Patents by Inventor Martin Samayoa

Martin Samayoa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for cleaning a substrate and computer program product
    Patent number: 10898932
    Abstract: A method and an apparatus for cleaning a substrate having at least one surface having a residue to be removed thereon is described. The method comprises: scanning at least an area of the surface having the residue thereon with laser light to thereby heat the surface and the residue; controlling the heating so that a part of the residue first liquefies such that the liquefied part of the residue starts flowing towards the solid part of the residue, thereby forming a meniscus with the solid part of the residue and accumulating in part on top of the solid part, the thus generated thicker layer of residue absorbing further heat to be decomposed or vaporized.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: January 26, 2021
    Assignee: SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KG
    Inventors: Uwe Dietze, Habib Hichri, Seongkuk Lee, Davide Dattilo, Martin Samayoa
  • Treatment head, treatment system and method for treating a local surface area of a substrate
    Patent number: 10722925
    Abstract: A treatment head for treating a surface area of a substrate includes a housing having a main surface configured to be arranged adjacent to and facing the surface area of the substrate to be treated. An exhaust opening in the main surface of the housing is connectable to an exhaust device via an exhaust gas path formed at least in part in the housing. A radiative heater is arranged in the housing to emit heat radiation through a radiation opening in the main surface. A plasma source is arranged in the housing to emit a plasma jet through a plasma exit opening in the main surface. An outlet opening in the main surface of the housing is connectable to a gas source via an gas path formed at least in part in the housing. The centers of the exhaust opening, the radiation opening, the plasma exit opening, and the outlet opening are arranged in the above order along a first direction of the main surface.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: July 28, 2020
    Assignee: SUSS MICRO TEC PHOTOMASK EQUIPMENT GMBH & CO KG
    Inventors: Uwe Dietze, Martin Samayoa
  • Apparatus and method for cleaning a partial area of a substrate
    Patent number: 10416575
    Abstract: An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described.
    Type: Grant
    Filed: November 16, 2016
    Date of Patent: September 17, 2019
    Assignee: SUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO. KG
    Inventors: Davide Dattilo, Uwe Dietze, Martin Samayoa
  • METHOD AND APPARATUS FOR CLEANING A SUBSTRATE AND COMPUTER PROGRAM PRODUCT
    Publication number: 20190247896
    Abstract: A method and an apparatus for cleaning a substrate having at least one surface having a residue to be removed thereon is described. The method comprises: scanning at least an area of the surface having the residue thereon with laser light to thereby heat the surface and the residue; controlling the heating so that a part of the residue first liquefies such that the liquefied part of the residue starts flowing towards the solid part of the residue, thereby forming a meniscus with the solid part of the residue and accumulating in part on top of the solid part, the thus generated thicker layer of residue absorbing further heat to be decomposed or vaporized.
    Type: Application
    Filed: February 12, 2018
    Publication date: August 15, 2019
    Inventors: Uwe Dietze, Habib Hichri, Lee Seongklik, Davide Dattilo, Martin Samayoa
  • TREATMENT HEAD, TREATMENT SYSTEM AND METHOD FOR TREATING A LOCAL SURFACE AREA OF A SUBSTRATE
    Publication number: 20190168269
    Abstract: A treatment head for treating a surface area of a substrate includes a housing having a main surface configured to be arranged adjacent to and facing the surface area of the substrate to be treated. An exhaust opening in the main surface of the housing is connectable to an exhaust device via an exhaust gas path formed at least in part in the housing. A radiative heater is arranged in the housing to emit heat radiation through a radiation opening in the main surface. A plasma source is arranged in the housing to emit a plasma jet through a plasma exit opening in the main surface. An outlet opening in the main surface of the housing is connectable to a gas source via an gas path formed at least in part in the housing. The centers of the exhaust opening, the radiation opening, the plasma exit opening, and the outlet opening are arranged in the above order along a first direction of the main surface.
    Type: Application
    Filed: December 4, 2017
    Publication date: June 6, 2019
    Inventors: Uwe Dietze, Martin Samayoa
  • APPARATUS AND METHOD FOR CLEANING A PARTIAL AREA OF A SUBSTRATE
    Publication number: 20180136573
    Abstract: An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described.
    Type: Application
    Filed: November 16, 2016
    Publication date: May 17, 2018
    Inventors: Davide Dattilo, Uwe Dietze, Martin Samayoa