Patents by Inventor Martin Ebert
Martin Ebert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240146296Abstract: A system and a method for identifying a non-switching semiconductor switch are proposed. The system has a first acquisition component, a second acquisition component and a determination unit. The first acquisition component is designed to acquire a profile of an electrical variable of a first semiconductor switch driven by way of a first drive signal. The second acquisition component is designed to acquire a profile of an electrical variable of a second semiconductor switch driven by way of a second drive signal and connected in parallel with the first semiconductor switch. The determination unit is designed to use the profile of the electrical variable of the first semiconductor switch and the profile of the electrical variable of the second semiconductor switch as a basis for determining an output signal that allows identification of a non-switching semiconductor switch for the first semiconductor switch and/or the second semiconductor switch.Type: ApplicationFiled: October 14, 2020Publication date: May 2, 2024Inventors: Matthias Ebert, Wolfgang Koch, Martin Roesler
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Patent number: 11874540Abstract: A resonator modulator for modulating light in a photonic circuit, the modulator comprising: a capacitor formed of a ring-shaped insulating region sandwiched between an outer conductive region and an inner conductive region, wherein at least one of the outer conductive regions or the inner conductive regions is a polycrystalline semiconductor material.Type: GrantFiled: January 28, 2022Date of Patent: January 16, 2024Assignee: University of SouthamptonInventors: Weiwei Zhang, Graham Reed, David Thomson, Martin Ebert, Shinichi Saito
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Publication number: 20230207255Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.Type: ApplicationFiled: March 3, 2023Publication date: June 29, 2023Applicant: ASML Netherlands B.V.Inventors: Vincent Claude BEUGIN, Stijn Wilem Herman Karel STEENBRINK, Martin EBERT, Diego MARTINEZ NEGRETE GASQUE, Hindrik Willem MOOK, Albertus Victor Gerardus MANGNUS
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Publication number: 20230185990Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.Type: ApplicationFiled: January 10, 2023Publication date: June 15, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert, Pieter Jacob Mathias Hendrik Knelissen, Stephen Morgan, Maurits Van Der Schaar, Leonardus Henricus Marie Verstappen, Jen-Shiang Wang, Peter Hanzen Wardenier
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Patent number: 11580274Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.Type: GrantFiled: March 24, 2016Date of Patent: February 14, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Lotte Marloes Willems, Kaustuve Bhattacharyya, Panagiotis Pieter Bintevinos, Guangqing Chen, Martin Ebert, Pieter Jacob Mathias Hendrik Knelissen, Stephen Morgan, Maurits Van Der Schaar, Leonardus Henricus Marie Verstappen, Jen-Shiang Wang, Peter Hanzen Wardenier
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Publication number: 20220397721Abstract: A method of manufacturing a photonic chip. The method comprises providing a wafer comprising a silicon substrate, and a low refractive index layer above the silicon substrate, forming a first trench having a first height and a second trench having a second height by etching the low refractive index layer. The second height is greater than the first height and the second trench has a bottom surface that is closer to the substrate than a bottom surface of the first trench.Type: ApplicationFiled: November 27, 2020Publication date: December 15, 2022Inventors: David THOMSON, Graham REED, Weiwei ZHANG, Martin EBERT
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Patent number: 11429029Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.Type: GrantFiled: October 27, 2020Date of Patent: August 30, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Maurits Van Der Schaar, Patrick Warnaar, Youping Zhang, Arie Jeffrey Den Boef, Feng Xiao, Martin Ebert
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Publication number: 20220244580Abstract: A resonator modulator for modulating light in a photonic circuit, the modulator comprising: a capacitor formed of a ring-shaped insulating region sandwiched between an outer conductive region and an inner conductive region, wherein at least one of the outer conductive regions or the inner conductive regions is a polycrystalline semiconductor material.Type: ApplicationFiled: January 28, 2022Publication date: August 4, 2022Inventors: Weiwei ZHANG, Graham REED, David THOMSON, Martin EBERT, Shinichi SAITO
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Publication number: 20220214498Abstract: The invention provides a photonic chip comprising: a silicon substrate, an low refractive index layer above the silicon substrate, and a tapered waveguide above the low refractive index layer, the tapered waveguide having a first height at a first end of the tapered waveguide and a second height at a second end of the tapered waveguide, the second height being greater than the first height, and the tapered waveguide having a bottom surface that is closer to the substrate at the second end than at the first end.Type: ApplicationFiled: April 24, 2020Publication date: July 7, 2022Inventors: David THOMSON, Graham REED, Wei Wei ZHANG, Martin EBERT
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Publication number: 20210055663Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.Type: ApplicationFiled: October 27, 2020Publication date: February 25, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Maurits VAN DER SCHAAR, Patrick WARNAAR, Youping ZHANG, Arie Jeffrey DEN BOEF, Feng XIAO, Martin EBERT
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Patent number: 10620550Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters.Type: GrantFiled: August 30, 2018Date of Patent: April 14, 2020Assignee: ASML Netherlands B.V.Inventors: Martin Jacobus Johan Jak, Martin Ebert, Arie Jeffrey Den Boef, Nitesh Pandey
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Patent number: 10379445Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.Type: GrantFiled: October 30, 2018Date of Patent: August 13, 2019Assignee: ASML Netherlands B.V.Inventors: Martin Jacobus Johan Jak, Arie Jeffrey Den Boef, Martin Ebert
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Patent number: 10338401Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.Type: GrantFiled: September 1, 2017Date of Patent: July 2, 2019Assignee: ASML Netherlands B.V.Inventors: Gerbrand Van Der Zouw, Martin Jacobus Johan Jak, Martin Ebert
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Patent number: 10254658Abstract: A method of measuring a parameter of a lithographic process, the method including: illuminating a diffraction measurement target on a substrate with radiation, the measurement target including at least a first sub-target, at least a second sub-target and at least third sub-target, wherein the first, second and third sub-targets each include a periodic structure and wherein the first sub-target, second sub-target and third sub-target each have a different design and wherein at least two of the sub-targets are respectively designed for determination of a different lithographic process parameter; and detecting radiation scattered by the at least two sub-targets to obtain for that target a measurement representing the different parameters of the lithographic process.Type: GrantFiled: September 23, 2016Date of Patent: April 9, 2019Assignee: ASML Netherlands B.V.Inventors: Daan Maurits Slotboom, Arie Jeffrey Den Boef, Martin Ebert
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Publication number: 20190072859Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parametersType: ApplicationFiled: August 30, 2018Publication date: March 7, 2019Applicant: ASML Netherlands B.V.Inventors: Martin Jacobus Johan JAK, Martin EBERT, Arie Jeffrey DEN BOEF, Nitesh PANDEY
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Publication number: 20190064677Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.Type: ApplicationFiled: October 30, 2018Publication date: February 28, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Martin Jacobus Johan Jak, Arie Jeffrey den Boef, Martin Ebert
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Publication number: 20180364590Abstract: A method includes projecting an illumination beam of radiation onto a metrology target on a substrate, detecting radiation reflected from the metrology target on the substrate, and determining a characteristic of a feature on the substrate based on the detected radiation, wherein a polarization state of the detected radiation is controllably selected to optimize a quality of the detected radiation.Type: ApplicationFiled: November 30, 2016Publication date: December 20, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Maurits VAN DER SCHAAR, Patrick WARNAAR, Youping ZHANG, Arie Jeffrey DEN BOEF, Feng XIAO, Martin EBERT
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Patent number: 10133188Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.Type: GrantFiled: December 21, 2016Date of Patent: November 20, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Martin Jacobus Johan Jak, Arie Jeffrey Den Boef, Martin Ebert
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Publication number: 20180088347Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.Type: ApplicationFiled: September 1, 2017Publication date: March 29, 2018Applicant: ASML Netherlands B.V.Inventors: Gerbrand Van Der Zouw, Martin Jacobus Johan Jak, Martin Ebert
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Publication number: 20180046737Abstract: A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.Type: ApplicationFiled: March 24, 2016Publication date: February 15, 2018Applicant: ASML Netherlands B.V.Inventors: Lotte Marloes WILLEMS, Kaustuve BHATTACHARYYA, Panagiotis Peter BINTEVINOS, Guangqing CHEN, Martin EBERT, Pieter Jacob Mathias Hendrik KNELISSEN, Stephen MORGAN, Maurits VAN DER SCHAAR, Leonardus Hericus Marie VERSTAPPEN, Jen-Shiang WANG, Peter Hanzen WARDENIER