Abstract: A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.

Abstract: A method for applying a masked overgrowth layer onto a seed layer for producing semiconductor components, characterized in that a mask for masking the overgrowth layer is imprinted onto the seed layer.

Abstract: A metrology device and method for inspecting a substrate stack. The device includes sound application means for applying sound waves to a first substrate stack surface of the substrate stack, an optical system having a source for outputting electromagnetic radiation, which are split into at least one first beam path and one second beam path, means for loading a substrate stack measuring surface of the substrate stack, with the first beam path, interference means for forming an interference radiation made up of the first and second beam paths, a detector for detecting the interference radiation, and analysing means for analysing the interference radiation detected at the detector.

Abstract: A method for applying a masked overgrowth layer onto a seed layer for producing semiconductor components, characterized in that a mask for masking the overgrowth layer is imprinted onto the seed layer.