Patents by Inventor Martin Drapeau

Martin Drapeau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8028253
    Abstract: One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: September 27, 2011
    Assignee: Synopsys, Inc.
    Inventors: Martin Drapeau, Jeffrey P. Mayhew
  • Patent number: 7727687
    Abstract: One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The process model is determined using first process data and second process data. The first process data is obtained using a first layout which is exposed using a first exposure level. The second process data is obtained using a second layout which is exposed using a second exposure level, which is different from the first exposure level. The second exposure level causes the sub-resolution assist features within the second layout to print.
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: June 1, 2010
    Assignee: Synopsys, Inc.
    Inventors: Lawrence S. Melvin, III, Jensheng Huang, Martin Drapeau
  • Publication number: 20080244504
    Abstract: One embodiment provides a method for determining mask layouts. During operation, the system can receive a design intent. Next, the system can determine a set of critical edges in the design layout, and select a first edge and a second edge. The system can then determine a first trench and a second trench using the first edge and the second edge, respectively. Note that an edge of the first trench may substantially overlap with the first edge, and an edge of the second trench may substantially overlap with the second edge. Next, the system may assign the first trench and the second trench to the first mask layout and the second mask layout, respectively. The system can then increase the first trench and the second trench, thereby improving pattern fidelity. The resulting mask layouts may be used in a double patterning process.
    Type: Application
    Filed: April 2, 2007
    Publication date: October 2, 2008
    Inventors: Martin Drapeau, Jeffrey P. Mayhew
  • Publication number: 20070292777
    Abstract: One embodiment of the present invention provides a system that determines whether a sub-resolution assist feature will print. During operation, the system receives a layout which contains a sub-resolution assist feature. Next, the system determines whether the sub-resolution assist feature will print using a process model and the layout. The process model is determined using first process data and second process data. The first process data is obtained using a first layout which is exposed using a first exposure level. The second process data is obtained using a second layout which is exposed using a second exposure level, which is different from the first exposure level. The second exposure level causes the sub-resolution assist features within the second layout to print.
    Type: Application
    Filed: June 15, 2006
    Publication date: December 20, 2007
    Inventors: Lawrence S. Melvin, Jensheng Huang, Martin Drapeau
  • Patent number: 7263680
    Abstract: One embodiment of the invention provides a graphical user interface for configuring parameters that control a cell routing process used to lay out a cell, wherein the graphical user interface is useable by both novice and advanced users. The graphical user interface provides both a scenario section and a parameter section. The scenario section allows a user to select a scenario that sets values for multiple parameters applicable to the cell routing process, while the parameter section allows a user to set and adjust individual routing parameters. The graphical user interface also includes an output that displays the parameters to the user. Note that the scenario section of the graphical user interface is useful for a novice user who does not understand the interrelationships between routing parameters, while the parameter section of the graphical user interface is useful for an advanced user who desires to set individual parameters.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: August 28, 2007
    Assignee: Synopsys, Inc.
    Inventor: Martin Drapeau
  • Publication number: 20040255260
    Abstract: One embodiment of the invention provides a graphical user interface for configuring parameters that control a cell routing process used to lay out a cell, wherein the graphical user interface is useable by both novice and advanced users. The graphical user interface provides both a scenario section and a parameter section. The scenario section allows a user to select a scenario that sets values for multiple parameters applicable to the cell routing process, while the parameter section allows a user to set and adjust individual routing parameters. The graphical user interface also includes an output that displays the parameters to the user. Note that the scenario section of the graphical user interface is useful for a novice user who does not understand the interrelationships between routing parameters, while the parameter section of the graphical user interface is useful for an advanced user who desires to set individual parameters.
    Type: Application
    Filed: June 12, 2003
    Publication date: December 16, 2004
    Inventor: Martin Drapeau