Abstract: An endoscope including a handle including an aperture and a valve insert arranged in the aperture; the valve insert including: a first valve cylinder having a first cylinder wall, a second valve cylinder having a second cylinder wall, and a flange connecting and spacing apart the first valve cylinder and the second valve cylinder. The flange is arranged in the aperture of the handle. Portions of the first valve cylinder and of the second valve cylinder are arranged inside the handle and include a plurality of tube ports.

Abstract: A landing device for landing an aircraft thereon. The landing device comprises a first group of supporting elements arranged next to each other in a first direction, each supporting element configured to support a portion of a body or a portion of a wing of the aircraft. Each supporting element is further configured to bow when loaded by the mass of the body portion or the wing portion supported by the respective supporting element.

Abstract: A landing device for landing an aircraft thereon. The landing device comprises a first group of supporting elements arranged next to each other in a first direction, each supporting element configured to support a portion of a body or a portion of a wing of the aircraft. Each supporting element is further configured to bow when loaded by the mass of the body portion or the wing portion supported by the respective supporting element.

Abstract: A device for precisely adjusting the space between two elements includes a connection member that mutually connects the first element and the second element, a first space adjusting member, and a second space adjusting member. The first space adjusting member has a first thread that interacts with an assigned counterthread of one of the elements, and the second space adjusting member has a second thread that interacts with an assigned counterthread of the first space adjusting member or of the other of the elements. The first thread and the second thread have different thread pitches.

Abstract: An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by A0, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts A0 to Ac not exceeding a defined maximal value.

Abstract: An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by Ao, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts Ao to Ac not exceeding a defined maximal value.