Patents by Inventor Martin Kranz

Martin Kranz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for cleaning substrates
    Patent number: 6908865
    Abstract: Generally, a method for pre-cleaning native oxides and other contaminants from apertures on a substrate is provided. In one embodiment, a method for pre-cleaning apertures on a substrate includes disposing the substrate on a support member in a process chamber, cooling the substrate at least to a temperature of 100 degrees Celsius, and exposing the substrate to a pre-clean process. In another embodiment, a method for pre-cleaning apertures on a substrate includes cooling the substrate at least to a temperature of 100 degrees Celsius in a first chamber, transferring the substrate to a second chamber and pre-cleaning the substrate in the second chamber while maintaining a substrate temperature of 100 degrees Celsius.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: June 21, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Martin Kranz, Srinivas Guggilla, Suraj Rengarajan, Mei Chang, Gongda Yao, Nitin Khurana, Gilbert Hausmann
  • Telecommunication system, particularly for transferring software programs, adapted method and slide-in cassette
    Publication number: 20040110564
    Abstract: The invention relates to a telecommunication system, a method for operating said telecommunication system and a slide-in cassette which provides the user with improved operating convenience when selecting data from software programs. According to the invention, the telecommunication system comprises a switching unit for providing a software program, at least one mobile radio station associated with the switching unit and a user support configured specially for the software program.
    Type: Application
    Filed: December 16, 2003
    Publication date: June 10, 2004
    Inventors: Thomas Kern, Martin Kranz
  • Method and apparatus for cleaning substrates
    Publication number: 20030062333
    Abstract: Generally, a method for pre-cleaning native oxides and other contaminants from apertures on a substrate is provided. In one embodiment, a method for pre-cleaning apertures on a substrate includes disposing the substrate on a support member in a process chamber, cooling the substrate at least to a temperature of 100 degrees Celsius, and exposing the substrate to a pre-clean process. In another embodiment, a method for pre-cleaning apertures on a substrate includes cooling the substrate at least to a temperature of 100 degrees Celsius in a first chamber, transferring the substrate to a second chamber and pre-cleaning the substrate in the second chamber while maintaining a substrate temperature of 100 degrees Celsius.
    Type: Application
    Filed: December 12, 2001
    Publication date: April 3, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Martin Kranz, Srinivas Guggilla, Suraj Rengarajan, Mei Chang, Gongda Yao, Nitin Khurana, Gilbert Hausmann