Patents by Inventor Martin Buschbeck

Martin Buschbeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6702901
    Abstract: A chamber for chemical vapor deposition has an inner quartz tube encompassed by a shorter outer quartz tube in which each end of the inner quartz tube is encompassed by a first flange. The first flange has a groove encircling in the longitudinal direction of the inner quartz tube, in which in each instance a front of the inner quartz tube is positioned. Between the first flange and the outside of the inner quartz tube, a seal is disposed. On the first flange in the direction toward the tube center, a second flange is disposed which has an encircling rim for fixing the front side of the shorter outer quartz tube and which is in contact on the outside of the inner quartz tube as well as on the outside of the shorter outer quartz tube. Between the second flange and the outside of the shorter outer quartz tube, a seal is disposed.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: March 9, 2004
    Assignee: Unaxis Trading AG
    Inventors: Martin Buschbeck, Johann Scholler
  • Publication number: 20030070608
    Abstract: A method, installation and reactor is for the production of components or of their intermediate products. Each component in the process of being produced as a structural member, is subjected to a treatment process and several of the structural members are simultaneously subjected to a common CVD process under conditions of ultrahigh vacuum. The treatment process is a vacuum process and from it the structural members are supplied to the CVD process under vacuum.
    Type: Application
    Filed: October 12, 2001
    Publication date: April 17, 2003
    Inventors: Hans Martin Buschbeck, Philipp Bartholet, Siegfried Wiltsche, Jurgen Ramm
  • Publication number: 20020108573
    Abstract: The invention relates to a chamber for chemical vapor deposition, consisting of an inner quartz tube (1) which is enclosed by a shorter, outer quartz tube. Each end of the inner quartz tube (1) is surrounded by a first flange (3), which presents a groove (3′) which extends in the longitudinal direction of the inner quartz tube (1) and in which in each case the face end of the inner quartz tube (1) is positioned. A seal (5′) is arranged between the first flange (3) and the outside of the inner quartz tube (1). On both first flanges (3) a second flange (4) is positioned in the direction of the tube center which comprises a peripheral rim (4′) for fixing the face end of the shorter, outer quartz tube (2) and contacts both the outside of the inner quartz tube (1) and the outside of the shorter, outer quartz tube (2). A seal (5) is positioned between the second flange (4) and the outside of the shorter, outer quartz tube (2).
    Type: Application
    Filed: October 24, 2001
    Publication date: August 15, 2002
    Inventors: Martin Buschbeck, Johann Scholler