Patents by Inventor Martin Trocha
Martin Trocha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10676454Abstract: A process produces a (meth)acrylate ester mixture. The process includes reacting a glycerol formal isomer mixture with an alkyl (meth)acrylate in the presence of a catalyst.Type: GrantFiled: January 30, 2017Date of Patent: June 9, 2020Assignee: Evonik Operations GmbHInventors: Silvia Beyer, Gaurang Dave, Hans-Jürgen Dillmann, Volker Herzog, Joachim Knebel, Ralf Merbach, Thorben Schütz, Martin Trocha, Sabine Kömmelt, Patrik Hartmann
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Publication number: 20190031638Abstract: A process produces a (meth)acrylate ester mixture. The process includes reacting a glycerol formal isomer mixture with an alkyl (meth)acrylate in the presence of a catalyst.Type: ApplicationFiled: January 30, 2017Publication date: January 31, 2019Applicant: Evonik Röhm GmbHInventors: Silvia BEYER, Gaurang DAVE, Hans-Jürgen DILLMANN, Volker HERZOG, Joachim KNEBEL, Ralf MERBACH, Thorben SCHÜTZ, Martin TROCHA, Sabine KÖMMELT, Patrik HARTMANN
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Patent number: 10023470Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.Type: GrantFiled: April 25, 2016Date of Patent: July 17, 2018Assignee: EVONIK DEGUSSA GMBHInventors: Imad Moussallem, Juergen Erwin Lang, Hartwig Rauleder, Martin Trocha, Nicole Brausch
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Patent number: 9561965Abstract: The present invention relates to a continuous process for hydrogenating halogen-containing silane compounds having at least three silicon atoms, in which at least one halogen-containing silane compound having at least three silicon atoms and at least one hydrogenating agent are converted continuously to form at least one hydridosilane compound having at least 3 silicon atoms and oxidized hydrogenating agent, and wherein oxidized hydrogenating agent is withdrawn and reduced, and the reaction product of this reduction reaction is sent back to the hydrogenation, to the hydridosilane compounds obtainable by this process and to the use thereof.Type: GrantFiled: November 27, 2013Date of Patent: February 7, 2017Assignee: Evonik Degussa GmbHInventors: Min-Zae Oh, Jens Haubrock, Thorsten Schwaertzke, Imad Moussallem, Martin Trocha
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Publication number: 20160318768Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.Type: ApplicationFiled: April 25, 2016Publication date: November 3, 2016Applicant: Evonik Degussa GmbHInventors: Imad MOUSSALLEM, Juergen Erwin LANG, Hartwig RAULEDER, Martin TROCHA, Nicole BRAUSCH
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Publication number: 20150307363Abstract: The present invention relates to a continuous process for hydrogenating halogen-containing silane compounds having at least three silicon atoms, in which at least one halogen-containing silane compound having at least three silicon atoms and at least one hydrogenating agent are converted continuously to form at least one hydridosilane compound having at least 3 silicon atoms and oxidized hydrogenating agent, and wherein oxidized hydrogenating agent is withdrawn and reduced, and the reaction product of this reduction reaction is sent back to the hydrogenation, to the hydridosilane compounds obtainable by this process and to the use thereof.Type: ApplicationFiled: November 27, 2013Publication date: October 29, 2015Applicant: Evoniki Degussa GmbHInventors: Min-Zae OH, Jens HAUBROCK, Thorsten SCHWAERTZKE, Imad MOUSSALLEM, Martin TROCHA
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Patent number: 9017630Abstract: The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SinX2n+2 (with n?3 and X?F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'aR?bYc with a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R? and/or R? are —C1-C12 alkyl, —C1-C12 aryl, —C1-C12 aralkyl, —C1-C12 aminoalkyl, —C1-C12 aminoaryl, —C1-C12 aminoaralkyl, and/or two or three groups R, R? and R? (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R? or R? is unequal —CH3 and/or wherein bb) R and R? and/or R?' (if c=1) are —C1-C12 alkylene, —C1-C12 arylene, —C1-C12 aralkylene, —C1-C12 heteroalkylene, —C1-C12 heteroarylene, —C1-C12 heteroaralkylene and/or —N?, or cc) (if a=b=c=0) R??C-R?? (with R???—C1-C10 alkyl, —C1-C10 aryl and/or —C1-C10 aralkyl), while forming a mixture comprising at least one halosilane of the generic formula SType: GrantFiled: November 8, 2010Date of Patent: April 28, 2015Assignee: Evonik Degussa GmbHInventors: Stephan Wieber, Matthias Patz, Martin Trocha, Hartwig Rauleder, Ekkehard Mueh, Harald Stueger, Christoph Walkner
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Patent number: 8889009Abstract: The present invention relates to a process for purifying low molecular weight hydridosilane solutions, in which a solution to be purified comprising a) at least one low molecular weight hydridosilane, b) at least one solvent and c) at least one impurity selected from the group of the compounds having at least 20 silicon atoms and/or the group of the homogeneous catalyst systems is subjected to a crossflow membrane process with at least one membrane separation step using a permeation membrane.Type: GrantFiled: October 9, 2009Date of Patent: November 18, 2014Assignee: Evonik Degussa GmbHInventors: Nicole Brausch, Goetz Baumgarten, Guido Stochniol, Yuecel Oenal, Martin Trocha
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Patent number: 8741253Abstract: Process for preparing higher hydridosilanes of the general formula H—(SiH2)n—H where n?2, in which—one or more lower hydridosilanes—hydrogen, and—one or more transition metal compounds comprising elements of transition group VIII of the Periodic Table and the lanthanides are reacted at a pressure of more than 5 bar absolute, subsequently depressurized and the higher hydridosilanes are separated off from the reaction mixture obtained.Type: GrantFiled: May 25, 2009Date of Patent: June 3, 2014Assignee: Evonik Degussa GmbHInventors: Nicole Brausch, Andre Ebbers, Guido Stochniol, Martin Trocha, Yücel Önal, Jörg Sauer, Bernhard Stützel, Dorit Wolf, Harald Stüger
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Publication number: 20120214005Abstract: The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SinX2n+2 (with n?3 and X?F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'aR?bYc with a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R? and/or R? are —C1-C12 alkyl, —C1-C12 aryl, —C1-C12 aralkyl, —C1-C12 aminoalkyl, —C1-C12 aminoaryl, —C1-C12 aminoaralkyl, and/or two or three groups R, R? and R? (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R? or R? is unequal —CH3 and/or wherein bb) R and R? and/or R?' (if c=1) are —C1-C12 alkylene, —C1-C12 arylene, —C1-C12 aralkylene, —C1-C12 heteroalkylene, —C1-C12 heteroarylene, —C1-C12 heteroaralkylene and/or —N?, or cc) (if a=b=c=0) R??C-R?? (with R???—C1-C10 alkyl, —C1-C10 aryl and/or —C1-C10 aralkyl), while forming a mixture comprising at least one halosilane of the generic formula SType: ApplicationFiled: November 8, 2010Publication date: August 23, 2012Applicant: Evonik Degussa GmbHInventors: Stephan Wieber, Matthias Patz, Martin Trocha, Hartwig Rauleder, Ekkehard Mueh, Harald Stueger, Christoph Walkner
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Publication number: 20110268642Abstract: The present invention relates to a process for purifying low molecular weight hydridosilane solutions, in which a solution to be purified comprising a) at least one low molecular weight hydridosilane, b) at least one solvent and c) at least one impurity selected from the group of the compounds having at least 20 silicon atoms and/or the group of the homogeneous catalyst systems is subjected to a crossflow membrane process with at least one membrane separation step using a permeation membrane.Type: ApplicationFiled: October 9, 2009Publication date: November 3, 2011Applicant: EVONIK DEGUSSA GmbHInventors: Nicole Brausch, Goetz Baumgarten, Guido Stochniol, Yuecel Oenal, Martin Trocha
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Patent number: 8043909Abstract: The present invention provides a porous semiconductive structure, characterized in that the structure has an electrical conductivity of 5·10?8 S·cm?1 to 10 S·cm?1, and an activation energy of the electrical conductivity of 0.1 to 700 meV, and a solid fraction of 30 to 60% by volume, and a pore size of 1 nm to 500 nm, the solid fraction having at least partly crystalline doped constituents which are bonded to one another via sinter necks and have sizes of 5 nm to 500 nm and a spherical and/or ellipsoidal shape, which comprise the elements silicon, germanium or an alloy of these elements, and also a process for producing a porous semiconductive structure, characterized in that A. doped semimetal particles are obtained, and then B. a dispersion is obtained from the semimetal particles obtained after step A, and then C. a substrate is coated with the dispersion obtained after step B, and then D. the layer obtained after step C is treated by means of a solution of hydrogen fluoride in water, and then E.Type: GrantFiled: March 21, 2008Date of Patent: October 25, 2011Assignee: Evonik Degussa GmbHInventors: André Ebbers, Martin Trocha, Robert Lechner, Martin S. Brandt, Martin Stutzmann, Hartmut Wiggers
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Publication number: 20110189072Abstract: Process for preparing higher hydridosilanes of the general formula H—(SiH2)n—H where n?2, in which—one or more lower hydridosilanes—hydrogen, and—one or more transition metal compounds comprising elements of transition group VIII of the Periodic Table and the lanthanides are reacted at a pressure of more than 5 bar absolute, subsequently depressurized and the higher hydridosilanes are separated off from the reaction mixture obtained.Type: ApplicationFiled: May 25, 2009Publication date: August 4, 2011Applicant: Evonik Degussa GmbHInventors: Nicole Brausch, Andre Ebbers, Guido Stochniol, Martin Trocha, Yücel Önal, Jörg Sauer, Bernhard Stützel, Dorit Wolf, Harald Stüger
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Publication number: 20100024614Abstract: A method for cutting and/or punching material in which abrasive particles are present within and/or on the surface of a substrate is provided. The material cut or punched is useful as a ceramic separator for electrochemical applications including capacitors, supercapacitors, batteries, lithium ion batteries and lithium metal batteries.Type: ApplicationFiled: July 22, 2009Publication date: February 4, 2010Applicant: EVONIK DEGUSSA GmbHInventors: Friedemann REX, Matthias Pascaly, Martin Trocha, Christian Hying
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Publication number: 20090026458Abstract: The present invention provides a porous semiconductive structure, characterized in that the structure has an electrical conductivity of 5·10?8 S·cm?1 to 10 S·cm?1, and an activation energy of the electrical conductivity of 0.1 to 700 meV, and a solid fraction of 30 to 60% by volume, and a pore size of 1 nm to 500 nm, the solid fraction having at least partly crystalline doped constituents which are bonded to one another via sinter necks and have sizes of 5 nm to 500 nm and a spherical and/or ellipsoidal shape, which comprise the elements silicon, germanium or an alloy of these elements, and also a process for producing a porous semiconductive structure, characterized in that A. doped semimetal particles are obtained, and then B. a dispersion is obtained from the semimetal particles obtained after step A, and then C. a substrate is coated with the dispersion obtained after step B, and then D. the layer obtained after step C is treated by means of a solution of hydrogen fluoride in water, and then E.Type: ApplicationFiled: March 21, 2008Publication date: January 29, 2009Applicant: EVONIK DEGUSSA GmbHInventors: Andre EBBERS, Martin TROCHA, Robert LECHNER, Martin S. BRANDT, Martin STUTZMANN, Hartmut WIGGERS
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Patent number: 6960699Abstract: The invention relates to a process for preparing alcohols by hydroformylation of olefins or olefin mixtures, separation from the catalyst and subsequent hydrogenation, with an extraction being carried out after removal of the catalyst and before the hydrogenation of the aldehydes.Type: GrantFiled: March 8, 2003Date of Patent: November 1, 2005Assignee: Oxeno Olefinchemie GmbHInventors: Walter Tötsch, Detlef Arnoldi, Alfred Kaizik, Martin Trocha
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Publication number: 20050171389Abstract: The invention relates to a process for preparing alcohols by hydroformylation of olefins or olefin mixtures, separation from the catalyst and subsequent hydrogenation, with an extraction being carried out after removal of the catalyst and before the hydrogenation of the aldehydes.Type: ApplicationFiled: March 8, 2003Publication date: August 4, 2005Applicant: OXENO OLEFINCHEMIE GMBHInventors: Walter Totsch, Detlef Arnoldi, Alfred Kaizik, Martin Trocha
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Patent number: 6720457Abstract: Olefins having from 5 to 24, in particular from 5 to 12, carbon atoms are hydroformylated by reacting an olefin or a mixture of olefins in the presence of an unmodified cobalt catalyst in a single-stage process in a reactor at a temperature of from 100° C. to 220° C. and a pressure of from 100 bar to 400 bar, to obtain an aldehyde, an alcohol or a mixture thereof. An aqueous bottom phase and an organic phase are present in the reactor, the aqueous bottom phase is mixed with the organic phase, and a concentration of the cobalt catalyst, calculated as metallic cobalt, in the aqueous bottom phase is in the range from 0.4 to 1.7% by mass based on the total weight of the aqueous bottom phase. A level of the aqueous bottom phase in the reactor is kept constant during steady-state operation.Type: GrantFiled: July 24, 2002Date of Patent: April 13, 2004Assignee: Oxeno Olefinchemie GmbHInventors: Stefan Drees, Bernhard Scholz, Alfred Kaizik, Walter Toetsch, Wilfried Bueschken, Martin Trocha
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Publication number: 20030032843Abstract: Olefins having from 5 to 24, in particular from 5 to 12, carbon atoms are hydroformylated by reacting an olefin or a mixture of olefins in the presence of an unmodified cobalt catalyst in a single-stage process in a reactor at a temperature of from 100° C. to 220° C. and a pressure of from 100 bar to 400 bar, to obtain an aldehyde, an alcohol or a mixture thereof. An aqueous bottom phase and an organic phase are present in the reactor, the aqueous bottom phase is mixed with the organic phase, and a concentration of the cobalt catalyst, calculated as metallic cobalt, in the aqueous bottom phase is in the range from 0.4 to 1.7% by mass based on the total weight of the aqueous bottom phase. A level of the aqueous bottom phase in the reactor is kept constant during steady-state operation.Type: ApplicationFiled: July 24, 2002Publication date: February 13, 2003Applicant: OXENO OLEFINCHEMIE GMBHInventors: Stefan Drees, Bernhard Scholz, Alfred Kaizik, Walter Toetsch, Wilfried Bueschken, Martin Trocha
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Patent number: 6500991Abstract: Aldehydes are prepared by a process, which comprises: hydroformylating olefins having 3 to 21 carbon atoms under an atmosphere of CO/H2 in the presence of a rhodium catalyst in a hydroformylation reactor; and upon discharging the reaction product from the reactor, a) separating the discharged material into a gaseous phase and a liquid phase, b) separating the liquid phase into a top fraction containing unconverted olefins and aldehydes and a bottoms fraction containing the rhodium catalyst, and c) cooling the bottoms fraction below the temperature of the material discharged from the hydroformylation reactor and feeding a gas containing carbon monoxide into the bottoms fraction.Type: GrantFiled: September 25, 2001Date of Patent: December 31, 2002Assignee: Oxeno Olefinchemie GmbHInventors: Klaus-Diether Wiese, Martin Trocha, Dirk Röettger, Walter Töetsch, Alfred Kaizik, Wilfried Büschken