Abstract: The invention relates to a recovery system (10) for recovering a recirculation flow that exits a fuel cell (102) and contains hydrogen, said recovery system comprising an active centrifugal separator (16, 26) designed to separate liquid water from the recirculation flow.

Abstract: The invention relates to an immersion lithography method which illuminates a substrate positioned on a carrier. When a substrate is illuminated, an immersion fluid is introduced between a reproducing element and the substrate and the field depth or the resolution, or both, are adjusted by varying the distance in the direction of the beam between an illuminating reticule and the surface of the substrate along a direction of movement of the carrier.

Abstract: A lithography arrangement and lithographic method is described which permits exposure of a substrate with radiation simultaneously with good intensity and contrast. A means for generating electromagnetic radiation and for directing the electromagnetic radiation onto a mask is provided. The mask has structures that essentially run along a predeterminable course direction on the mask. The electromagnetic radiation is at least partially TM-polarized relative to the course direction, so that the TM-polarized electromagnetic radiation has a polarization direction at an angle of 90° with respect to the course direction. A receptacle device for receiving a substrate to be exposed is positioned so that the radiation impinges on the substrate. A means for rotating the polarization direction of the TM-polarized electromagnetic radiation transmitted through the mask is arranged between the mask and the receptacle device to form TE-polarized electromagnetic radiation.

Abstract: The invention relates to an immersion lithography method which illuminates a substrate positioned on a carrier. When a substrate is illuminated, an immersion fluid is introduced between a reproducing element and the substrate and the field depth or the resolution, or both, are adjusted by varying the distance in the direction of the beam between an illuminating reticule and the surface of the substrate along a direction of movement of the carrier.

Abstract: A lithography arrangement and lithographic method is described which permits exposure of a substrate with radiation simultaneously with good intensity and contrast. A means for generating electromagnetic radiation and for directing the electromagnetic radiation onto a mask is provided. The mask has structures that essentially run along a predeterminable course direction on the mask. The electromagnetic radiation is at least partially TM-polarized relative to the course direction, so that the TM-polarized electromagnetic radiation has a polarization direction at an angle of 90° with respect to the course direction. A receptacle device for receiving a substrate to be exposed is positioned so that the radiation impinges on the substrate. A means for rotating the polarization direction of the TM-polarized electromagnetic radiation transmitted through the mask is arranged between the mask and the receptacle device to form TE-polarized electromagnetic radiation.