Publication number: 20070141363
Abstract: A polymer for imparting repellency and stain resistance to substrates is disclosed of Formula 1: (W)a(R2)b—Si(R1)2—O—[Si(R1)2—O]n—[Si(W)c(R1)d(R2)e—O]m—Si(R1)2—(W)f(R2)g wherein: a, b, c, d, e, f and g are each independently 0 or 1, provided that (a+b) is 1, (f+g) is 1, and (c+d+e) is 2, each R1 is divalently a C1 to C8 alkyl, each R2 is independently H or C1 to C8 alkyl, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, n=0 to 500, m=1 to 100, each W is independently (Rf—X-A-X)p—Y wherein: Rf is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, each X is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing oxygen, nitrogen, or sulfur, or a combination thereof, A is a 1, 2, 3-triazole, p=0 to 2, and Y is O, OR, N, NR or N(R)2 wherein R is H or C1 to C20 alkyl, optionally containing oxygen,
Type:
Application
Filed:
December 19, 2005
Publication date:
June 21, 2007
Inventors:
Erick Acosta, Axel Herzog, Martial Pabon