Abstract: An OTP memory device includes a first and a second doped region of the same polarity in a semiconductor substrate. The second doped region has a higher doping concentration than the first doped region. A source region and a drain region of an opposite polarity are also in the semiconductor substrate. The source is positioned over the lower doped region, and the drain is positioned over the higher doped region. A plurality of anti-fuse devices, separated from each other by a portion of the lower doped region, are each positioned at least partially above a respective portion of the source region (and, in turn, above the lower doped region). A first metal line is coupled to a first subset of the anti-fuse devices, and a second metal line is coupled to a different, second subset of the anti-fuse devices arranged between the anti-fuses in the first subset.

Abstract: An OTP memory device includes a first and a second doped region of the same polarity in a semiconductor substrate. The second doped region has a higher doping concentration than the first doped region. A source region and a drain region of an opposite polarity are also in the semiconductor substrate. The source is positioned over the lower doped region, and the drain is positioned over the higher doped region. A plurality of anti-fuse devices, separated from each other by a portion of the lower doped region, are each positioned at least partially above a respective portion of the source region (and, in turn, above the lower doped region). A first metal line is coupled to a first subset of the anti-fuse devices, and a second metal line is coupled to a different, second subset of the anti-fuse devices arranged between the anti-fuses in the first subset.

Abstract: A method for programming/erasing a non-volatile memory (NVM) includes performing a program/erase operation on a portion of the NVM using a first set of parameters. The method further includes determining whether each cell in the portion of the NVM passes a first margin level, if not determining which one of a set of lower margin levels than the first margin level each cell in the portion of the NVM passes. The method further includes modifying at least one of the set of parameters associated with a subsequent program/erase operation for the portion of the NVM based on the determined one of the set of lower margin levels.

Abstract: A method for programming a non-volatile memory (NVM) cell includes applying an increasing voltage to the current electrode that is used as a source during a read. The initial programming source voltage results in a relatively small number of electrons being injected into the storage layer. Because of the relatively low initial voltage level, the vertical field across the gate dielectric is reduced. The subsequent elevation of the source voltage does not raise the vertical field significantly due to the electrons in the storage layer establishing a field that reduces the vertical field. With less damage to the gate dielectric during programming, the endurance of the NVM cell is improved.

Abstract: A non-volatile memory (NVM) that can be optimized for data retention or endurance is divided into portions that are optimized for one or the other or potentially some other storage characteristic. For the portion allotted for data retention, the memory cells are erased to a relatively greater extent. For the portion allotted for high endurance, the memory cells are erased to a relatively lesser extent. This is conveniently achieved by simply raising the level of the current reference that is used to determine if a cell has been sufficiently erased for the high data retention cells. The higher endurance cells thus will typically receive fewer erase pulses than the memory cells for high data retention. The reduced erasing requirement for the high endurance cells results in overall faster erasing and less stress on the high endurance cells as well as on the circuitry that generates the high erase voltages.