Abstract: Apparatus can prewet at least one filter with a supply of liquid and a supply of wetting agent. The apparatus has a container for holding at least the one filter. The apparatus also has a flow arrangement including a circulating subsystem and flushing subsystem. The circulating subsystem is connected to the container and the supply of wetting agent for: (a) circulating the wetting agent through the container during an initial phase, and (b) draining the wetting agent during a subsequent phase back to the supply of liquid. The flushing subsystem is connected to the container and is adapted to be coupled to the supply of liquid for flushing the liquid through the container. After loading a filter into the container, wetting agent is circulated through the container in the initial phase. Then the wetting agent is drained back to the supply of liquid in the subsequent phase. The liquid is flushed through the container without reopening the container, before removing the filter from the container.

Abstract: A compact solvent reprocessing system for use in a limited physical area. Solvents to be reprocessed is contacted by deionized water in a water wash column and delivered to a distillation column where waste solvent is separated from materials that boil at a higher temperature than the waste solvent. Distilled solvent is delivered to a drying column and final filters for removal of any other foreign materials. The modular solvent reprocessing system to reclaim/recycle high purity solvents on-site at a manufacturing facility. A system includes a pumpless pressurized tank solvent transfer units, storage tanks, liquid-liquid extraction column, distillation columns, submicron filtration units, and water and acid adsorption columns arranged as necessary to produce ultra-high purity solvents from waste solvent streams. The systems are packaged in modular assemblies with secondary containment to meet U.S. EPA requirements.

Abstract: Microprocessor controlled isopropyl alcohol vapor dryer system for robotic drying of wafer cassettes containing wafers or substrates. A wetted wafer or substrate is robotically placed into a virgin isopropyl alcohol vapor zone. The wetted surface and free-moving contaminants are replaced by a layer of isopropyl alcohol (IPA) which condenses on the surface. The dryer then robotically moves the IPA coated wafer or substrate into an upper cooling zone causing the isopropyl alcohol layer to flash off of the substrate surface, leaving the surface completely dry to a molecular level. IPA vapors are heated at the bottom of a quartz tank and maintained as a vapor by electric heating panels surrounding the quartz tank.