Patents by Inventor Martin Fürfanger
Martin Fürfanger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220158022Abstract: An arrangement for heat treating a multilayer body, which arrangement comprises an energy source with at least one radiant heater for generating heating radiation, a multilayer body, and an intermediate element arranged between the energy source and the multilayer body. According to a first alternative, the intermediate element includes a surface element implemented in the form of a flexible film. According to a second alternative, the intermediate element includes a surface element implemented in the form of a flexible film or a rigid plate, wherein the surface element has a surface facing the energy source, which can be irradiated by the heating radiation and is mechanically supported by a supporting device in the direction toward the energy source.Type: ApplicationFiled: October 29, 2019Publication date: May 19, 2022Applicant: (CNBM) BENGBU DESIGN & RESEARCH INSTITUTE FOR GLASS INDUSTRY CO., LTDInventors: Joerg PALM, Martin FUERFANGER, Mike VERDENHALVEN
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Patent number: 10163670Abstract: The present invention relates to a device for heat treating an object, in particular a coated substrate, with an in particular gas-tightly sealable housing that encloses a hollow space, wherein the hollow space has a separating wall, by which the hollow space is divided into a process space for accommodating the object and an intermediate space, wherein the separating wall has one or a plurality of openings, which are implemented such that the separating wall acts as a barrier for the diffusion out of the process space into the intermediate space of a gaseous substance generated in the process space by the heat treatment of the object. The housing has at least one housing section coupled to a cooling device for its active cooling, wherein the separating wall is arranged between the object and the coolable housing section. The invention further relates to the use of a separating wall as a diffusion barrier in a device for heat treating an object as well as a corresponding method for heat treating an object.Type: GrantFiled: July 9, 2013Date of Patent: December 25, 2018Assignee: Bengbu Design & Research Institute for Glass IndustryInventors: Martin Fürfanger, Stefan Jost, Jörg Palm
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Patent number: 9926626Abstract: The present invention relates to a system for processing coated substrates, having the following features: at least one evacuable process box for accommodating at least one substrate with a gas-tightly sealable housing, which forms a hollow space, wherein the housing comprises at least one housing section, which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the housing has at least one housing section coupleable to a cooling device for its cooling and at least one housing section not coupled to the cooling device, wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the housing section coupled to the cooling device, and wherein the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and iType: GrantFiled: July 9, 2013Date of Patent: March 27, 2018Assignee: Bengbu Design & Research Institute for Glass IndustryInventors: Stefan Jost, Martin Fürfanger, Jörg Palm
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Patent number: 9799543Abstract: A transportable process box for processing substrates coated on one side is described. The box has a base for the placement of a first substrate in a manner such that the latter is supported over the full area, a frame, a cover which is placed onto the frame, and an intermediate element which is arranged between the base and the cover and is intended for the placement of a second substrate in a manner such that the latter is supported over the full area. Arrangements and methods for processing substrates are also described.Type: GrantFiled: February 8, 2013Date of Patent: October 24, 2017Assignee: SAINT-GOBAIN GLASS FRANCEInventors: Martin Fuerfanger, Dang Cuong Phan, Stefan Jost
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Patent number: 9352431Abstract: A device for forming a reduced chamber space, which is a process box or a process hood, containing an apparatus, which positions at least two multilayer bodies each including a surface to be processed, wherein the apparatus is designed such that the multilayer bodies are opposite to each other, wherein the surfaces to be processed are facing away from each other such that the multilayer bodies can be processed as a multilayer body arrangement in a processing system. In addition, a method for positioning the two multilayer bodies comprising a surface to be processed, with the two multilayer bodies disposed in such a device such that multilayer bodies are opposite each other, wherein the surfaces to be processed are facing away from each other, such that the multilayer bodies are processable as a multilayer body arrangement in a processing system.Type: GrantFiled: February 22, 2011Date of Patent: May 31, 2016Assignee: Saint-Gobain Glass FranceInventors: Joerg Palm, Stefan Jost, Martin Fuerfanger, Jessica Hartwich
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Patent number: 9236282Abstract: The invention relates to a multilayer body arrangement, which comprises at least two multilayer bodies each having at least one surface to be processed as well as at least one device for positioning the multilayer bodies, wherein the device is configured such that the respective surfaces to be processed are opposite each other and thus form a quasi-closed processing space disposed between the surfaces, in which the processing occurs. It further relates to a system for processing multilayer bodies with such a multilayer body arrangement, as well as a method for processing multilayer bodies, wherein the multilayer bodies are disposed such that the respective surfaces to be processed are opposite each other and thus form a quasi-closed processing space disposed between the surfaces, in which the processing occurs.Type: GrantFiled: February 22, 2011Date of Patent: January 12, 2016Assignee: Saint-Gobain Glass FranceInventors: Stefan Jost, Joerg Palm, Martin Fuerfanger
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Publication number: 20150206781Abstract: The present invention relates to a device for heat treating an object, in particular a coated substrate, with an in particular gas-tightly sealable housing that encloses a hollow space, wherein the hollow space has a separating wall, by which the hollow space is divided into a process space for accommodating the object and an intermediate space, wherein the separating wall has one or a plurality of openings, which are implemented such that the separating wall acts as a barrier for the diffusion out of the process space into the intermediate space of a gaseous substance generated in the process space by the heat treatment of the object. The housing has at least one housing section coupled to a cooling device for its active cooling, wherein the separating wall is arranged between the object and the coolable housing section. The invention further relates to the use of a separating wall as a diffusion barrier in a device for heat treating an object as well as a corresponding method for heat treating an object.Type: ApplicationFiled: July 9, 2013Publication date: July 23, 2015Inventors: Martin Fürfanger, Stefan Jost, Jörg Palm
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Publication number: 20150197850Abstract: The present invention relates to a system for processing coated substrates, having the following features: at least one evacuable process box for accommodating at least one substrate with a gas-tightly sealable housing, which forms a hollow space, wherein the housing comprises at least one housing section, which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the housing has at least one housing section coupleable to a cooling device for its cooling and at least one housing section not coupled to the cooling device, wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the housing section coupled to the cooling device, and wherein the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and iType: ApplicationFiled: July 9, 2013Publication date: July 16, 2015Inventors: Stefan Jost, Martin Fürfanger, Jörg Palm
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Publication number: 20150165475Abstract: The present invention relates to a process box for processing a coated substrate, with the following features: a gas-tightly sealable housing, which forms a hollow space; the housing comprises at least one housing section, which is implemented such that the substrate is heat treatable by electromagnetic thermal radiation incident on the housing section; the housing has at least one housing section coupleable to a cooling device for its cooling and at least one non-coolable housing section; the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the temperature-controlable housing section; the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and introducing process gas into the hollow space.Type: ApplicationFiled: July 9, 2013Publication date: June 18, 2015Inventors: Jörg Palm, Martin Fürfanger, Stefan Jost
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Publication number: 20140363916Abstract: A transportable process box for processing substrates coated on one side is described. The box has a base for the placement of a first substrate in a manner such that the latter is supported over the full area, a frame, a cover which is placed onto the frame, and an intermediate element which is arranged between the base and the cover and is intended for the placement of a second substrate in a manner such that the latter is supported over the full area. Arrangements and methods for processing substrates are also described.Type: ApplicationFiled: February 8, 2013Publication date: December 11, 2014Applicant: SAINT-GOBAIN GLASS FRANCEInventors: Martin Fuerfanger, Dang Cuong Phan, Stefan Jost
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Publication number: 20130216967Abstract: A device for continuous heat-treating of at least two multilayer bodies on at least two process levels disposed one beneath another in at least one heating chamber and at least one cooling chamber, which are arranged one after another is described. The heating chamber of the device has a first process level and a second process level. The cooling chamber of the device has a cooling device, the first process level and the second process level.Type: ApplicationFiled: August 25, 2011Publication date: August 22, 2013Applicant: Saint-Gobain Glass FranceInventors: Martin Fürfanger, Stefan Jost
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Publication number: 20130129329Abstract: The invention relates to a heat treatment inner chamber (3) for thermally processing a substrate (20), having walls (10) which enclose an inner space (24) of the heat treatment inner chamber (3), having a mounting apparatus (8) for mounting the substrate (20) during the thermal processing and having an energy source (11) for introducing energy into the inner space (24) of the heat treatment inner chamber (3), at least one part of the inner sides of the walls (10) being formed in order to reflect power introduced by the energy source (11), wherein the at least one part of the inner sides of the walls (10) consists of a material which is highly reflective at least for infrared radiation.Type: ApplicationFiled: February 14, 2011Publication date: May 23, 2013Applicants: SAINT-GOBAIN GLASS FRANCE, LEYBOLD OPTICS GMBHInventors: Andreas Caspari, Stefan Henkel, Jutta Trube, Sven Stille, Martin Fürfanger
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Publication number: 20130067723Abstract: A device for forming a reduced chamber space, which is a process box or a process hood, containing an apparatus, which positions at least two multilayer bodies each including a surface to be processed, wherein the apparatus is designed such that the multilayer bodies are opposite to each other, wherein the surfaces to be processed are facing away from each other such that the multilayer bodies can be processed as a multilayer body arrangement in a processing system. In addition, a method for positioning the two multilayer bodies comprising a surface to be processed, with the two multilayer bodies disposed in such a device such that multilayer bodies are opposite each other, wherein the surfaces to be processed are facing away from each other, such that the multilayer bodies are processable as a multilayer body arrangement in a processing system.Type: ApplicationFiled: February 22, 2011Publication date: March 21, 2013Applicant: SAINT-GOBAIN GLASS FRANCEInventors: Joerg Palm, Stefan Jost, Martin Fuerfanger, Jessica Hartwich
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Publication number: 20130029479Abstract: The invention relates to a multilayer body arrangement, which comprises at least two multilayer bodies each having at least one surface to be processed as well as at least one device for positioning the multilayer bodies, wherein the device is configured such that the respective surfaces to be processed are opposite each other and thus form a quasi-closed processing space disposed between the surfaces, in which the processing occurs. It further relates to a system for processing multilayer bodies with such a multilayer body arrangement, as well as a method for processing multilayer bodies, wherein the multilayer bodies are disposed such that the respective surfaces to be processed are opposite each other and thus form a quasi-closed processing space disposed between the surfaces, in which the processing occurs.Type: ApplicationFiled: February 22, 2011Publication date: January 31, 2013Applicant: SAINT-GOBAIN GLASS FRANCEInventors: Stefan Jost, Joerg Palm, Martin Fuerfanger
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Patent number: 8187377Abstract: The present invention provides for treating a surface of a semiconductor material. The method comprises exposing the surface of the semiconductor material to a halogen etchant in a hydrogen environment at an elevated temperature. The method controls the surface roughness of the semiconductor material. The method also has the unexpected benefit of reducing dislocations in the semiconductor material.Type: GrantFiled: October 4, 2002Date of Patent: May 29, 2012Assignee: Silicon Genesis CorporationInventors: Igor J. Malik, Sien G. Kang, Martin Fuerfanger, Harry Kirk, Ariel Flat, Michael Ira Current, Philip James Ong
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Patent number: 6899762Abstract: A semiconductor wafer with a front surface and a back surface and an epitaxial layer of semiconducting material deposited on the front surface. In the semiconductor wafer, the epitaxial layer has a maximum local flatness value SFQRmax of less than or equal to 0.13 ?m and a maximum density of 0.14 scattered light centers per cm2. The front surface of the semiconductor wafer, prior to the deposition of the epitaxial layer, has a surface roughness of 0.05 to 0.29 nm RMS, measured by AFM on a 1 ?m×1 ?m reference area. Furthermore, there is a process for producing the semiconductor wafer.Type: GrantFiled: March 28, 2003Date of Patent: May 31, 2005Assignee: Siltronic AGInventors: Guido Wenski, Wolfgang Siebert, Klaus Messmann, Gerhard Heier, Thomas Altmann, Martin Fürfanger
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Publication number: 20040067644Abstract: The present invention provides for treating a surface of a semiconductor material. The method comprises exposing the surface of the semiconductor material to a halogen etchant in a hydrogen environment at an elevated temperature. The method controls the surface roughness of the semiconductor material. The method also has the unexpected benefit of reducing dislocations in the semiconductor material.Type: ApplicationFiled: October 4, 2002Publication date: April 8, 2004Inventors: Igor J. Malik, Sien G. Kang, Martin Fuerfanger, Harry Kirk, Ariel Flat, Michael Ira Current, Philip James Ong
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Patent number: 6217212Abstract: A method and device for detecting an incorrect position of a semiconductor wafer during a high-temperature treatment of the semiconductor water in a quartz chamber which is heated by IR radiators, has the semiconductor wafer lying on a rotating support and being held at a specific temperature with the aid of a control system. Thermal radiation which is emitted by the semiconductor wafer and the IR radiators is recorded using a pyrometer. The radiation temperature of the recorded thermal radiation is determined. The semiconductor wafer is assumed to be in an incorrect position if the temperature of the recorded thermal radiation fluctuates to such an extent over the course of time that the fluctuation width lies outside a fluctuation range &Dgr;T which is regarded as permissible.Type: GrantFiled: October 28, 1998Date of Patent: April 17, 2001Assignee: Wacker Siltronic Gesellschaft für Halbleitermaterialien AGInventors: Georg Brenninger, Wolfgang Sedlmeier, Martin Fürfanger, Per-Ove Hansson