Patents by Inventor Martin Trocha

Martin Trocha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10676454
    Abstract: A process produces a (meth)acrylate ester mixture. The process includes reacting a glycerol formal isomer mixture with an alkyl (meth)acrylate in the presence of a catalyst.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: June 9, 2020
    Assignee: Evonik Operations GmbH
    Inventors: Silvia Beyer, Gaurang Dave, Hans-Jürgen Dillmann, Volker Herzog, Joachim Knebel, Ralf Merbach, Thorben Schütz, Martin Trocha, Sabine Kömmelt, Patrik Hartmann
  • Publication number: 20190031638
    Abstract: A process produces a (meth)acrylate ester mixture. The process includes reacting a glycerol formal isomer mixture with an alkyl (meth)acrylate in the presence of a catalyst.
    Type: Application
    Filed: January 30, 2017
    Publication date: January 31, 2019
    Applicant: Evonik Röhm GmbH
    Inventors: Silvia BEYER, Gaurang DAVE, Hans-Jürgen DILLMANN, Volker HERZOG, Joachim KNEBEL, Ralf MERBACH, Thorben SCHÜTZ, Martin TROCHA, Sabine KÖMMELT, Patrik HARTMANN
  • Patent number: 10023470
    Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: July 17, 2018
    Assignee: EVONIK DEGUSSA GMBH
    Inventors: Imad Moussallem, Juergen Erwin Lang, Hartwig Rauleder, Martin Trocha, Nicole Brausch
  • Patent number: 9561965
    Abstract: The present invention relates to a continuous process for hydrogenating halogen-containing silane compounds having at least three silicon atoms, in which at least one halogen-containing silane compound having at least three silicon atoms and at least one hydrogenating agent are converted continuously to form at least one hydridosilane compound having at least 3 silicon atoms and oxidized hydrogenating agent, and wherein oxidized hydrogenating agent is withdrawn and reduced, and the reaction product of this reduction reaction is sent back to the hydrogenation, to the hydridosilane compounds obtainable by this process and to the use thereof.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: February 7, 2017
    Assignee: Evonik Degussa GmbH
    Inventors: Min-Zae Oh, Jens Haubrock, Thorsten Schwaertzke, Imad Moussallem, Martin Trocha
  • Publication number: 20160318768
    Abstract: A controlled preparation of octachlorotrisilane and higher polychlorosilane such as DCTS and DCPS from monomeric chlorosilane, proceeds by exposing the chlorosilane to a nonthermal plasma and recycling chlorosilane that has not been converted to octachlorotrisilane into the plasma.
    Type: Application
    Filed: April 25, 2016
    Publication date: November 3, 2016
    Applicant: Evonik Degussa GmbH
    Inventors: Imad MOUSSALLEM, Juergen Erwin LANG, Hartwig RAULEDER, Martin TROCHA, Nicole BRAUSCH
  • Publication number: 20150307363
    Abstract: The present invention relates to a continuous process for hydrogenating halogen-containing silane compounds having at least three silicon atoms, in which at least one halogen-containing silane compound having at least three silicon atoms and at least one hydrogenating agent are converted continuously to form at least one hydridosilane compound having at least 3 silicon atoms and oxidized hydrogenating agent, and wherein oxidized hydrogenating agent is withdrawn and reduced, and the reaction product of this reduction reaction is sent back to the hydrogenation, to the hydridosilane compounds obtainable by this process and to the use thereof.
    Type: Application
    Filed: November 27, 2013
    Publication date: October 29, 2015
    Applicant: Evoniki Degussa GmbH
    Inventors: Min-Zae OH, Jens HAUBROCK, Thorsten SCHWAERTZKE, Imad MOUSSALLEM, Martin TROCHA
  • Patent number: 9017630
    Abstract: The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SinX2n+2 (with n?3 and X?F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'aR?bYc with a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R? and/or R? are —C1-C12 alkyl, —C1-C12 aryl, —C1-C12 aralkyl, —C1-C12 aminoalkyl, —C1-C12 aminoaryl, —C1-C12 aminoaralkyl, and/or two or three groups R, R? and R? (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R? or R? is unequal —CH3 and/or wherein bb) R and R? and/or R?' (if c=1) are —C1-C12 alkylene, —C1-C12 arylene, —C1-C12 aralkylene, —C1-C12 heteroalkylene, —C1-C12 heteroarylene, —C1-C12 heteroaralkylene and/or —N?, or cc) (if a=b=c=0) R??C-R?? (with R???—C1-C10 alkyl, —C1-C10 aryl and/or —C1-C10 aralkyl), while forming a mixture comprising at least one halosilane of the generic formula S
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: April 28, 2015
    Assignee: Evonik Degussa GmbH
    Inventors: Stephan Wieber, Matthias Patz, Martin Trocha, Hartwig Rauleder, Ekkehard Mueh, Harald Stueger, Christoph Walkner
  • Patent number: 8889009
    Abstract: The present invention relates to a process for purifying low molecular weight hydridosilane solutions, in which a solution to be purified comprising a) at least one low molecular weight hydridosilane, b) at least one solvent and c) at least one impurity selected from the group of the compounds having at least 20 silicon atoms and/or the group of the homogeneous catalyst systems is subjected to a crossflow membrane process with at least one membrane separation step using a permeation membrane.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: November 18, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Nicole Brausch, Goetz Baumgarten, Guido Stochniol, Yuecel Oenal, Martin Trocha
  • Patent number: 8741253
    Abstract: Process for preparing higher hydridosilanes of the general formula H—(SiH2)n—H where n?2, in which—one or more lower hydridosilanes—hydrogen, and—one or more transition metal compounds comprising elements of transition group VIII of the Periodic Table and the lanthanides are reacted at a pressure of more than 5 bar absolute, subsequently depressurized and the higher hydridosilanes are separated off from the reaction mixture obtained.
    Type: Grant
    Filed: May 25, 2009
    Date of Patent: June 3, 2014
    Assignee: Evonik Degussa GmbH
    Inventors: Nicole Brausch, Andre Ebbers, Guido Stochniol, Martin Trocha, Yücel Önal, Jörg Sauer, Bernhard Stützel, Dorit Wolf, Harald Stüger
  • Publication number: 20120214005
    Abstract: The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula SinX2n+2 (with n?3 and X?F, Cl, Br and/or I) with ii) at least one catalyst of the generic formula NRR'aR?bYc with a=0 or 1, b=0 or 1, and c=0 or 1, and formula (I), wherein aa) R, R? and/or R? are —C1-C12 alkyl, —C1-C12 aryl, —C1-C12 aralkyl, —C1-C12 aminoalkyl, —C1-C12 aminoaryl, —C1-C12 aminoaralkyl, and/or two or three groups R, R? and R? (if c=0) together form a cyclic or bicyclic, heteroaliphatic or heteroaromatic system including N, with the proviso that at least one group R, R? or R? is unequal —CH3 and/or wherein bb) R and R? and/or R?' (if c=1) are —C1-C12 alkylene, —C1-C12 arylene, —C1-C12 aralkylene, —C1-C12 heteroalkylene, —C1-C12 heteroarylene, —C1-C12 heteroaralkylene and/or —N?, or cc) (if a=b=c=0) R??C-R?? (with R???—C1-C10 alkyl, —C1-C10 aryl and/or —C1-C10 aralkyl), while forming a mixture comprising at least one halosilane of the generic formula S
    Type: Application
    Filed: November 8, 2010
    Publication date: August 23, 2012
    Applicant: Evonik Degussa GmbH
    Inventors: Stephan Wieber, Matthias Patz, Martin Trocha, Hartwig Rauleder, Ekkehard Mueh, Harald Stueger, Christoph Walkner
  • Publication number: 20110268642
    Abstract: The present invention relates to a process for purifying low molecular weight hydridosilane solutions, in which a solution to be purified comprising a) at least one low molecular weight hydridosilane, b) at least one solvent and c) at least one impurity selected from the group of the compounds having at least 20 silicon atoms and/or the group of the homogeneous catalyst systems is subjected to a crossflow membrane process with at least one membrane separation step using a permeation membrane.
    Type: Application
    Filed: October 9, 2009
    Publication date: November 3, 2011
    Applicant: EVONIK DEGUSSA GmbH
    Inventors: Nicole Brausch, Goetz Baumgarten, Guido Stochniol, Yuecel Oenal, Martin Trocha
  • Patent number: 8043909
    Abstract: The present invention provides a porous semiconductive structure, characterized in that the structure has an electrical conductivity of 5·10?8 S·cm?1 to 10 S·cm?1, and an activation energy of the electrical conductivity of 0.1 to 700 meV, and a solid fraction of 30 to 60% by volume, and a pore size of 1 nm to 500 nm, the solid fraction having at least partly crystalline doped constituents which are bonded to one another via sinter necks and have sizes of 5 nm to 500 nm and a spherical and/or ellipsoidal shape, which comprise the elements silicon, germanium or an alloy of these elements, and also a process for producing a porous semiconductive structure, characterized in that A. doped semimetal particles are obtained, and then B. a dispersion is obtained from the semimetal particles obtained after step A, and then C. a substrate is coated with the dispersion obtained after step B, and then D. the layer obtained after step C is treated by means of a solution of hydrogen fluoride in water, and then E.
    Type: Grant
    Filed: March 21, 2008
    Date of Patent: October 25, 2011
    Assignee: Evonik Degussa GmbH
    Inventors: André Ebbers, Martin Trocha, Robert Lechner, Martin S. Brandt, Martin Stutzmann, Hartmut Wiggers
  • Publication number: 20110189072
    Abstract: Process for preparing higher hydridosilanes of the general formula H—(SiH2)n—H where n?2, in which—one or more lower hydridosilanes—hydrogen, and—one or more transition metal compounds comprising elements of transition group VIII of the Periodic Table and the lanthanides are reacted at a pressure of more than 5 bar absolute, subsequently depressurized and the higher hydridosilanes are separated off from the reaction mixture obtained.
    Type: Application
    Filed: May 25, 2009
    Publication date: August 4, 2011
    Applicant: Evonik Degussa GmbH
    Inventors: Nicole Brausch, Andre Ebbers, Guido Stochniol, Martin Trocha, Yücel Önal, Jörg Sauer, Bernhard Stützel, Dorit Wolf, Harald Stüger
  • Publication number: 20100024614
    Abstract: A method for cutting and/or punching material in which abrasive particles are present within and/or on the surface of a substrate is provided. The material cut or punched is useful as a ceramic separator for electrochemical applications including capacitors, supercapacitors, batteries, lithium ion batteries and lithium metal batteries.
    Type: Application
    Filed: July 22, 2009
    Publication date: February 4, 2010
    Applicant: EVONIK DEGUSSA GmbH
    Inventors: Friedemann REX, Matthias Pascaly, Martin Trocha, Christian Hying
  • Publication number: 20090026458
    Abstract: The present invention provides a porous semiconductive structure, characterized in that the structure has an electrical conductivity of 5·10?8 S·cm?1 to 10 S·cm?1, and an activation energy of the electrical conductivity of 0.1 to 700 meV, and a solid fraction of 30 to 60% by volume, and a pore size of 1 nm to 500 nm, the solid fraction having at least partly crystalline doped constituents which are bonded to one another via sinter necks and have sizes of 5 nm to 500 nm and a spherical and/or ellipsoidal shape, which comprise the elements silicon, germanium or an alloy of these elements, and also a process for producing a porous semiconductive structure, characterized in that A. doped semimetal particles are obtained, and then B. a dispersion is obtained from the semimetal particles obtained after step A, and then C. a substrate is coated with the dispersion obtained after step B, and then D. the layer obtained after step C is treated by means of a solution of hydrogen fluoride in water, and then E.
    Type: Application
    Filed: March 21, 2008
    Publication date: January 29, 2009
    Applicant: EVONIK DEGUSSA GmbH
    Inventors: Andre EBBERS, Martin TROCHA, Robert LECHNER, Martin S. BRANDT, Martin STUTZMANN, Hartmut WIGGERS
  • Patent number: 6960699
    Abstract: The invention relates to a process for preparing alcohols by hydroformylation of olefins or olefin mixtures, separation from the catalyst and subsequent hydrogenation, with an extraction being carried out after removal of the catalyst and before the hydrogenation of the aldehydes.
    Type: Grant
    Filed: March 8, 2003
    Date of Patent: November 1, 2005
    Assignee: Oxeno Olefinchemie GmbH
    Inventors: Walter Tötsch, Detlef Arnoldi, Alfred Kaizik, Martin Trocha
  • Publication number: 20050171389
    Abstract: The invention relates to a process for preparing alcohols by hydroformylation of olefins or olefin mixtures, separation from the catalyst and subsequent hydrogenation, with an extraction being carried out after removal of the catalyst and before the hydrogenation of the aldehydes.
    Type: Application
    Filed: March 8, 2003
    Publication date: August 4, 2005
    Applicant: OXENO OLEFINCHEMIE GMBH
    Inventors: Walter Totsch, Detlef Arnoldi, Alfred Kaizik, Martin Trocha
  • Patent number: 6720457
    Abstract: Olefins having from 5 to 24, in particular from 5 to 12, carbon atoms are hydroformylated by reacting an olefin or a mixture of olefins in the presence of an unmodified cobalt catalyst in a single-stage process in a reactor at a temperature of from 100° C. to 220° C. and a pressure of from 100 bar to 400 bar, to obtain an aldehyde, an alcohol or a mixture thereof. An aqueous bottom phase and an organic phase are present in the reactor, the aqueous bottom phase is mixed with the organic phase, and a concentration of the cobalt catalyst, calculated as metallic cobalt, in the aqueous bottom phase is in the range from 0.4 to 1.7% by mass based on the total weight of the aqueous bottom phase. A level of the aqueous bottom phase in the reactor is kept constant during steady-state operation.
    Type: Grant
    Filed: July 24, 2002
    Date of Patent: April 13, 2004
    Assignee: Oxeno Olefinchemie GmbH
    Inventors: Stefan Drees, Bernhard Scholz, Alfred Kaizik, Walter Toetsch, Wilfried Bueschken, Martin Trocha
  • Publication number: 20030032843
    Abstract: Olefins having from 5 to 24, in particular from 5 to 12, carbon atoms are hydroformylated by reacting an olefin or a mixture of olefins in the presence of an unmodified cobalt catalyst in a single-stage process in a reactor at a temperature of from 100° C. to 220° C. and a pressure of from 100 bar to 400 bar, to obtain an aldehyde, an alcohol or a mixture thereof. An aqueous bottom phase and an organic phase are present in the reactor, the aqueous bottom phase is mixed with the organic phase, and a concentration of the cobalt catalyst, calculated as metallic cobalt, in the aqueous bottom phase is in the range from 0.4 to 1.7% by mass based on the total weight of the aqueous bottom phase. A level of the aqueous bottom phase in the reactor is kept constant during steady-state operation.
    Type: Application
    Filed: July 24, 2002
    Publication date: February 13, 2003
    Applicant: OXENO OLEFINCHEMIE GMBH
    Inventors: Stefan Drees, Bernhard Scholz, Alfred Kaizik, Walter Toetsch, Wilfried Bueschken, Martin Trocha
  • Patent number: 6500991
    Abstract: Aldehydes are prepared by a process, which comprises: hydroformylating olefins having 3 to 21 carbon atoms under an atmosphere of CO/H2 in the presence of a rhodium catalyst in a hydroformylation reactor; and upon discharging the reaction product from the reactor, a) separating the discharged material into a gaseous phase and a liquid phase, b) separating the liquid phase into a top fraction containing unconverted olefins and aldehydes and a bottoms fraction containing the rhodium catalyst, and c) cooling the bottoms fraction below the temperature of the material discharged from the hydroformylation reactor and feeding a gas containing carbon monoxide into the bottoms fraction.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: December 31, 2002
    Assignee: Oxeno Olefinchemie GmbH
    Inventors: Klaus-Diether Wiese, Martin Trocha, Dirk Röettger, Walter Töetsch, Alfred Kaizik, Wilfried Büschken