Abstract: Exemplary embodiments of methodologies of improving hygiene metric, methodologies of training observers, and software products for improving hygiene metrics are disclosed herein. An exemplary methodology of improving hand-hygiene includes obtaining data indicative of the number of opportunities for one or more users to obtain a dose of hand cleaner for a plurality of dispensers through an electronic monitoring system. In addition, the exemplary methodology includes obtaining data indicative of dispense events by the plurality of dispensers through the electronic monitoring system. The methodology further includes determining a metric for the one or more users as a function of the data indicative of the number of opportunities and the data indicative of dispense events and providing instructions for an observer to obtain observation data related to the one or more users as a function of the metric.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to merged mandrel lines and methods of manufacture. The structure includes: at least one metal line having a first dimension in a self-aligned double patterning (SADP) line array; and at least one metal line having a second dimension inserted into the SADP line array, the second dimension being different than the first dimension.

Abstract: Exemplary embodiments of methodologies of improving hygiene metric, methodologies of training observers, and software products for improving hygiene metrics are disclosed herein. An exemplary methodology of improving hand-hygiene includes obtaining data indicative of the number of opportunities for one or more users to obtain a dose of hand cleaner for a plurality of dispensers through an electronic monitoring system. In addition, the exemplary methodology includes obtaining data indicative of dispense events by the plurality of dispensers through the electronic monitoring system. The methodology further includes determining a metric for the one or more users as a function of the data indicative of the number of opportunities and the data indicative of dispense events and providing instructions for an observer to obtain observation data related to the one or more users as a function of the metric.

Abstract: Exemplary embodiments of methodologies of improving hygiene metric, methodologies of training observers, and software products for improving hygiene metrics are disclosed herein. An exemplary methodology of improving hand-hygiene includes obtaining data indicative of the number of opportunities for one or more users to obtain a dose of hand cleaner for a plurality of dispensers through an electronic monitoring system. In addition, the exemplary methodology includes obtaining data indicative of dispense events by the plurality of dispensers through the electronic monitoring system. The methodology further includes determining a metric for the one or more users as a function of the data indicative of the number of opportunities and the data indicative of dispense events and providing instructions for an observer to obtain observation data related to the one or more users as a function of the metric.

Abstract: Methods of forming an interconnect of an IC are disclosed. The methods include forming a first interlayer dielectric (ILD) layer and a second ILD layer with an ILD etch stop layer (ESL) therebetween. The ILD ESL has an etch rate that is at least five times slower than the first and second ILD layers, and may include, for example, aluminum oxynitride. A dual damascene (DD) hard mask is used to form a wire trench opening in the second ILD layer and a via opening in the first ILD layer, creating a via-wire opening. Due to the slower etch rate, the ILD ESL defines the via opening in the first ILD layer as a chamferless via opening. A unitary via-wire conductive structure coupled to the conductive structure in the via-wire opening can be formed from the via-wire opening.

Abstract: Methods of forming an interconnect of an IC are disclosed. The methods include forming a first interlayer dielectric (ILD) layer and a second ILD layer with an ILD etch stop layer (ESL) therebetween. The ILD ESL has an etch rate that is at least five times slower than the first and second ILD layers, and may include, for example, aluminum oxynitride. A dual damascene (DD) hard mask is used to form a wire trench opening in the second ILD layer and a via opening in the first ILD layer, creating a via-wire opening. Due to the slower etch rate, the ILD ESL defines the via opening in the first ILD layer as a chamferless via opening. A unitary via-wire conductive structure coupled to the conductive structure in the via-wire opening can be formed from the via-wire opening.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to merged mandrel lines and methods of manufacture. The structure includes: at least one metal line having a first dimension in a self-aligned double patterning (SADP) line array; and at least one metal line having a second dimension inserted into the SADP line array, the second dimension being different than the first dimension.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to merged mandrel lines and methods of manufacture. The structure includes: at least one metal line having a first dimension in a self-aligned double patterning (SADP) line array; and at least one metal line having a second dimension inserted into the SADP line array, the second dimension being different than the first dimension.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to merged mandrel lines and methods of manufacture. The structure includes: at least one metal line having a first dimension in a self-aligned double patterning (SADP) line array; and at least one metal line having a second dimension inserted into the SADP line array, the second dimension being different than the first dimension.

Abstract: Exemplary embodiments of methodologies of improving hygiene metric, methodologies of training observers, and software products for improving hygiene metrics are disclosed herein. An exemplary methodology of improving hand-hygiene includes obtaining data indicative of the number of opportunities for one or more users to obtain a dose of hand cleaner for a plurality of dispensers through an electronic monitoring system. In addition, the exemplary methodology includes obtaining data indicative of dispense events by the plurality of dispensers through the electronic monitoring system. The methodology further includes determining a metric for the one or more users as a function of the data indicative of the number of opportunities and the data indicative of dispense events and providing instructions for an observer to obtain observation data related to the one or more users as a function of the metric.

Abstract: A computer process which permits easy management of one or more season ticket packages for a ticket administrator. A schedule of games is color-coded to readily indicate ticket availability. The color-codes indicate to the user whether tickets for the game in question are all available, partially available, or not available. The user may place requests for tickets and, should more than one ticket package be available, indicate the ticket package for which tickets are requested. A ticket administrator can review the ticket requests, and convert the ticket requests into a reservation, whereupon the schedule codes are updated to conform with the modified ticket availability.