Abstract: A photo nanoimprint lithography (P-NIL) resin is disclosed. The P-NIL resin comprises: a cross-linkable organic binder; solvent based inorganic nanoparticles dispersed in the P-NIL resin; and a solvent configured to be evaporated; the P-NIL resin having a viscosity in the range of 4,000 to 6,000 centipoise at 25° C. after the solvent is evaporated prior to curing the P-NIL resin; and the P-NIL resin having a refractive index of greater than 1.6 at 589 nm and glass transition temperature of greater than 50° C.

Abstract: A dual cure, all epoxy adhesive that is both photochemically and thermally curable is disclosed. The adhesive may comprise at least about 93% by weight of one or more polymerizable epoxides, a catalytic amount of a photo-acid generator (PAG) configured to induce acid-catalyzed polymerization of the polymerizable epoxide when exposed to UV or visible light, about 0.01% to about 1% by weight of a redox agent, and a catalytic amount of a thermal acid generator (TAG) configured to induce acid-catalyzed polymerization of the polymerizable epoxide in the presence of the redox agent when exposed to a temperature at or above about 70° C.

Abstract: A dual cure, all epoxy adhesive that is both photochemically and thermally curable is disclosed. The adhesive may comprise at least about 93% by weight of one or more polymerizable epoxides, a catalytic amount of a photo-acid generator (PAG) configured to induce acid-catalyzed polymerization of the polymerizable epoxide when exposed to UV or visible light, about 0.01% to about 1% by weight of a redox agent, and a catalytic amount of a thermal acid generator (TAG) configured to induce acid-catalyzed polymerization of the polymerizable epoxide in the presence of the redox agent when exposed to a temperature at or above about 70° C.