Patents by Inventor Martin Piltch

Martin Piltch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210046546
    Abstract: This disclosure describes an additive manufacturing system that includes a build plane having a first region and a second region. Multiple energy source can be positioned above the build plane and configured to direct energy into the first and second regions of the build plane. The system includes optical sensors configured to monitor an intensity of light emitted from the energy sources. A processor associated with the additive manufacturing system is configured to adjust the sensor outputs in response to the energy sources coming into close proximity.
    Type: Application
    Filed: August 26, 2020
    Publication date: February 18, 2021
    Applicant: Sigma Labs, Inc.
    Inventors: R. Bruce Madigan, Mark J. Cola, Scott Betts, Darren Beckett, Alberto M. Castro, Lars Jacquemetton, Martin Piltch
  • Patent number: 10786850
    Abstract: This disclosure describes an additive manufacturing system that includes a build plane having a first region and a second region. Multiple energy source can be positioned above the build plane and configured to direct energy into the first and second regions of the build plane. The system includes optical sensors configured to monitor an intensity of light emitted from the energy sources. A processor associated with the additive manufacturing system is configured to adjust the sensor outputs in response to the energy sources coming into close proximity.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: September 29, 2020
    Assignee: SIGMA LABS, INC.
    Inventors: R. Bruce Madigan, Mark J. Cola, Scott Betts, Darren Beckett, Alberto M. Castro, Lars Jacquemetton, Martin Piltch
  • Publication number: 20200290154
    Abstract: This disclosure describes various methods and apparatus for characterizing an additive manufacturing process. A method for characterizing the additive manufacturing process can include generating scans of an energy source across a build plane; measuring an amount of energy radiated from the build plane during each of the scans using an optical sensing system that monitors two discrete wavelengths associated with a blackbody radiation curve of the layer of powder; determining temperature variations for an area of the build plane traversed by the scans based upon a ratio of sensor readings taken at the two discrete wavelengths; determining that the temperature variations are outside a threshold range of values; and thereafter, adjusting subsequent scans of the energy source across or proximate the area of the build plane.
    Type: Application
    Filed: March 26, 2020
    Publication date: September 17, 2020
    Applicant: Sigma Labs, Inc.
    Inventors: Darren Beckett, Scott Betts, Martin Piltch, R. Bruce Madigan, Lars Jacquemetton, Glenn Wikle, Mark J. Cola, Vivek R. Dave, Alberto M. Castro, Roger Frye
  • Patent number: 10639745
    Abstract: This disclosure describes various methods and apparatus for characterizing an additive manufacturing process. A method for characterizing the additive manufacturing process can include generating scans of an energy source across a build plane; measuring an amount of energy radiated from the build plane during each of the scans using an optical sensing system that monitors two discrete wavelengths associated with a blackbody radiation curve of the layer of powder; determining temperature variations for an area of the build plane traversed by the scans based upon a ratio of sensor readings taken at the two discrete wavelengths; determining that the temperature variations are outside a threshold range of values; and thereafter, adjusting subsequent scans of the energy source across or proximate the area of the build plane.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: May 5, 2020
    Assignee: SIGMA LABS, INC.
    Inventors: Darren Beckett, Scott Betts, Martin Piltch, R. Bruce Madigan, Lars Jacquemetton, Glenn Wikle, Mark J. Cola, Vivek R. Dave, Alberto M. Castro, Roger Frye
  • Publication number: 20190255614
    Abstract: This disclosure describes an additive manufacturing system that includes a build plane having a first region and a second region. Multiple energy source can be positioned above the build plane and configured to direct energy into the first and second regions of the build plane. The system includes optical sensors configured to monitor an intensity of light emitted from the energy sources. A processor associated with the additive manufacturing system is configured to adjust the sensor outputs in response to the energy sources coming into close proximity.
    Type: Application
    Filed: February 21, 2019
    Publication date: August 22, 2019
    Applicant: Sigma Labs, Inc.
    Inventors: R. Bruce Madigan, Mark J. Cola, Scott Betts, Darren Beckett, Alberto M. Castro, Lars Jacquemetton, Martin Piltch
  • Publication number: 20190255654
    Abstract: This disclosure describes various methods and apparatus for characterizing an additive manufacturing process. A method for characterizing the additive manufacturing process can include generating scans of an energy source across a build plane; measuring an amount of energy radiated from the build plane during each of the scans using an optical sensing system that monitors two discrete wavelengths associated with a blackbody radiation curve of the layer of powder; determining temperature variations for an area of the build plane traversed by the scans based upon a ratio of sensor readings taken at the two discrete wavelengths; determining that the temperature variations are outside a threshold range of values; and thereafter, adjusting subsequent scans of the energy source across or proximate the area of the build plane.
    Type: Application
    Filed: February 21, 2019
    Publication date: August 22, 2019
    Applicant: Sigma Labs, Inc.
    Inventors: Darren Beckett, Scott Betts, Martin Piltch, R. Bruce Madigan, Lars Jacquemetton, Glenn Wikle, Mark J. Cola, Vivek R. Dave, Alberto M. Castro, Roger Frye
  • Publication number: 20110042585
    Abstract: System and method for analyzing a sample for the presence of an analyte in a sample, the system comprising a sample holder for containing the sample; an excitation source in optical communication with the sample, wherein radiation from the excitation source is directed to the sample, and wherein the radiation induces a fluorescence signal; and at least one linear array comprising a proximal end disposed in proximity to the sample holder and an end port distal from the proximal end; a plurality of optical fibers extending from the proximal end to the end port and having a first end and a second end, wherein the first ends of the individual optical fibers are substantially coplanar and adjacent to one another, and wherein the second ends of the optical fibers form a non-linearly arranged bundle, and wherein the plurality of optical fibers transmits the fluorescent signal from the proximal end to the end port; and an end port assembly optically coupled to the end port, the end port assembly comprising a single p
    Type: Application
    Filed: August 25, 2010
    Publication date: February 24, 2011
    Applicant: LOS ALAMOS NATIONAL SECURITY, LLC
    Inventors: Martin Piltch, Perry Gray, Robert W. Carpenter, II, Richard Rubenstein
  • Patent number: 7847941
    Abstract: A system for analyzing a sample for the presence of an analyte in a sample. The system includes a sample holder for containing the sample; an excitation source, such as a laser, and at least one linear array radially disposed about the sample holder. Radiation from the excitation source is directed to the sample, and the radiation induces fluorescent light in the sample. Each linear array includes a plurality of fused silica optical fibers that receive the fluorescent light and transmits a fluorescent light signal from the first end to an optical end port of the linear array. An end port assembly having a photo-detector is optically coupled to the optical end port. The photo-detector detects the fluorescent light signal and converts the fluorescent light signal into an electrical signal.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: December 7, 2010
    Assignee: Los Alamos National Security, LLC
    Inventors: Robert W. Carpenter, II, Richard Rubenstein, Martin Piltch, Perry Gray
  • Publication number: 20070139652
    Abstract: A system for analyzing a sample for the presence of an analyte in a sample. The system includes a sample holder for containing the sample; an excitation source, such as a laser, and at least one linear array radially disposed about the sample holder. Radiation from the excitation source is directed to the sample, and the radiation induces fluorescent light in the sample. Each linear array includes a plurality of fused silica optical fibers that receive the fluorescent light and transmits a fluorescent light signal from the first end to an optical end port of the linear array. An end port assembly having a photo-detector is optically coupled to the optical end port. The photo-detector detects the fluorescent light signal and converts the fluorescent light signal into an electrical signal.
    Type: Application
    Filed: December 5, 2006
    Publication date: June 21, 2007
    Inventors: Robert Carpenter, Richard Rubenstein, Martin Piltch, Perry Gray