Patents by Inventor Martijn Petrus Christianus VAN HEUMEN
Martijn Petrus Christianus VAN HEUMEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11942340Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 6, 2022Date of Patent: March 26, 2024Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Publication number: 20240079202Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.Type: ApplicationFiled: September 14, 2023Publication date: March 7, 2024Inventors: Martijn Petrus Christianus VAN HEUMEN, Jeroen Gerard GOSEN
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Patent number: 11804358Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.Type: GrantFiled: October 4, 2021Date of Patent: October 31, 2023Assignee: ASML Netherlands B.V.Inventors: Martijn Petrus Christianus Van Heumen, Jeroen Gerard Gosen
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Publication number: 20230332669Abstract: A vacuum system configured to mitigate damage or risk associated with a pump malfunction (e.g., an imbalance, a catastrophic failure, etc.). An exemplary vacuum pump includes a housing; a vibration isolator coupled to the vacuum pump housing and configured to isolate vibrations generated by the vacuum pump during operation; and a stop structure disposed between the vacuum pump housing and an adjacent fixture. The stop structure configured to prevent displacement of the vacuum pump housing relative to the fixture above a threshold amount, wherein the displacement of the vacuum pump housing is configured to be within the threshold amount during normal operation. The vacuum system may further include a collar configured to limit an axial displacement of the pump.Type: ApplicationFiled: September 28, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Erheng WANG, Adrianus Marinus VERDONCK, Adjan Gerrard Pieter Ivo SCHEERHOORN, Xu WANG, Jianzi SUI, Chin-Fa TU, Martijn Petrus Christianus VAN HEUMEN
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Patent number: 11764027Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.Type: GrantFiled: November 27, 2019Date of Patent: September 19, 2023Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Sven Antoin Johan Hol, Martijn Petrus Christianus Van Heumen, Dennis Herman Caspar Van Banning, Naseh Hosseini
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Publication number: 20220415678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 6, 2022Publication date: December 29, 2022Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS
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Patent number: 11430678Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: GrantFiled: July 17, 2019Date of Patent: August 30, 2022Assignee: ASML Netherlands B.V.Inventors: Jeroen Gerard Gosen, Te-Yu Chen, Dennis Herman Caspar Van Banning, Edwin Cornelis Kadijk, Martijn Petrus Christianus Van Heumen, Erheng Wang, Johannes Andreas Henricus Maria Jacobs
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Publication number: 20220102106Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.Type: ApplicationFiled: October 4, 2021Publication date: March 31, 2022Inventors: Martijn Petrus Christianus VAN HEUMEN, Jeroen Gerard GOSEN
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Patent number: 11139141Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.Type: GrantFiled: November 5, 2019Date of Patent: October 5, 2021Assignee: ASML Netherlands B.V.Inventors: Martijn Petrus Christianus Van Heumen, Jeroen Gerard Gosen
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Publication number: 20210257181Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.Type: ApplicationFiled: February 18, 2021Publication date: August 19, 2021Inventors: Marcus Adrianus VAN DE KERKHOF, Jing ZHANG, Martijn Petrus Christianus VAN HEUMEN, Patriek Adrianus Alphonsus Maria BRUURS, Erheng WANG, Vineet SHARMA, Makfir SEFA, Shao-Wei FU, Simone Maria SCOLARI, Johannes Andreas Henricus Maria JACOBS
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Patent number: 10948421Abstract: Disclosed is a laser-driven photon source comprising drive optics which focus drive radiation so as to maintain a plasma. The point spread function of the drive optics has a point spread function (75) which is configured such that a spectral position of a peak output wavelength of a black body portion of output radiation emitted by said plasma within a desired wavelength band.Type: GrantFiled: August 27, 2015Date of Patent: March 16, 2021Assignee: ASML Netherlands B.V.Inventors: Martijn Petrus Christianus Van Heumen, Sergii Denega, Ralph Jozef Johannes Gerardus Anna Maria Smeets, Remco Marcel Van Dijk, Marc Van Kemenade
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Publication number: 20200176215Abstract: Systems and methods for cooling an objective lens of a charged-particle beam system are disclosed. According to certain embodiments, the method for cooling an objective lens of a charged-particle beam system comprises receiving a fluid via a fluid input port of a bobbin, circulating the fluid that absorbs heat generated by a plurality of electromagnetic coils of the objective lens, via a plurality of channels distributed in the bobbin, and dispensing the fluid circulated by the plurality of channels via a fluid output port of the bobbin. The bobbin may further comprise a bottom flange proximal to a wafer and a top flange distal from the wafer. The bobbin having the plurality of channels may comprise an additively manufactured monolithic structure.Type: ApplicationFiled: November 27, 2019Publication date: June 4, 2020Inventors: Jeroen Gosen, Sven Antoin Johan Hol, Martijn Petrus Christianus Van Heumen, Dennis Herman Caspar Van Banning, Naseh Hosseini
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Publication number: 20200144019Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of the structures on the wafer and analyze the one or more characteristics. The charged particle beam apparatus may further determine a temperature characteristic of the wafer based on the analysis of the one or more characteristics of the structure and adjust the thermal conditioning station based on the temperature characteristic.Type: ApplicationFiled: November 5, 2019Publication date: May 7, 2020Inventors: Martijn Petrus, Christianus VAN HEUMEN, Jeroen Gerard GOSEN
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Publication number: 20200027763Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.Type: ApplicationFiled: July 17, 2019Publication date: January 23, 2020Inventors: Jeroen Gerard GOSEN, Te-Yu CHEN, Dennis Herman, Caspar VAN BANNING, Edwin Cornelis KADIJK, Martijn Petrus, Christianus VAN HEUMEN, Erheng WANG, Johannes Andreas, Henricus, Maria JACOBS
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Patent number: 10420197Abstract: A radiation source apparatus comprising: a container for being pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is operable substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.Type: GrantFiled: February 5, 2018Date of Patent: September 17, 2019Assignee: ASML Netherlands B.V.Inventor: Martijn Petrus Christianus Van Heumen
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Publication number: 20180160520Abstract: A radiation source apparatus comprising: a container for being pressurised with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation, wherein said container is operable substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.Type: ApplicationFiled: February 5, 2018Publication date: June 7, 2018Applicant: ASML Netherlands B.V.Inventor: Martijn Petrus Christianus VAN HEUMEN
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Patent number: 9924585Abstract: A radiation source apparatus comprising: a container (400) for being pressurized with a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation (50), wherein said container is operable (66, 67) substantially to remove radiation with a wavelength of 10-400 nm from said plasma emitted radiation before said plasma emitted radiation exits said container as output radiation. In an embodiment the container comprises: an inlet radiation transmitting element (64) operable to transmit said driving radiation from outside said container to inside said container, and an outlet radiation transmitting element (65) operable to transmit at least some of said plasma emitted radiation from inside said container to outside said container as output radiation; wherein at least one of said inlet and outlet radiation transmitting elements comprises a plane parallel plate.Type: GrantFiled: November 14, 2014Date of Patent: March 20, 2018Assignee: ASML Netherlands B.V.Inventor: Martijn Petrus Christianus Van Heumen
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Patent number: 9913357Abstract: A radiation source apparatus comprising: a container comprising walls for defining a space for containing a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation; and a thermal load applicator adapted to apply a thermal load to at least part of the walls of the container to reduce stresses in the walls.Type: GrantFiled: November 14, 2014Date of Patent: March 6, 2018Assignee: ASML Netherlands B.V.Inventor: Martijn Petrus Christianus Van Heumen
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Patent number: 9814126Abstract: A radiation driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a first container containing a gas (e.g. Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. First container is enclosed within a hermetically sealed second container. Any ozone generated within the second container as a result of ultraviolet components of the output radiation is completely contained within the second container. Second container further filters out the ultraviolet components. Microwave radiation may be used instead of laser radiation to form the plasma.Type: GrantFiled: September 23, 2014Date of Patent: November 7, 2017Assignee: ASML Netherlands B.V.Inventor: Martijn Petrus Christianus Van Heumen
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Publication number: 20170241914Abstract: Disclosed is a laser-driven photon source comprising drive optics which focus drive radiation so as to maintain a plasma. The point spread function of the drive optics has a point spread function (75) which is configured such that a spectral position of a peak output wavelength of a black body portion of output radiation emitted by said plasma within a desired wavelength band.Type: ApplicationFiled: August 27, 2015Publication date: August 24, 2017Applicant: ASML Netherlands B.V.Inventors: Martijn Petrus Christianus VAN HEUMEN, Sergii DENEGA, Ralph Jozef Johannes Gerardus Anna Maria SMEETS, Remco Marcel VAN DIJK, Marc VAN KEMENADE