Abstract: A known method for homogenizing glass includes the following steps: providing a cylindrical blank composed of the glass, having a cylindrical outer surface which extends between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and moving the shear zone along the longitudinal axis of the blank. To reduce the risk of cracks and fractures during homogenizing, it is proposed that a thermal radiation dissipator is used that at least partially surrounds the shear zone, the lateral dimension of which in the direction of the longitudinal axis of the blank is greater than the shear zone and smaller than the length of the blank, the thermal radiation dissipator being moved synchronously with the shear zone along the longitudinal axis of the blank.

Abstract: A method for producing synthetic fused quartz is provided. The method includes evaporating a feedstock material which contains at least one polymerizable polyalkylsiloxane compound, and supplying the feedstock material vapor to a reaction zone, wherein the feedstock material vapor is converted by oxidation and/or by hydrolysis into SiO2 particles. The feedstock material vapor is passed through a membrane filter as a cleaning device to reduce the formation of gel, which is typically associated with the production of synthetic fused quartz.

Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt out of silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The silicon dioxide granulate is obtained by providing and processing a silicon dioxide powder. One aspect also relates to silicon dioxide granulate, which is obtained by providing a silicon dioxide powder and processing it. One aspect further relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

Abstract: A process for the production of a porous carbon product. The process includes the steps of (a) providing a substrate surface; (b) depositing silicon dioxide as a layer on the substrate surface, thereby obtaining a porous silicon di-oxide material; (c) contacting the porous silicon dioxide material on the substrate surface with a first carbon source thereby obtaining a first precursor comprising the porous silicon dioxide material and the first car-bon source; (d) heating the first precursor thereby obtaining a second precursor comprising the porous silicon dioxide material and carbon; and (e) at least partially removing the silicon dioxide in the second precursor, thereby obtaining the porous carbon product. Also disclosed are a porous carbon product and a device that uses a porous carbon product.

Abstract: A method for manufacturing quartz glass, wherein (a) an appropriate liquid starting material is evaporated by spraying it into a vertically arranged evaporation chamber, (b) the vaporous starting material is oxidized to form SiO2, and the SiO2is collected. The method is characterized in that the starting material to be evaporated is sprayed in on the bottom of the evaporation chamber and the vaporous starting material is removed at the top end of the evaporation chamber, wherein the evaporation chamber is designed such that components depositing in the chamber accumulate on the bottom of the evaporator and are sprayed once again, as well as an evaporator for applying the method.

Abstract: A method for producing synthetic fused quartz is provided. The method includes evaporating a feedstock material which contains at least one polymerizable polyalkylsiloxane compound, and supplying the feedstock material vapor to a reaction zone, wherein the feedstock material vapor is converted by oxidation and/or by hydrolysis into SiO2 particles. The feedstock material vapor is passed through a membrane filter as a cleaning device to reduce the formation of gel, which is typically associated with the production of synthetic fused quartz.

Abstract: One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

Abstract: A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m2/g. A device for carrying out the method is also provided.

Abstract: One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

Abstract: The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiO2 feedstock (105), converting the vaporized SiO2 feedstock (107) into SiO2 particles, separating the SiO2 particles, forming a soot body (200) and vitrifying the soot body (200). According to the invention, the vaporizing of the heated SiO2 feedstock (105) comprises an injection phase in an expansion chamber (125), in which the SiO2 feedstock (105) is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180° C.

Abstract: The invention describes a method for the manufacture of quartz glass that comprises not only doping with rare earth elements and/or transition metals, but also fluorination of the quartz glass. The method described presently allows the diffusion of the dopants during fluorination to be prevented. Moreover, the invention relates to the quartz glass that can be obtained according to the method according to the invention and the use thereof as laser-active quartz glass, for generating light-guiding structures, and in optical applications.

Abstract: The invention relates to a method for fluorinating a soot body. The method involves: a) providing a soot body, and b) treating the soot body with a gas mixture containing hydrogen and CnF2n+2 (n=1 or 2) at a temperature in the range of (1,280-n*250)° C. to (1,220-n*100)° C.

Abstract: A method for manufacturing quartz glass, wherein (a) an appropriate liquid starting material is evaporated by spraying it into a vertically arranged evaporation chamber, (b) the vaporous starting material is oxidized to form SiO2, and the SiO2 is collected. The method is characterized in that the starting material to be evaporated is sprayed in on the bottom of the evaporation chamber and the vaporous starting material is removed at the top end of the evaporation chamber, wherein the evaporation chamber is designed such that components depositing in the chamber accumulate on the bottom of the evaporator and are sprayed once again, as well as an evaporator for applying the method.

Abstract: One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

Abstract: A known method for producing synthetic quartz glass comprises: (a) reacting a carbonic silicon compound-containing raw material with oxygen in a reaction zone into SiO2 particles, (b) precipitating the SiO2 particles on a sedimentation area by forming a porous SiO2 soot body containing hydrogen and hydroxyl groups, (c) drying the porous SiO2 soot body, and (d) glazing to the synthetic quartz glass by heating the soot body up to a glazing temperature. In order to facilitate cost-efficient production of quartz glass by means of pyrolyzing or hydrolyzing a carbon-containing silicon compound using a carbon-containing raw material, the invention describes the production of a soot body with a carbon content within the range of 1 ppm by weight to 50 ppm by weight.

Abstract: One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

Abstract: The invention relates to a method for fluorinating a soot body. The method involves: a) providing a soot body, and b) treating the soot body with a gas mixture containing hydrogen and CnF2n+2 (n=1 or 2) at a temperature in the range of (1,280-n*250)° C. to (1,220-n* 100)° C.

Abstract: A method for producing quartz glass cylinders includes producing soot bodies using depositing burners to deposit SiO2 particles for mass deposition on a rotating substrate and vitrifying the soot bodies to form quartz glass cylinders. Prior to producing the soot bodies, the following steps are carried out: producing first and second test soot bodies, determining the density distribution of the first test soot body in the axial direction; vitrifying the second test soot body to generate a test quartz glass cylinder; determining the mass distribution of the test quartz glass cylinder in the axial direction; and setting the mass deposition of SiO2 particles to be deposited as a function of the axial mass distribution of the test quartz glass cylinder. As such, the mass distribution of the produced and vitrified soot bodies is improved and/or made more homogeneous relative to the axial mass distribution of the test quartz glass cylinder.

Abstract: The following method steps are known for producing cylindrical components from synthetic quartz glass containing fluorine: producing a SiO2 soot body, removing hydroxyl groups from the soot body, loading the soot body with fluorine, post-chlorinating the soot body loaded with fluorine, and vitrifying the soot body to form the cylindrical component.

Abstract: The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiO2 feedstock (105), converting the vaporized SiO2 feedstock (107) into SiO2 particles, separating the SiO2 particles, forming a soot body (200) and vitrifying the soot body (200). According to the invention, the vaporizing of the heated SiO2 feedstock (105) comprises an injection phase in an expansion chamber (125), in which the SiO2 feedstock (105) is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180° C.