuyls, Boris Skoric, Michel Cornelis Josephus Marie Vissenberg
  • Compensation of CRT deflection errors with fourfold symmetrical magnet systems
    Patent number: 6388402
    Abstract: Color picture display device comprising a cathode ray tube and a deflection unit. The picture display device comprises compensation means for compensating picture errors. The compensation means is arranged on a side of a deflection unit facing the display screen and comprises four magnet systems which are arranged fourfold symmetrically with respect to the tube axis and extend through an angle &agr; ranging between 24 and 34 degrees or between 40 and 48 degrees.
    Type: Grant
    Filed: October 7, 1999
    Date of Patent: May 14, 2002
    Assignee: U.S. Philips Corporation
    Inventors: Marteijn De Jong, Ewoud Vreugdenhil, Jacobus H. T. Jamar