Patents by Inventor Martha M. Rajaratnam
Martha M. Rajaratnam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9443713Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: GrantFiled: July 1, 2014Date of Patent: September 13, 2016Assignee: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Publication number: 20150000697Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: ApplicationFiled: July 1, 2014Publication date: January 1, 2015Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Patent number: 8765654Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: GrantFiled: April 11, 2011Date of Patent: July 1, 2014Assignee: Advanced Technology Materials, Inc.Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Publication number: 20110186086Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: ApplicationFiled: April 11, 2011Publication date: August 4, 2011Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Patent number: 7922824Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: GrantFiled: October 4, 2006Date of Patent: April 12, 2011Assignee: Advanced Technology Materials, Inc.Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Publication number: 20090215658Abstract: An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon.Type: ApplicationFiled: October 4, 2006Publication date: August 27, 2009Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: David W. Minsek, Michael B. Korzenski, Martha M. Rajaratnam
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Publication number: 20090032766Abstract: A gate spacer oxide material removal composition and process for at least partial removal of gate spacer oxide material from a microelectronic device having same thereon. The anhydrous removal composition includes at least one organic solvent, at least one chelating agent, a base fluoride:acid fluoride component, and optionally at least one passivator. The composition achieves the selective removal of gate spacer oxide material relative to polysilicon and silicon nitride from the vicinity of the gate electrode on the surface of the microelectronic device with minimal etching of metal silicide interconnect material species employed in the gate electrode architecture.Type: ApplicationFiled: October 4, 2006Publication date: February 5, 2009Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Martha M. Rajaratnam, David D. Bernhard, David W. Minsek
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Publication number: 20020012869Abstract: The invention provides novel cross-linked polymers and positive chemically-amplified photoresist compositions that comprise a photoactive component and such crosslinked polymers. Resists of the invention can exhibit enhanced lithographic results relative to comparable compositions where the polymers are not crosslinked.Type: ApplicationFiled: February 9, 2001Publication date: January 31, 2002Applicant: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Martha M. Rajaratnam, Ashish A. Pandya, Roger F. Sinta, Pushkara R. Varanasi, Kathleen Cornett, Ahmad D. Katnani
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Patent number: 6048672Abstract: The invention includes use of a positive chemically amplified photoresist composition that produces a strong photogenerated acid. The resist is coated onto a metal substrate that has been subjected to a stringent bake step, e.g. heating of the substrate at about at least 140.degree. C. for more than 60 seconds. The combined use of strong photogenerated acid and stringent pre-coating substrate bake provides highly resolved resist relief images, including on metal substrates.Type: GrantFiled: February 20, 1998Date of Patent: April 11, 2000Assignee: Shipley Company, L.L.C.Inventors: James F. Cameron, Martha M. Rajaratnam, Roger F. Sinta, James W. Thackeray
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Patent number: 5731364Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.Type: GrantFiled: January 24, 1996Date of Patent: March 24, 1998Assignee: Shipley Company, L.L.C.Inventors: Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
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Patent number: 5362600Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.Type: GrantFiled: May 25, 1993Date of Patent: November 8, 1994Assignee: Shipley Company Inc.Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro
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Patent number: 5344742Abstract: The present invention comprises certain benzyl-substituted photoactive compounds and photoresist compositions comprising such photoactive compounds. The benzyl-substituted photoactive compounds of the invention are particularly suitable as the photoactive component in chemically amplified positive-acting and negative-acting compositions.Type: GrantFiled: April 21, 1993Date of Patent: September 6, 1994Assignee: Shipley Company Inc.Inventors: Roger F. Sinta, George Barclay, Martha M. Rajaratnam
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Patent number: 5258257Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.Type: GrantFiled: September 23, 1991Date of Patent: November 2, 1993Assignee: Shipley Company Inc.Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro