Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.

Abstract: The invention relates to compositions, having a) 1.00 to 65.00% by weight of at least one compound of formula (I), wherein R1, R2 are each independently H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; R3, R4, R5 are each independently H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; R6 is H or C1-C6-alkyl; k is 1, 2, 3, 4 or 5, as component A; b) 1.00 to 60.00% by weight of at least one monomer having two (meth)acrylate groups and 1 having a molecular weight Mw of no more than 500 Dalton, as component B; c) 0 to 25% by weight of at least one monomer having at least three (meth)acrylate groups and having a molecular weight Mw of no more than 600 Dalton, as component C; and d) 1.00 to 30.00% by weight of at least one polymer having at least two (meth)acrylate groups and having a molecular weight Mw of at least 700 Dalton, as component D; with the proviso that the amount of components A+B is at least 50% by weight, as well as the use of these compositions as printing inks, in particular inkjet printing inks.

Abstract: The invention relates to compositions, comprising a) 1.00 to 65.00% by weight of at least one compound of formula (I), wherein R1, R2 are each independently H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; R3, R4, R5 are each independently H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; R6 is H or C1-C6-alkyl; k is 1, 2, 3, 4 or 5, as component A; b) 1.00 to 60.00% by weight of at least one monomer having two (meth)acrylate groups and 1 having a molecular weight Mw of no more than 500 Dalton, as component B; c) 0 to 25% by weight of at least one monomer having at least three (meth)acrylate groups and having a molecular weight Mw of no more than 600 Dalton, as component C; and d) 1.00 to 30.00% by weight of at least one polymer having at least two (meth)acrylate groups and having a molecular weight Mw of at least 700 Dalton, as component D; with the proviso that the amount of components A+B is at least 50% by weight, as well as the use of these compositions as printing inks, in particular inkjet printing inks.

Abstract: A curable composition comprises a) at least one epoxide compound E having at least two epoxide groups; b) at least one amine A having at least two amine hydrogens; and c) at least one acrylic ester U; wherein the epoxide compound E comprises at least one epoxide compound E?, the amine A comprises at least one amine A?, and the acrylic ester U comprises at least one acrylic ester U? whose Hansen solubility parameters for the dipole forces ?p and for the specific interactions ?h satisfy the following conditions: ( ? p ? ( U ? ) - ? p ? ( E ? ) ) 2 + ( ? h ? ( U ? ) - ? h ? ( E ? ) ) 2 ? 1.5 ? ? and ( ? p ? ( U ? ) 2 + ? h ? ( U ? ) 2 ) - ( ? p ? ( A ? ) 2 + ? h ? ( A ? ) 2 ) ? 0 . A suitable choice of the Hansen solubility parameters of the constituents ensures that the acrylic ester is incorporated covalently into the curing material, preventing subsequent evaporation of the diluent.

Abstract: The present invention relates to a polymer composition comprising a cycloalkyl alkyl dicarboxylic diester as plasticizer, to molding compositions and plastisols each comprising such a polymer composition, and to the use of these polymer compositions.

Abstract: A process for preparing an ester of (meth)acrylic acid or a derivative thereof comprises reacting (meth)acrylic acid or a derivative thereof with glycerol carbonate at a reaction temperature of 10 to 150° C. without a solvent in the presence of at least one enzyme catalyzing the esterification reaction.

Abstract: The invention relates to compositions, comprising. a) 1.00 to 65.00% by weight of at least one compound of formula (I), wherein R1, R2, R3, R4 are each independently H, C1-C6-alkyl, C1-C6-alkoxy, or C1-C6-alkoxy-C1-C6-alkyl; R is H or C1-C6-alkyl; X is CR6R7, O, or NR8; R6R7 are each independently H, C1-C6-alkyl, C1-C6-alkoxy, or C1-C6-alkoxy-C1-C6-alkyl; R8 is H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; k is 1, 2, 3, 4 or 5, as component A; b) 1.00 to 60.00% by weight of at least one monomer having two (meth)acrylate groups and having a molecular weight of no more than 500 Dalton, as component B; c) 0 to 25% by weight of at least one monomer having at least three (meth)acrylate groups and having a molecular weight of no more than 600 Dalton, as component C; and d) 1.00 to 30.

Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.

Abstract: A process for preparing an ester of (meth)acrylic acid or a derivative thereof comprises reacting (meth)acrylic acid or a derivative thereof with glycerol carbonate at a reaction temperature of 10 to 150° C. without a solvent in the presence of at least one enzyme catalyzing the esterification reaction.

Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.

Abstract: The invention relates to compositions, comprising. a) 1.00 to 65.00% by weight of at least one compound of formula (I), wherein R1, R2, R3, R4 are each independently H, C1-C6-alkyl, C1-C6-alkoxy, or C1-C6-alkoxy-C1-C6-alkyl; R is H or C1-C6-alkyl; X is CR6R7, O, or NR8; R6R7 are each independently H, C1-C6-alkyl, C1-C6-alkoxy, or C1-C6-alkoxy-C1-C6-alkyl; R8 is H, C1-C6-alkyl, or C1-C6-alkoxy-C1-C6-alkyl; k is 1, 2, 3, 4 or 5, as component A; b) 1.00 to 60.00% by weight of at least one monomer having two (meth)acrylate groups and having a molecular weight of no more than 500 Dalton, as component B; c) 0 to 25% by weight of at least one monomer having at least three (meth)acrylate groups and having a molecular weight of no more than 600 Dalton, as component C; and d) 1.00 to 30.

Abstract: A process for preparing isosorbide di(meth)acrylate by transesterifying alkyl (meth)acrylate with isosorbide, comprising the steps of: (i) reacting alkyl (meth)acrylate with isosorbide in the presence of a catalyst comprising titanium(IV) or zirconium(IV) and a stabilizer in the presence of an azeotroping agent which forms an azeotrope with the alcohol bound in the alkyl (meth)acrylate, (ii) continuously distilling off the azeotrope of azeotroping agent and alcohol, wherein steps (i) and (ii) are conducted simultaneously until the isosorbide has been essentially fully converted, (iii) adding water to the product mixture which comprises isosorbide (meth)acrylate and is obtained in steps (i) and (ii) and removing the hydrolyzate of the catalyst comprising titanium(IV) or zirconium(IV), (iv) distilling unconverted alkyl (meth)acrylate and azeotroping agent out of the product mixture, (v) distilling off water from the product mixture, wherein step (iv) can also be conducted before step (iii) and steps (iv) and

Abstract: The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst, and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase and the organic phase is conducted through a column in which the organic phase is run counter to at least a portion of the vapor, and the organic phase is collected in the lower region of the column and at least partly passed into the dispersing tank.

Abstract: The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst, a reaction suspension is drawn off from a region between the upper region and the lower region of the reactor, a first stream of the reaction suspension is recycled into the upper region of the reactor and a second stream of the reaction suspension is introduced into the lower region of the reactor, and the reaction suspension is thus mixed, wherein the stream drawn off and/or the first stream is passed through a heat exchanger outside the reactor and heated; and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase and the

Abstract: The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst, and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase, the organic phase is dewatered and the dewatered organic phase is passed at least partly into the dispersing tank.

Abstract: The present invention relates to a polymer composition comprising a cycloalkyl alkyl dicarboxylic diester as plasticizer, to molding compositions and plastisols each comprising such a polymer composition, and to the use of these polymer compositions.

Abstract: A laser arrangement cleans baking surfaces configured in a relief-like manner and optionally cleans evaporation and/or sealing strips of baking plates of a baking machine. The laser arrangement has a laser source for outputting a laser beam onto a locally selectable target area by continuous variation of the output direction of the laser beam and traversing a contour forming the target area. Deflecting optics are arranged at a distance from the laser source and in the target area of the laser source for deflecting the laser beam and for projecting the target area formed by the contour onto the baking plate to be cleaned along a projection direction. The deflecting optics has a device for adjustment for varying the projection direction and the outlet direction of the laser beam.

Abstract: The present invention relates to a process for the production of carboxylic esters by reaction of carboxylic acids and/or carboxylic anhydrides with at least one alcohol selected from alkanols having at least 5 carbon atoms, cycloalkanols, and alkoxy-alkanols, in the presence of an acidic esterification catalyst. The invention further relates to the use of the resultant carboxylic esters as plasticizers or in a plasticizer composition for thermoplastic polymers and elastomers.

Abstract: A curable composition comprises a) at least one epoxide compound E having at least two epoxide groups; b) at least one amine A having at least two amine hydrogens; and c) at least one acrylic ester U; wherein the epoxide compound E comprises at least one epoxide compound E?, the amine A comprises at least one amine A?, and the acrylic ester U comprises at least one acrylic ester U? whose Hansen solubility parameters for the dipole forces ?p and for the specific interactions ?h satisfy the following conditions: ?{square root over ((?p(U?)??p(E?))2+(?h(U?)??h(E?))2)}?1.5 and ?{square root over ((?p(U?)2??h(U?)2))}??{square root over ((?p(A?)2+?h(A?)2))}?0. A suitable choice of the Hansen solubility parameters of the constituents ensures that the acrylic ester is incorporated covalently into the curing material, preventing subsequent evaporation of the diluent.

Abstract: The present invention relates to a process for preparing a terephthalic diester by reacting terephthalic acid with at least one alcohol, wherein terephthalic acid is suspended in the alcohol in a dispersing tank, the preliminary suspension is passed from the dispersing tank into a reactor and converted in the presence of an esterification catalyst to obtain a reaction suspension, a stream of the reaction suspension is drawn off from the reactor, passed through a heat exchanger outside the reactor and heated and the heated reaction suspension is recycled into the reactor, and water of reaction is distilled off together with the vapor as alcohol-water azeotrope, the vapor is at least partly condensed, the condensate is separated into an aqueous phase and an organic phase and the organic phase is at least partly recycled into the reactor.