Abstract: Some embodiments provide irrigation controllers, comprising: a transformer configured to step down a voltage producing an AC power signal; a live AC line and an AC common line coupled with the transformer; a plurality of AC switches coupled with the live AC line and configured to selectively pass the AC power signal to one or more valve solenoids such that the one or more valve solenoids are effectively coupled across the live AC line and the AC common line; an impedance element coupled serially on the AC common line with the transformer, wherein the impedance element comprises an inductive reactance and a resistive component, and the impedance element is configured to increase overvoltage protection between the transformer and the plurality of AC switches increasing an effective voltage tolerance to the overvoltage conditions at the AC switches; and a controller configured to selectively control the plurality of AC switches.

Abstract: The present invention is an apparatus and process for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, e) a second manifold for delivering the process chemical from the process container to a process tool; f) a solvent recovery container for containing used solvent and removed process chemical, and, g) a solvent evaporator to differentially remove solvent from process chemical in the solvent recovery container by entrainment in a carrier gas, vacuum removal, heating or combinations thereof. The containers can be baffled on their inert gas inlets. The cabinet can be heated.

Abstract: The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, and; e) a second manifold for delivering the process chemical from the process container to a process tool. A process for using the apparatus is also contemplated.

Abstract: A manifold comprising a container having two ports; a conduit connecting the container to a source/dispense of chemical having a first end and a second end and a connector for the ends; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of the conduit, one diaphragm side connected to a first port, and another diaphragm side connected to vent; a second block valve having two diaphragm valves, having a valve seat side and a diaphragm side, wherein each valve seat side faces the other valve seat side, and each valve seat side connected to the second end of the conduit, the diaphragm side of one valve connected to purge, and the diaphragm side of another valve connected to push gas or chemical outlet.

Abstract: The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, and; e) a second manifold for delivering the process chemical from the process container to a process tool. A process for using the apparatus is also contemplated.

Abstract: A chemical delivery system for delivering chemicals having at least a high purity includes at least one first reservoir for containing a fluid and at least one second reservoir for containing the fluid. The system also includes a first conduit, a first fluid sensor, and a controller. The first conduit is for transferring the fluid over time from the at least one first reservoir to the at least one second reservoir. The first conduit is metallic and has a first end in communication with the at least one first reservoir and a second end in communication with the at least one second reservoir. The fluid being transferred from the at least one first reservoir to the at least one second reservoir flows through the first conduit from the first end to the second end. The first fluid sensor is adjacent the first conduit, and the first fluid sensor is adapted to detect a presence of the fluid and to detect an absence of the fluid in the first conduit.