Abstract: Disclosed is an enossal implant comprising a surface layer (28) which is made of the anatase modification of titanium dioxide and which is deposited on a base structure of the implant, preferably on an intermediate layer (26) of pure titanium, by means of a pulsed reactive magnetron sputtering process.

Abstract: An implant, particularly a stent, and a method for producing such an implant. The implant (10), particularly the stent (11), has a surface (15) that is coated with a thin layer (16) made of titanium (Ti) and titanium dioxide (TiO2), the thin layer (16) having an outer surface layer (17) made of the TiO2 mineral anatase. Particularly preferably, the outer surface layer (17) is formed as a photoactive or photoactivatable, especially photocatalytic or photosensitive layer. The inventive method comprises the following vacuum process steps: plasma pretreatment during which the edges of the base material of the implant are rounded; sputtering of an intermediate layer made of titanium (Ti); sputtering of a surface layer made of the titanium dioxide (TiO2) mineral anatase.