Patents by Inventor Martha I. Sanchez

Martha I. Sanchez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11500285
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: November 15, 2022
    Assignee: International Business Machines Corporation
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Publication number: 20200278607
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Application
    Filed: October 11, 2018
    Publication date: September 3, 2020
    Applicants: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Patent number: 10345700
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: July 9, 2019
    Assignees: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Publication number: 20160070169
    Abstract: A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
    Type: Application
    Filed: September 8, 2014
    Publication date: March 10, 2016
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders, Ratnam Sooriyakumaran, Linda K. Sundberg, Satoshi Watanabe
  • Patent number: 7079223
    Abstract: A method and system is provided for computing lithographic images that may take into account non-scalar effects such as lens birefringence, resist stack effects, tailored source polarizations, and blur effects of the mask and the resist. A generalized bilinear kernel is formed, which is independent of the mask transmission function, and which may then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Weighted pre-images may be formed from a coherent sum of pre-computed convolutions of the dominant eigenfunctions of the generalized bilinear kernel with the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: July 18, 2006
    Assignee: International Business Machines Corporation
    Inventors: Alan E. Rosenbluth, Gregg M. Gallatin, Ronald L. Gordon, Nakgeuon Seong, Alexey Y. Lvov, William D. Hinsberg, John A. Hoffnagle, Frances A. Houle, Martha I. Sanchez
  • Patent number: 5633034
    Abstract: The invention relates to a process for forming a circuit assembly comprising (i) coating onto a substrate a layer of polyamic ester selected from a unique class of polyamic esters; (ii) imidizing the polyamic ester to form a layer of polyimide having an even surface and (iii) forming circuit conductors on the even surface of the polyimide.
    Type: Grant
    Filed: May 9, 1996
    Date of Patent: May 27, 1997
    Assignee: International Business Machines Corporation
    Inventors: Kenneth R. Carter, Richard A. DiPietro, James L. Hedrick, John P. Hummel, Robert D. Miller, Martha I. Sanchez, Willi Volksen, Do Y. Yoon
  • Patent number: 5310625
    Abstract: The present invention relates to an improved process for forming negative tone images of photosensitive polyimides on a substrate having improved wall angles.
    Type: Grant
    Filed: August 3, 1993
    Date of Patent: May 10, 1994
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Daniel G. Berger, Jeffrey W. Labadie, Eric D. Perfecto, Martha I. Sanchez, Sally A. Swanson, Willi Volksen