Abstract: A method (100) for manufacturing a thermal absorber for a solar thermal collector includes arranging (120) a substrate of the thermal absorber on a vacuum coating line and depositing (160) by way of a physical vapour deposition on the substrate that is arranged on the vacuum coating line layers configured to absorb light.

Abstract: A method for providing a thermal absorber, which can be used in solar thermal collectors. The method includes a step of depositing on a substrate a first layer having a composition that comprises titanium, aluminium, nitrogen, and one of following elements: silicon, yttrium, cerium, and chromium. The method further optionally includes a step of depositing a second layer deposited on the first layer, the second layer having a composition including titanium, aluminium, nitrogen, oxygen and one of the elements of silicon, yttrium, cerium, and chromium, and a step of depositing a third layer having a composition including titanium, aluminium, silicon, nitrogen, and oxygen, the third layer being a top layer of the thermal absorber.

Abstract: A method (100) for manufacturing a thermal absorber for a solar thermal collector includes arranging (120) a substrate of the thermal absorber on a vacuum coating line and depositing (160) by way of a physical vapour deposition on the substrate that is arranged on the vacuum coating line layers configured to absorb light.

Abstract: A method for providing a thermal absorber, which can be used in solar thermal collectors. The method includes a step of depositing on a substrate a first layer having a composition that comprises titanium, aluminium, nitrogen, and one of following elements: silicon, yttrium, cerium, and chromium. The method further optionally includes a step of depositing a second layer deposited on the first layer, the second layer having a composition including titanium, aluminium, nitrogen, oxygen and one of the elements of silicon, yttrium, cerium, and chromium, and a step of depositing a third layer having a composition including titanium, aluminium, silicon, nitrogen, and oxygen, the third layer being a top layer of the thermal absorber.

Abstract: What is described here is a method of producing a patterned coating by PECVD without additional production steps. The proposed method produces a moth-eye like macrostructure on a surface by direct deposition. Additionally, the macrostructure may be modulated by a microstructure with a surface texture in the subwavelength range. As a result, protective, antireflective coating comprising a carrier layer consisting of an optically transparent material, which, at least on one surface side, presents antireflective properties with respect the optical wavelengths of the radiation incident on the surface can be produced, as well as surface structures which are the basis for superhydrophobic surface properties.