Patents by Inventor Martin Heigl

Martin Heigl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240095797
    Abstract: System for order-receipt processing of an eyeglass lens, including: a receiver configured to receive order data of eyeglass lens, to store a catalog of eyeglass lens classes, which each are defined by a fixed number of predetermined and freely selectable order parameters and differ from each other in the number of freely selectable order parameters, and to classify the order data on the basis of the catalog of eyeglass lens classes, a processor configured to process the order data, to store only the highest eyeglass lens classes of the catalog of eyeglass lens classes, to select one of the highest eyeglass lens classes, to match the order data to the selected highest eyeglass lens class, to generate a respective digital reproduction of the eyeglass lens based on a calculation model and the adapted order data, and a communication device connecting the receiver and the processor.
    Type: Application
    Filed: January 25, 2022
    Publication date: March 21, 2024
    Inventors: Patrick Kerner, Martin Zimmermann, Andrea Heigl, Leonhard Schmid
  • Publication number: 20230369529
    Abstract: Embodiments provide a photodiode having two electrodes and an absorption volume for absorbing photons, wherein the absorption volume has a photon entry area, wherein the two electrodes are configured to generate an electric field in an active region between the two electrodes when a reverse voltage is applied, wherein the electric field runs parallel to the photon entry area, wherein, starting from a surface of a semiconductor substrate of the photodiode, the two electrodes essentially extend orthogonally to the surface in a depth direction of the semiconductor substrate, wherein the photodiode has at least one guard structure formed in the semiconductor substrate that is disposed below at least one of the at least two electrodes.
    Type: Application
    Filed: July 28, 2023
    Publication date: November 16, 2023
    Inventors: Ignaz EISELE, Martin HEIGL, Karl NEUMEIER, Lars NEBRICH, Leonhard STURM-ROGON
  • Publication number: 20230087266
    Abstract: The concept relates to a method for producing a three-dimensionally integrated semiconductor memory. A layer stack having several individual layers of different material types is provided and individual layers of a first material type are etched out selectively from the layer stack by a dry etching process. Individual layers of a third material type are generated either by filling voids with a third material or converting the individual layers of the second material type into the individual layers of the third material type, or by coating the individual layers of the second material type with a material of the third material type. Voids between the individual layers of the third material type can then again be filled with a fourth material, such that individual layers of a fourth material type are formed in these voids.
    Type: Application
    Filed: September 20, 2022
    Publication date: March 23, 2023
    Inventor: Martin HEIGL
  • Patent number: 11467115
    Abstract: According to a further embodiment, a fluid sensor includes a fluid sensor element with a substrate including a recess for receiving a fluid to be examined, wherein the substrate surrounding the recess is formed, at least in parts, as a substrate electrode, an isolation layer arrangement between a floating gate electrode of a transistor and the substrate electrode and a sensor layer in the recess and adjacent to the floating gate electrode, an additional electrode at an opening area of the recess, wherein the additional electrode is arranged electrically isolated from the sensor layer, the substrate electrode and the floating gate electrode and is connected or connectable to a control potential and a processor configured to provide the control potential at the additional electrode such that an electric field between the additional electrode and the sensor layer is at least reduced or compensated during operation of the fluid sensor.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 11, 2022
    Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
    Inventors: Ignaz Eisele, Karl Neumeier, Martin Heigl, Daniel Reiser
  • Publication number: 20200225183
    Abstract: According to a further embodiment, a fluid sensor includes a fluid sensor element with a substrate including a recess for receiving a fluid to be examined, wherein the substrate surrounding the recess is formed, at least in parts, as a substrate electrode, an isolation layer arrangement between a floating gate electrode of a transistor and the substrate electrode and a sensor layer in the recess and adjacent to the floating gate electrode, an additional electrode at an opening area of the recess, wherein the additional electrode is arranged electrically isolated from the sensor layer, the substrate electrode and the floating gate electrode and is connected or connectable to a control potential and a processor configured to provide the control potential at the additional electrode such that an electric field between the additional electrode and the sensor layer is at least reduced or compensated during operation of the fluid sensor.
    Type: Application
    Filed: March 26, 2020
    Publication date: July 16, 2020
    Inventors: Ignaz EISELE, Karl NEUMEIER, Martin HEIGL, Daniel REISER
  • Patent number: 9312397
    Abstract: A transistor structure includes a first terminal region, a second terminal region and a channel region therebetween in a semiconductor substrate. Additionally, the transistor structure includes a control electrode associated with the channel region, the control electrode having a control electrode portion which is elastically deflectable under the action of a force and spaced apart from the channel region. The distance between the control electrode portion and the channel region is changed based on the action of force.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: April 12, 2016
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forshung e.V.
    Inventors: Ignaz Eisele, Martin Heigl, Karl Haberger