Abstract: The present invention provides a reproducible preliminary in-situ oxide removal step for patterned self-assisted III-V semiconductor nanowire growth. Here “in-situ” means located within the same treatment environment or apparatus as the nanowire growth process, e.g. with a molecular beam epitaxy (MBE) apparatus or the like. Providing an in-situ process may prevent the formation of a thin oxide layer during transfer of the substrate into the nanowire growth apparatus.

Abstract: The application discloses a technique for fabricating gallium-arsenide-phosphorous (GaAsP) nanostructures using gallium-assisted (Ga-assisted) Vapour-Liquid-Solid (VLS) growth, i.e. without requiring gold catalyst particles. The resulting Ga-assisted GaAsP nanostructures are free of gold particles, which renders them useful for optoelectronic applications, e.g. as a junction in a solar cell. The Ga-assisted GaAsP nanostructures can be fabricated with a band gap in the range 1.6 to 1.8 eV (e.g. at and around 1.7 eV).

Abstract: The present invention relates to an optical device and to a method of fabricating the same. In embodiments, the invention relates to a photovoltaic device or solar cell. The optical device comprises a first electrode and a second electrode and an active element disposed between the first and second electrodes. The active element comprising a plurality of semiconducting structures extending in a lengthwise direction from the first electrode and being in contact with the first and second electrodes; the active element comprises an np-junction. For the semiconducting structures, at least a part of the structures is of a general plate or flake shape. In embodiments, the semiconducting structures have at least one characteristic dimension in the nanometer range.