Patents by Inventor Martinus Cornelis Maria Verhagen

Martinus Cornelis Maria Verhagen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170031250
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: October 13, 2016
    Publication date: February 2, 2017
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160370714
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: August 30, 2016
    Publication date: December 22, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin Augustinus Matheus VAN GOMPEL
  • Lithographic apparatus and device manufacturing method
    Patent number: 9507278
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: November 29, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik de Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 9488923
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: November 8, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Lithographic apparatus and device manufacturing method
    Patent number: 9436097
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: September 6, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
  • Source-collector device, lithographic apparatus, and device manufacturing method
    Patent number: 9411238
    Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: August 9, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
  • Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
    Patent number: 9268236
    Abstract: A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: February 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Igor Petrus Maria Bouchoms, Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Joost Jeroen Ottens, Martinus Cornelis Maria Verhagen, Yücel Kök, Johannes Van Es, Herman Boom, Franciscus Johannes Joseph Janssen
  • Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor
    Patent number: 9268242
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: February 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER
    Publication number: 20160048085
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Application
    Filed: October 13, 2015
    Publication date: February 18, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Erik Roelof LOOPSTRA, Aschwin Lodewijk Hendricus Johannes VERMEER, Jeroen Johannes Sophia Maria MERTENS, Christianus Gerardus Maria DE MOL, Marcel Johannus Elisabeth Hubertus MUITJENS, Antonius Johannus VAN DER NET, Joost Jeroen OTTENS, Johannes Anna QUAEDACKERS, Maria Elisabeth REUHMAN-HUISKEN, Marco Koert STAVENGA, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPA Y, Frederik Eduard DE JONG, Koen GOORMAN, Boris MENCHTCHIKOV, Herman BOOM, Stoyan NIHTIANOV, Richard MOERMAN, Martin Frans Pierre SMEETS, Bart Leonard Peter SCHOONDERMARK, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
  • Lithographic apparatus and device manufacturing method involving a heater
    Patent number: 9188880
    Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
    Type: Grant
    Filed: November 3, 2011
    Date of Patent: November 17, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Theodorus Petrus Maria Cadee, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150323876
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: July 22, 2015
    Publication date: November 12, 2015
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Joost Jeroen OTTENS, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Marco POLIZZI, Edwin Augustinus Matheus VAN GOMPEL, Johannes Petrus Maria SMEULERS, Stefan Philip Christiaan BELFROID, Herman VOGEL
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150205214
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Application
    Filed: April 1, 2015
    Publication date: July 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Marco Koert STAVENGA, Bob STREEFKERK, Martinus Cornelis Maria VERHAGEN, Lejla SEUNTIENS-GRUDA
  • Lithographic apparatus and device manufacturing method
    Patent number: 9025127
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: May 5, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150109593
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Application
    Filed: December 30, 2014
    Publication date: April 23, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin VAN GOMPEL
  • Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
    Patent number: 8958051
    Abstract: An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provide a gas to the second side of the membrane, the gas adapted to dissociate when dissolved in the liquid and an ion exchanger for the liquid downstream of the semi-permeable membrane.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: February 17, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Cornelis Maria Verhagen, Roelof Frederick De Graaf, Johannes Henricus Wilhelmus Jacobs, Franciscus Johannes Herman Maria Teunissen, Jurgen Benischek
  • Lithographic apparatus and device manufacturing method
    Patent number: 8953144
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: February 10, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Marco Koert Stavenga, Bob Streefkerk, Martinus Cornelis Maria Verhagen, Lejla Seuntiens-Gruda
  • Lithographic apparatus and device manufacturing method
    Patent number: 8934082
    Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: January 13, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel
  • SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
    Publication number: 20140375974
    Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.
    Type: Application
    Filed: January 10, 2013
    Publication date: December 25, 2014
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
  • Lithographic apparatus and device manufacturing method
    Patent number: 8902404
    Abstract: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: December 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Martinus Cornelis Maria Verhagen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140300883
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: May 8, 2014
    Publication date: October 9, 2014
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel