Abstract: A process for forming UV absorber layers on an inorganic or organic substrate is described. That process comprises a) allowing a low-temperature plasma, a corona discharge or high-energy radiation to act on the inorganic or organic substrate, b) applying to the treated inorganic or organic substrate at least one free-radical-forming initiator and at least one UV absorber containing at least one ethylenically unsaturated group, and, optionally in the form of melts, solutions, suspensions or emulsions, at least one synergist and/or at least one ethylenically unsaturated compound, c) heating the coated substrate and/or irradiating it with electromagnetic waves. The invention relates also to a substrate provided with a UV absorber layer in accordance with that process. That process substantially eliminates vacuum conditions and excessive thermal stress or energy stress and also destruction of the UV absorber.

Abstract: The invention relates to a process and to the corresponding apparatus for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step: a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step: b) one or more photoinitiators or mixtures of photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied at normal pressure to the inorganic or organic substrate, in a third step: c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) the substrate so pretreated is provided with a coating and the coating is cured or dried.

Abstract: The invention relates to ?-hydroxy ketones of formula I or IIa; or mixtures of compounds of formula I and II; or mixtures of compounds of formulae Ia and IIa

Abstract: The invention relates to a stabilized peroxydicarbonate preparation and its use in the polymerization or copolymerization of ethylenically unsaturated compounds.

Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligo

Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 1

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligo

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate that comprises, in a first step a) subjecting the inorganic or organic substrate to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, then discontinuing the radiation or discharge; in a further step b) under vacuum or at normal pressure, applying one or more photoinitiators containing at least one ethylenically unsaturated group to the inorganic or organic substrate, and allowing reaction with the free-radical sites formed there; and c1) coating the substrate so precoated with photoinitiator with a composition comprising at least one ethylenically unsaturated monomer or oligomer, and curing the coating by means of UV/VIS radiation or c2) depositing a metal, semi-metal oxide or metal oxide from the gaseous phase, in the presence of UV light, on the substrate so precoated with photoinitiator.

Abstract: The present invention relates to mixtures of reactive dyes comprising at least two dyes selected from the group consisting of the general formulae (1), (2) and (3) where D1, D2, D3, R1, R2, Hal and M are each as defined in claim 1, processes for their preparation and their use for dyeing and printing hydroxyl- and/or carboxamido-containing materials.

Abstract: The invention relates to the use of oximesulfonic acid esters of formula I 1

Abstract: Compounds of the formula I or I′ in which R1 and R2 independently of one another, for example, are an aromatic hydrocarbon, with the proviso that the aromatic hydrocarbon radical is substituted in at least one o-position, or R1 and R2, for example, independently of one another are C1-C20alkyl, which is substituted by R9R10R11Si; R2a is, for example, a divalent aromatic hydrocarbon radical; R3 is C1-C20alkyl which is substituted by R9R10R11Si or is an aromatic hydrocarbon; R4 is, for example, C1-C20alkyl, C3-C12cycloalkyl or phenyl-C1-C6alkyl; E is R14R15R16P or R8R8aR7N; R7, R8 and R8a and R9, R10 and R11 independently of one another are, for example, C1-C12alkyl; R14, R15 and R16 independently of one another are substituted phenyl and G is a radical which is able to form positive ions, with the proviso that, if R1, R2 and R3 are 2,4,6-trimethylphenyl, R4 is not C2-C20alkyl or C2-C8alkenyl, are suitable for use as particularly reactive photoinitiators.

Abstract: Dye compounds of the formula ##STR1## wherein X is for example CH, C--CH.sub.3 or .sup.+ NOR L.sup.- ; R is inter alia C.sub.1 -C.sub.6 alkyl; R.sub.1 is for example C.sub.1 -C.sub.8 alkoxy or C.sub.1 -C.sub.12 alkyl; s is 0 to 4; R.sub.2 is for example hydrogen; Ar is for example a group ##STR2## Y inter alia is C.sub.1 -C.sub.6 alkyl or C.sub.1 -C.sub.6 alkoxy; r in the formula (A) is 0 to 5, in the formulae (B) and (E) is 0 to 9 and in the formula (D) is 0 to 7; and L is an anion;in combination with an electron donor compound, especially a borate compound, are suitable as photoinitiators for the photopolymerization of radically polymerizable compositions.

Abstract: Compounds of formula (I), ##STR1## wherein X is CH, C--CH.sub.3, C--Cl, C--O--C.sub.1 -C.sub.8 alkyl or N; R is C.sub.1 -C.sub.6 alkyl, benzyl, CH.sub.2 COOR.sub.3 or a group (a); R.sub.1 is C.sub.1 -C.sub.8 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen, NO.sub.2, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.sub.1 -C.sub.6 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen or CF.sub.3 ; R.sub.2 is C.sub.1 -C.sub.8 alkoxy, C.sub.1 -C.sub.12 alkyl, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.sub.1 -C.sub.6 alkoxy, C.sub.1 -C.sub.12 alkyl, halogen or CF.sub.3 ; R.sub.3 is hydrogen, C.sub.1 -C.sub.12 alkyl or benzyl; Y is unsubstituted or C.sub.1 -C.sub.6 alkoxy-substituted C.sub.1 -C.sub.6 alkyl, or Y is C.sub.1 -C.sub.6 alkoxy, halogen, CF.sub.3, NO.sub.2, benzyloxy or phenyloxy, wherein the phenyl ring in the benzyloxy or phenyloxy group is unsubstituted or substituted by C.

Abstract: Compounds of the formula I and II ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 are, for example, unsubstituted or substituted phenyl, where none of the radicals R.sub.1 -R.sub.3 is a phenyl radical which is substituted ortho to the bond to the borate atom;R.sub.1 ', R.sub.2 ', R.sub.3 ' have one of the meanings of R.sub.1 -R.sub.3 ;R.sub.4 and R.sub.5 are OH or OR.sub.6 or have one of the meanings of R.sub.1 -R.sub.3 and the radicals R.sub.1 ', R.sub.2 ', R.sub.3 ', R.sub.4 and R.sub.5 can also be substituted ortho to the bond to the borate atom;R.sub.6 is, for example, unsubstituted or C.sub.1 -C.sub.12 alkoxy- or halo-substituted C.sub.1 -C.sub.12 alkyl;X is, for example, C.sub.1 -C.sub.20 alkylene which is unsubstituted or substituted or which is interrupted by one or more aromatic hydrocarbons, or X is, for example, C.sub.3 -C.sub.12 cycloalkylene or polycycloalkylene; andZ.sup.

Abstract: Compounds of the formula I ##STR1## in which n and o are a number from 0 to 50, m is a number from 1 to 50, u and v are 0 or 1, and at least one of the indices u and v is 1, R.sub.1, R.sub.2, R.sub.2a, R.sub.3 and R.sub.4 independently of one another are, for example, aromatic hydrocarbons, R.sub.5, if n and o are 0, is for example C.sub.1 -C.sub.12 alkyl and, if n and/or o are greater than 0, or if n and o are 0 and at the same time only one index u or v is 1, R.sub.5 may additionally, for example, be an aromatic hydrocarbon, at least one of the radicals R.sub.1, R.sub.2, R.sub.2a, R.sub.3, R.sub.4 and R.sub.5 being an aromatic hydrocarbon radical which is sterically hindered ortho to the boron atom, X is, for example, C.sub.1 -C.sub.20 alkylene, phenylene, biphenylene, etc., and Z is a radical which is able to form positive ions, are suitable as photoinitiators, both the compounds per se and their combination with dyes or other electron acceptors.

Abstract: Compounds of formula I, II or III ##STR1## X is a divalent radical; Y is C.sub.1 -C.sub.6 aklylene, cyclohexylene or a direct bond;Ar.sub.1 is an aromatic radical as defined in claim 1,R.sub.1 and R.sub.2 are each independently the other, inter alia, a radical of formula ##STR2## in which p is zero or 1, or a radical of formula ##STR3## R.sub.3 is, inter alia, hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.3 alkyl;R.sub.4 is, inter alia, C.sub.1 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.3 alkyl or phenyl;or an acid addition salt of a compound of formula I, II or III;are useful as photosensitive base catalysts in base crosslinking compositions.

Abstract: The invention relates to photopolymerizable compositions comprising as photoinitiator a borate of the formula I or I' ##STR1## R.sub.1, R.sub.2 and R.sub.3 are, for example and independently of one another, phenyl or another aromatic hydrocarbon, with or without any heteroatoms, which radicals are unsubstituted or are substituted, or the radicals R.sub.1 and R.sub.2 form bridges to produce structures of the formula II, IIa or IIb ##STR2## with the provisos that not more than two of the radicals R.sub.1, R.sub.2 and R.sub.3 are identical and either at least two of the radicals R.sub.1, R.sub.2 and R.sub.3 are aromatic hydrocarbon radicals or phenyl radicals which are substituted in both ortho-positions or at least one radical R.sub.1, R.sub.2 or R.sub.3 is a sterically bulky aryl radical and the remaining radicals of R.sub.1, R.sub.2 and R.sub.3 are aromatic hydrocarbon radicals or are phenyl radicals which are substituted in at least one ortho-position; R.sub.4 is, for example, phenyl or C.sub.1 -C.sub.

Abstract: The invention relates to the use of oximesulfonic acid esters of formula I ##STR1## m is 0 or 1 and x is 1 or 2; R.sub.1 is, for example, substituted phenyl, R.sub.2 has, for example, one of the meanings of R.sub.1 or is unsubstituted phenyl, C.sub.1 -C.sub.6 alkanoyl, unsubstituted or substituted benzoyl, C.sub.2 -C.sub.6 alkoxycarbonyl or phenoxycarbonyl; or R.sub.1 and R.sub.2, if necessary together with the CO group, form a ring, R.sub.3, when x is 1, is, for example, C.sub.1 -C.sub.18 alkyl, phenyl or phenanthryl, the radicals phenyl and phenanthryl being unsubstituted or substituted, or R.sub.3, when x is 2, is, for example, C.sub.2 -C.sub.12 alkylene, phenylene or oxydiphenylene, the radicals phenylene and oxydiphenylene being unsubstituted or substituted, as latent acid donors, especially at wavelengths over 390 nm, and to the use of the compounds in the production of photoresists.

Abstract: Compounds of the formula I ##STR1## in which R.sub.1 is, for example, C.sub.1 -C.sub.20 alkyl or phenyl-C.sub.1 -C.sub.6 alkyl which radicals are unsubstitutedor substituted; R.sub.2, R.sub.3 and R.sub.4 independently of one another are phenyl or biphenyl, which radicals are unsubstituted or substituted; wherein the sum of the Hammett .sigma. constants (.SIGMA..sub..sigma.) of the substitutents on the aromatic radicals R.sub.2, R.sub.3 and R.sub.4 is between +0.36 and +2.58; R.sub.8, R.sub.9, R.sub.14, R.sub.15 and R.sub.16 are, for example, C.sub.1 -C.sub.12 alkyl, phenyl-C.sub.1 -C.sub.6 alkyl or phenyl, and G is a radical which is able to form positive ions. These compounds are suitable as photoinitiators for photopolymerizable compositions which contain acid groups, in the presence of a coinitiator if desired.