Patents by Inventor Martin J. Harris

Martin J. Harris has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selective and precise etching and plating of conductive substrates
    Patent number: 5202222
    Abstract: Method for selective and precise etching and plating of a conductive substrate through electrophoretic deposition of a photoresist composition. The invention enables chemical milling and plating of products useful in high performance applications such as lead frames with lead widths less than 1.0 mil and precisely plated lead faces.
    Type: Grant
    Filed: March 1, 1991
    Date of Patent: April 13, 1993
    Assignee: Shipley Company Inc.
    Inventors: Martin J. Harris, Ivan K. Ho
  • Apparatus and process for electrophoretic deposition
    Patent number: 5196098
    Abstract: A method and apparatus for electrodeposition of insulating coatings such as photoresists having uniform thickness throughout the coating. The apparatus comprises one or more cathodes disposed in a bath containing an electrophoretic depositing composition, one or more anodes disposed in said bath in face to face relationship with the cathode, and means for applying a voltage between the anode and the cathode to produce a current whereby a current density gradient is formed on the cathode, the gradient comprising high and low current density areas. The anode of the present invention is configured so that the anode is concentrated opposite the high current density areas of the cathode, thereby controlling the thickness of deposition by controlling the amount of current flowing to the cathode.
    Type: Grant
    Filed: January 4, 1988
    Date of Patent: March 23, 1993
    Assignee: Shipley Company Inc.
    Inventors: Stephen S. Rodriguez, Martin J. Harris, Wayne T. Smith