Patents by Inventor Martin Tran
Martin Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10128144Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.Type: GrantFiled: May 19, 2017Date of Patent: November 13, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Mehran Behdjat, Aaron Muir Hunter, Joseph M. Ranish, Norman Tam, Jeffrey Tobin, Jiping Li, Martin Tran
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Publication number: 20170263493Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.Type: ApplicationFiled: May 19, 2017Publication date: September 14, 2017Inventors: Mehran BEHDJAT, Aaron Muir HUNTER, Joseph M. RANISH, Norman TAM, Jeffrey TOBIN, Jiping LI, Martin TRAN
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Patent number: 9659809Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.Type: GrantFiled: June 21, 2016Date of Patent: May 23, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Mehran Behdjat, Aaron Muir Hunter, Joseph M. Ranish, Norman Tam, Jeffrey Tobin, Jiping Li, Martin Tran
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Publication number: 20160300752Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.Type: ApplicationFiled: June 21, 2016Publication date: October 13, 2016Inventors: Mehran BEHDJAT, Aaron Muir HUNTER, Joseph M. RANISH, Norman TAM, Jeffrey TOBIN, Jiping LI, Martin TRAN
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Patent number: 9385004Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.Type: GrantFiled: June 6, 2014Date of Patent: July 5, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Mehran Behdjat, Aaron Muir Hunter, Joseph M. Ranish, Norman Tam, Jeffrey Tobin, Jiping Li, Martin Tran
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Publication number: 20150050819Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.Type: ApplicationFiled: June 6, 2014Publication date: February 19, 2015Inventors: Mehran BEHDJAT, Aaron Muir HUNTER, Joseph M. RANISH, Norman TAM, Jeffrey TOBIN, Jiping LI, Martin TRAN
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Patent number: 7842838Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus.Type: GrantFiled: August 21, 2009Date of Patent: November 30, 2010Assignee: Anadys Pharmaceuticals, Inc.Inventors: Stephen E. Webber, Frank Ruebsam, Martin Tran, Peter Dragovich, Liansheng Li, Douglas Eric Murphy, David Kucera, Zhongxiang Sun, Chinh Viet Tran
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Publication number: 20100193154Abstract: Methods for cooling a substrate are provided herein. In some embodiments, a method for cooling a substrate includes heating a substrate in a process chamber from an introductory temperature to a peak temperature of greater than about 900 degrees Celsius; and cooling the substrate from within about 50 degrees Celsius of the peak temperature by moving the substrate at a rate of at least about 3 millimeters/second in a direction normal to an upper surface of the substrate. In some embodiments, cooling the substrate by moving the substrate further comprises moving the substrate to a first position having a first distance from an upper surface of the process chamber; and subsequently moving the substrate to a second position having a second distance that is further away from the upper surface than the first distance. In some embodiments, a residence time proximate the peak temperature is about 0.6 seconds or less.Type: ApplicationFiled: January 27, 2010Publication date: August 5, 2010Applicant: APPLIED MATERIALS, INC.Inventors: WOLFGANG R. ADERHOLD, LEONID M. TERTITSKI, AARON MUIR HUNTER, MARTIN TRAN
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Publication number: 20090312570Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus.Type: ApplicationFiled: August 21, 2009Publication date: December 17, 2009Applicant: Anadys Pharmaceuticals, IncInventors: Stephen E. Webber, Frank Ruebsam, Martin Tran, Peter Dragovich, Liansheng Li, Douglas E. Murphy, David Kucera, Zhongxiang Sun, Chinh V. Tran
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Patent number: 7582754Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus.Type: GrantFiled: November 6, 2008Date of Patent: September 1, 2009Assignee: Anadys Pharmaceuticals, Inc.Inventors: Stephen E. Webber, Frank Ruebsam, Martin Tran, Peter Dragovich, Liansheng Li, Douglas Eric Murphy, David Kucera, Zhongxiang Sun, Chinh Viet Tran
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Publication number: 20090105473Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus.Type: ApplicationFiled: November 6, 2008Publication date: April 23, 2009Applicant: ANADYS PHARMACEUTICALS, INC.Inventors: Stephen E. Webber, Frank Ruebsam, Martin Tran, Peter Dragovich, Liansheng Li, Douglas E. Murphy, David Kucera, Zhongxiang Sun, Chinh V. Tran
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Patent number: 7462611Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds of Formula I and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus: wherein R4 is selected from Ring A is 5 or 6- membered aryl or heterocyclyl, and the remaining substituents are defined herein.Type: GrantFiled: June 21, 2007Date of Patent: December 9, 2008Assignee: Anadys Pharmaceuticals, Inc.Inventors: Frank Ruebsam, Martin Tran, Stephen E. Webber, Peter Dragovich, Liansheng Li, Douglas Murphy, David Kucera, Zhongxiang Sun, Chinh Viet Tran
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Publication number: 20080031852Abstract: The invention is directed to pyrro[1,2-b]pyridazinone compounds and pharmaceutical compositions containing such compounds that are useful in treating infections by hepatitis C virus.Type: ApplicationFiled: June 21, 2007Publication date: February 7, 2008Applicant: Anadys Pharmaceuticals, Inc.Inventors: Stephen Webber, Frank Ruebsam, Martin Tran, Peter Dragovich, Liansheng Li, Douglas Murphy, David Kucera, Zhongxiang Sun, Chinh Tran