Patents by Inventor Martin Diggelman

Martin Diggelman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System for photolithographic synthesis of polymer arrays
    Patent number: 8637434
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: January 28, 2014
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Ngo Nam, MacDonald S. Morris, Melvin Yamamoto, Jennifer Tan, Richard Rava
  • Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings
    Patent number: 8309496
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: November 13, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Nam Quoc Ngo, MacDonald Morris, Melvin Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate Preparation Process
    Publication number: 20120071361
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: October 14, 2011
    Publication date: March 22, 2012
    Applicant: AFFYMETRIX, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Patent number: 8067578
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: November 29, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Martin J Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Nam Quoc Ngo, MacDonald Morris, Melvin Yamamoto, Jennifer Tan, Richard P. Rava
  • SUBSTRATE PREPARATION PROCESS
    Publication number: 20100331217
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: December 9, 2009
    Publication date: December 30, 2010
    Applicant: Affymetrix, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Publication number: 20090062148
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: August 8, 2006
    Publication date: March 5, 2009
    Applicant: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn Mcgall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Publication number: 20060160099
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: December 16, 2004
    Publication date: July 20, 2006
    Applicant: Affymetrix, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard Rava
  • Substrate preparation process
    Publication number: 20060008840
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: September 13, 2005
    Publication date: January 12, 2006
    Applicant: Affymetrix, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard Rava
  • Substrate preparation process
    Publication number: 20050181396
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: December 17, 2004
    Publication date: August 18, 2005
    Applicant: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard Rava
  • Substrate preparation process
    Publication number: 20050181431
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: March 25, 2005
    Publication date: August 18, 2005
    Applicant: Affymetrix, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard Rava
  • Substrate preparation process
    Publication number: 20040105932
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: November 25, 2003
    Publication date: June 3, 2004
    Applicant: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Patent number: 6706875
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: November 20, 2000
    Date of Patent: March 16, 2004
    Assignee: Affyemtrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Patent number: 6307042
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: February 4, 1999
    Date of Patent: October 23, 2001
    Assignee: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Substrate preparation process
    Patent number: 5959098
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: April 17, 1996
    Date of Patent: September 28, 1999
    Assignee: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, Macdonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava