Abstract: The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device.

Abstract: The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device.

Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.

Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.

Abstract: The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.

Abstract: The invention relates to a process for producing a photonic crystal which consists of a material of high refractive index, comprising the following process steps: a) providing a polymer structure with crosslinked air pores, whose surface has empty interstitial sites, b) applying a homogeneous, isotropic thin coating material to the surface of the polymer structure, c) introducing a high-index material, d) opening up a route to the polymer or to the coating material applied in step b), e) removing the layer applied in step b), f) removing the polymeric structure.