Patents by Inventor Martin Muendel

Martin Muendel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM FOR PROVIDING ELECTRIC VEHICLES
    Publication number: 20230241986
    Abstract: The invention relates to a system for charging and for holding a battery-powered vehicle (20, 30).
    Type: Application
    Filed: March 23, 2021
    Publication date: August 3, 2023
    Inventors: Per-Simon Saal, Andre Müller, Peter Bredemeier, Claus-Martin Mündel, Stefan Honerkamp
  • High Efficiency, Wavelength Stabilized Laser Diode Using AWG's And Architecture For Combining Same With Brightness Conservation
    Publication number: 20070223552
    Abstract: The invention relates to high power semiconductor lasers based on a laser diode array waveguide grating (DAWG) in which the wavelength is stabilized using an array waveguide grating (AWG) in an external cavity configuration. Another aspect of the present invention relates to techniques for efficiently coupling optical gain element arrays to an AWG. Another feature provides for the efficient and brightness-conserving combination of multiple high power DAWG lasers into a single output.
    Type: Application
    Filed: November 17, 2006
    Publication date: September 27, 2007
    Applicant: JDS Uniphase Corporation
    Inventors: Martin Muendel, David Dougherty, Matthew Peters, Victor Rossin, Robert Sargent, Len Marabella, Kuochou Tai, Bruno Acklin, Yongan Wu, Kenneth Dzurko
  • Single Spatial Mode Output Multi-Mode Interference Laser Diode With External Cavity
    Publication number: 20070153859
    Abstract: The invention relates to a conventional broad-area laser having a single-mode output through the phenomenon of multimode interference (MMI) in step-index waveguides. Another aspect of the present invention relates to a very robust multi-mode compound cavity laser design that is fully defined by the geometry and the refractive index profile of the MMI region, which is quite insensitive to slight macro-scale refractive index variations due to manufacturing variation or temperature. As the self-imaging position shifts linearly in the refractive index, the confocal beam parameter can be made relatively long.
    Type: Application
    Filed: November 15, 2006
    Publication date: July 5, 2007
    Applicant: JDS Uniphase Corporation
    Inventors: Martin Muendel, Victor Rossin, Bruno Acklin