Patents by Inventor Martin Brunotte
Martin Brunotte has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7382536Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: March 29, 2006Date of Patent: June 3, 2008Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
-
Patent number: 7180667Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: April 1, 2004Date of Patent: February 20, 2007Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
-
Patent number: 7170585Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: GrantFiled: April 7, 2005Date of Patent: January 30, 2007Assignee: Carl Zeiss SMT AGInventors: Martin Brunotte, Jürgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
-
Patent number: 7145720Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: February 12, 2003Date of Patent: December 5, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
-
Patent number: 7126765Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: January 5, 2005Date of Patent: October 24, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
-
Publication number: 20060171020Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: March 29, 2006Publication date: August 3, 2006Applicant: Carl Zeiss SMT AGInventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
-
Publication number: 20050264786Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: ApplicationFiled: April 7, 2005Publication date: December 1, 2005Inventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
-
Publication number: 20050190446Abstract: A catadioptric projection objective for projecting a pattern, which is located in the object plane of the projection objective, into the image plane of the projection objective has, between the object plane and the image plane, a catadioptric objective part provided with a concave mirror (17), with a first deviating mirror (16) and with at least one second deviating mirror (19). A polarization rotating device (26) rotates the preferred polarization direction of the light approximately 90° inside the light path between the deviating mirrors. This permits an at least partial compensation for polarization-dependent reflectivity differences and phase effect differences of the deviating mirrors thereby enabling a projection with a largely identical contrast for all structural directions.Type: ApplicationFiled: December 23, 2004Publication date: September 1, 2005Inventors: Birgit Kuerz, Olaf Dittmann, Toralf Gruner, Vladimir Kamenov, Martin Brunotte
-
Publication number: 20050134967Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: ApplicationFiled: March 3, 2005Publication date: June 23, 2005Applicant: CARL ZEISS SMT AGInventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
-
Publication number: 20050122594Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: January 5, 2005Publication date: June 9, 2005Inventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
-
Patent number: 6879379Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: GrantFiled: November 14, 2003Date of Patent: April 12, 2005Assignee: Carl Zeiss SMT AGInventors: Martin Brunotte, Jürgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
-
Patent number: 6817357Abstract: The invention relates to a collector module (1) comprising a collector pipe (2) which has a inlet (9) and an outlet (10) for the heat transfer medium. Said collector module (1) also comprises at least one co-axially cross-flown collector pipe (3) which has a jacket pipe (4), an absorber pipe (5) and a co-axial pipe (6). The aim of the invention is to produce a collector module which has good mounting qualities as well as good sealing abilities and increased endurance. According to the invention, the outlet (10) comprises at least one hollow nipple (12) which extends in the radial direction of the collector pipe, whereon at least one absorbing pipe (5) is fixed in a co-axial manner, whereby at least one sealing element (15) is arranged between the nipple (12) and the absorbing pipe (5). The inlet (9) comprises at least one element (13, 20) for receiving the co-axial pipe.Type: GrantFiled: July 7, 2003Date of Patent: November 16, 2004Assignee: Schott GlasInventors: Martin Brunotte, Gottfried Haas, Klaus Quast
-
Publication number: 20040218271Abstract: Centimeter thick plates or lenses made from calcium fluoride or barium fluoride with beam propagation in the direction of the <110> crystal direction or of a main axis equivalent thereto are provided as retardation elements for the deep ultraviolet. They can be installed in an unstressed fashion. In a particular embodiment a retardation plate comprises a birefringent crystal plate which has an entry face and an exit face for incident and emerging light, respectively. A form-birefringent dielectric layer structure is applied to the entry and/or exit face. It may, for example, be a periodic sequence of at least two layers with alternating refractive indices. The retardation plate is suitable for ultraviolet light, and permits a large range of angles of incidence. Retardation elements according to the invention are particularly suitable for microlithography at 157 nm.Type: ApplicationFiled: January 16, 2004Publication date: November 4, 2004Applicant: CARL ZEISS SMT AGInventors: Juergen Hartmaier, Damian Fiolka, Markus Zenzinger, Birgit Mecking, Olaf Dittmann, Toralf Gruner, Vladimir Kamenov, Martin Brunotte
-
Publication number: 20040190151Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: April 1, 2004Publication date: September 30, 2004Inventors: Daniel Krahmer, Toralf Gruner, Wilheim Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
-
Publication number: 20040150806Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: ApplicationFiled: November 14, 2003Publication date: August 5, 2004Inventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
-
Publication number: 20040105170Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: February 12, 2003Publication date: June 3, 2004Applicant: Carl Zeiss SMT AGInventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
-
Publication number: 20040050542Abstract: The invention relates to a collector module (1) comprising a collector pipe (2) which has a inlet (9) and an outlet (10) for the heat transfer medium. Said collector module (1) also comprises at least one co-axially cross-flown collector pipe (3) which has a jacket pipe (4), an absorber pipe (5) and a co-axial pipe (6). The aim of the invention is to produce a collector module which has good mounting qualities as well as good sealing abilities and increased endurance. According to the invention, the outlet (10) comprises at least one hollow nipple (12) which extends in the radial direction of the collector pipe, whereon at least one absorbing pipe (5) is fixed in a co-axial manner, whereby at least one sealing element (15) is arranged between the nipple (12) and the absorbing pipe (5). The inlet (9) comprises at least one element (13, 20) for receiving the co-axial pipe.Type: ApplicationFiled: July 7, 2003Publication date: March 18, 2004Inventors: Martin Brunotte, Gottfried Haas, Klaus Quast