Patents by Inventor Martin Dubs
Martin Dubs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9587306Abstract: For producing a directional layer for instance with constant nominal directionality, such as a low-retentivity layer with a preferred direction of magnetization or a support layer for such a layer by cathode sputtering on a substrate surface (4), the coating process takes place in a manner whereby particles emanating from a target surface (6) impinge predominantly from directions whose projections onto the substrate surface (4) lies within a preferred angular range surrounding the nominal direction. This is achieved for instance by positioning a collimator (8), encompassing plates (9) that extend at a normal angle to the substrate surface (4) parallel to the nominal direction in front of the substrate surface (4), but in lieu of or in addition to such positioning the location or movement of the substrate surface (4) relative to the target surface (6) can also be suitably adjusted or controlled.Type: GrantFiled: January 2, 2008Date of Patent: March 7, 2017Assignee: EVATEC AGInventors: Hartmut Rohrmann, Hanspeter Friedli, Jürgen Weichart, Stanislav Kadlec, Martin Dubs
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Patent number: 9214589Abstract: Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal(?).Type: GrantFiled: March 15, 2010Date of Patent: December 15, 2015Assignee: OERLIKON ADVANCED TECHNOLOGIES AGInventors: Stephan Voser, Oliver Rattunde, Martin Dubs, Gerald Feistritzer, Volker Wuestenhagen, Gerhard Dovids
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Publication number: 20150220189Abstract: A touch screen and a method to manufacture a touch screen having a substrate and a patterned transparent conductor layer. The color difference between substrate areas with and without coverage by the transparent conductor layer with respect to both reflectance and transmittance is reduced by an intermediate layer stack (IL) disposed between the substrate and the transparent conductor layer. The intermediate layer stack includes a plurality of at least two alternating high refractive index and low refractive index materials. In a second embodiment of a touch screen and a method to manufacture a touch screen, a capping layer (CL) is situated on top of the patterned transparent conductor layer and the intermediate layer (IL) where it is not covered by the patterned transparent conductor layer.Type: ApplicationFiled: August 23, 2013Publication date: August 6, 2015Inventors: Oliver Rattunde, Martin Dubs
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Publication number: 20130180850Abstract: A magnetron sputtering apparatus comprises, within a vacuum chamber (1), a substrate support (2) holding a substrate (3) with an upward-facing plane substrate surface (4) which is to be coated. The substrate (3) may be a disk of, e.g., 200 mm diameter. At a distance from a centre plane (5) two oblong targets (7a, 7b) are symmetrically arranged which are inclined towards the centre plane (5) so as to enclose an acute angle (?; ??) of between 8° and 35° with the plane defined by the substrate surface (4). Above the substrate surface (4) a collimator (13) with equidistant rectangular collimator plates is arranged. With this configuration high uniformity of the coating is achievable, in particular, if the distance of the collimator (13) from the substrate surface (4) is chosen as a multiple n of the extension of the collimator (13) perpendicular to the said surface, preferably with n equalling 1 or 2, for suppressing ripple.Type: ApplicationFiled: July 8, 2011Publication date: July 18, 2013Applicant: OC OERLIKON BALZERS AGInventors: Hartmut Rohrmann, Martin Dubs
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Publication number: 20120031749Abstract: The apparatus (1) for coating a substrate (14) by reactive sputtering comprises an axis (8), at least two targets (11,12) in an arrangement symmetrically to said axis (8) and a power supply connected to the targets (11,12), wherein the targets are alternatively operable as cathode and anode. The method is a method for manufacturing a coated substrate (14) by coating a substrate (14) by reactive sputtering in an apparatus (1) comprising an axis (8). The method comprises a) providing a substrate (14) to be coated; b) providing at least two targets (11,12) in an arrangement symmetrically to said axis (8); c) alternatively operating said targets (11,12) as cathode and anode during coating. Preferably, the targets (11,12) are rotated during sputtering and/or the targets are arranged concentrically, with an innermost circular target surrounded by at least one ring-shaped outer target.Type: ApplicationFiled: April 23, 2010Publication date: February 9, 2012Applicant: OC OERLIKON BALZERS AGInventors: Martin Dubs, Kurt Ruhm, Hartmut Rohrmann
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Publication number: 20120009730Abstract: Throughput of manufacturing thin-film solar panels by inline technique is made substantially independent from the time extent of different surface treatment steps by accordingly subdividing treatment steps in sub-steps performed in inline subsequent treatment stations. Treatment duration in each of the subsequent treatment stations is equal (?).Type: ApplicationFiled: March 15, 2010Publication date: January 12, 2012Applicant: OC OERLIKON BALZERS AGInventors: Stephan Voser, Oliver Rattunde, Martin Dubs, Gerald Feistritzer, Volker Wuestenhagen, Gerhard Dovids
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Publication number: 20090134011Abstract: For producing a directional layer for instance with constant nominal directionality, such as a low-retentivity layer with a preferred direction of magnetization or a support layer for such a layer by cathode sputtering on a substrate surface (4), the coating process takes place in a manner whereby particles emanating from a target surface (6) impinge predominantly from directions at which their projection onto the substrate surface (4) lies within a preferred angular range surrounding the nominal direction. This is achieved for instance by positioning a collimator (8), encompassing plates (9) that extend at a normal angle to the substrate surface (4) parallel to the nominal direction in front of the substrate surface (4), but in lieu of or in addition to such positioning the location or movement of the substrate surface (4) relative to the target surface (6) can also be suitably adjusted or controlled.Type: ApplicationFiled: January 2, 2008Publication date: May 28, 2009Inventors: Hartmut Rohrmann, Hanspeter Friedli, Jurgen Weichart, Stanislav Kadlec, Martin Dubs
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Patent number: 7335521Abstract: A Method for manufacturing an optical disc substrate comprises a first substrate with at least one structured surface, on which an anti-adhesive layer, preferably carbon, is deposited and first layer on top of said anti-adhesive layer. On a second substrate with a structured surface also a layer is deposited. Both substrates are bonded together with the layers facing each other. The separation now easily can take place afterwards alongside the adhesive layer. This way the first layer from the first substrate is being transferred to the second substrate.Type: GrantFiled: June 28, 2005Date of Patent: February 26, 2008Assignee: OC Oerlikon Balzers AGInventors: Martin Dubs, Wolfgang Nutt, Helfried Weinzerl, Thomas Eisenhammer
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Publication number: 20070224385Abstract: An optical storage medium having at least two information layers is provided, wherein a first information layer is in the form of a dichroic filter that is reflective at a first selected wavelength and transmissive at a second selected wavelength. The dichroic filter can consist of a single, non-metallic dielectric layer, such as a hydrogen-doped silicon layer. Total thickness of the dichroic filter is about or less than 100 nm. A second information layer that is reflective at the second wavelength is disposed behind and spaced from the dichroic filter. This construction permits a first incident light beam at the first wavelength to be reflected from the dichroic filter, to produce a first reflected beam carrying information recorded in that layer.Type: ApplicationFiled: May 24, 2007Publication date: September 27, 2007Applicant: OC OERLIKON BALZERS AGInventor: Martin Dubs
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Publication number: 20070007357Abstract: An optical storage medium having at least two information layers is provided, wherein a first information layer is in the form of a dichroic filter that is reflective at a first selected wavelength and transmissive at a second selected wavelength. The dichroic filter has a laminate structure that includes at least a metallic layer and a dielectric layer, wherein the total thickness of the dichroic filter is about or less than 100 nm. A second information layer that is reflective at the second wavelength is disposed behind and spaced from the dichroic filter. This construction permits a first incident light beam at the first wavelength to be reflected from the dichroic filter, to produce a first reflected beam carrying information recorded in that layer.Type: ApplicationFiled: July 7, 2006Publication date: January 11, 2007Applicant: OC OERLIKON BALZERS AGInventor: Martin Dubs
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Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
Patent number: 7033471Abstract: A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate structure. The structure has at least two substrate passage openings which are adapted to a substrate disk surface. A transport device which is rotationally drivingly movable about a rotation axis perpendicular to the base plate structure. At least one substrate receiving device is brought into alignment with a respective one of the openings. A controlled sealing arrangement establishes an edge of at least one of the openings with the substrate holding device brought into alignment therewith and a substrate provided thereon.Type: GrantFiled: August 17, 2004Date of Patent: April 25, 2006Assignee: Unaxis Balzers AktiengesellschaftInventors: Martin Dubs, Roman Schertler -
Publication number: 20060003476Abstract: A Method for manufacturing an optical disc substrate comprises a first substrate with at least one structured surface, on which an anti-adhesive layer, preferably carbon, is deposited and first layer on top of said anti-adhesive layer. On a second substrate with a structured surface also a layer is deposited. Both substrates are bonded together with the layers facing each other. The separation now easily can take place afterwards alongside the adhesive layer. This way the first layer from the first substrate is being transferred to the second substrate.Type: ApplicationFiled: June 28, 2005Publication date: January 5, 2006Applicant: Unaxis Balzers Ltd.Inventors: Martin Dubs, Wolfgang Nutt, Helfried Weinzerl, Thomas Eisenhammer
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Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
Patent number: 6899795Abstract: A sputtering chamber system and method uses at least one sputtering source with a new sputter surface at least approximately symmetrical with respect to a central axis. A substrate carrier is arranged to be drivingly rotatable about a substrate carrier axis. The central axis and the substrate carrier axis are oblique with respect to one another, and the sputtering source is a magnetron sputtering source. The new sputter surface is substantially rotationally symmetrical with respect to the central axis, with the central axis and the substrate carrier axis intersecting at least approximately. With respect to an angle ? between the central axis and the substrate carrier axis, 30°???60°, preferably 40°???55°, particularly preferably 43°???50°, particularly ??45°.Type: GrantFiled: January 18, 2000Date of Patent: May 31, 2005Assignee: Unaxis Balzers AktiengesellschaftInventors: Martin Dubs, Roman Schertler -
Patent number: 6860977Abstract: A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.Type: GrantFiled: November 6, 2003Date of Patent: March 1, 2005Assignee: Unaxis Balzers LimitedInventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
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Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
Publication number: 20050016843Abstract: A Vacuum transport chamber for disk-shaped substrates, has a base plate structure has an interior surface which borders an interior of the chamber on one side thereof. A covering structure is situated parallel and opposite an interior surface of the base plate structure. The structure has at least two substrate passage openings which are adapted to a substrate disk surface. A transport device which is rotationally drivingly movable about a rotation axis perpendicular to the base plate structure. At least one substrate receiving device is brought into alignment with a respective one of the openings. A controlled sealing arrangement establishes an edge of at least one of the openings with the substrate holding device brought into alignment therewith and a substrate provided thereon.Type: ApplicationFiled: August 17, 2004Publication date: January 27, 2005Inventors: Martin Dubs, Roman Schertler -
Patent number: 6802942Abstract: To generate an especially good heat transfer between a seating face of a storage plate support and a storage plate, during coating with a sputter source in a vacuum installation, the seating face of the storage plate support is slightly annularly convexly arched and the storage plate is clamped in the center as well as on its outer margin by a center mask and an outer mask against the arched seating face. Hereby an especially good heat transfer is attained with very low arching d, whereby the storage plate is treated gently and simultaneously, during the coating process, no layer thickness distribution problems occur through arching that is too large.Type: GrantFiled: October 2, 2002Date of Patent: October 12, 2004Assignee: Unaxis Balzers LimitedInventors: Stephan Voser, Martin Dubs
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Patent number: 6776882Abstract: Method for producing hybrid disks has a first substrate that is transparent in a given spectral band. A layer system that is semi-transparent in the given band succeeds the first substrate and is followed by a further substrate that is transparent in the given band. Next, is a reflection layer system which is in the semi-transparent layer system and is deposited by a vacuum coating method of identical type. The first substrate is covered by a moisture protection layer system that is transparent in the given spectral band and has at least one layer deposited by a vacuum coating method of identical type.Type: GrantFiled: November 9, 2001Date of Patent: August 17, 2004Assignee: Unaxis Balzers AktiengesellschaftInventor: Martin Dubs
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Publication number: 20040149565Abstract: A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.Type: ApplicationFiled: November 6, 2003Publication date: August 5, 2004Applicant: Unaxis Balzers LimitedInventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
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Patent number: 6692618Abstract: A device and method has a magnetron sputter source with a multipart target (3, 4) and movable magnet system (5). By variation of the power delivery of the power supply (6), specific areas of the multipart target (3, 4) can be preferably affected, which permits setting the stoichiometry of the sputtered-off target materials on the substrate (15) to be covered and positively affecting the homogeneity of the layer structure.Type: GrantFiled: April 29, 2002Date of Patent: February 17, 2004Assignee: Unaxis Balzers LimitedInventor: Martin Dubs
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Patent number: 6682637Abstract: To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face 20 in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole 3 of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole 4 with a second outer pole part 11 is developed rotatable about the central source axis 6.Type: GrantFiled: June 4, 2002Date of Patent: January 27, 2004Assignee: Unaxis Balzers LimitedInventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer