Patents by Inventor Martinus H. H. Hoeks

Martinus H. H. Hoeks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Position measuring system for use in lithographic apparatus
    Patent number: 6894261
    Abstract: A position measuring apparatus includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.
    Type: Grant
    Filed: December 20, 2000
    Date of Patent: May 17, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas J. M. Castenmiller, Andreas B G. Ariens, Martinus H. H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, YimBun P. Kwan
  • Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
    Patent number: 6875992
    Abstract: A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: April 5, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas J. M. Castenmiller, Andreas B. G. Ariens, Martinus H. H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, YimBun P. Kwan
  • Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
    Publication number: 20040211921
    Abstract: A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.
    Type: Application
    Filed: May 14, 2004
    Publication date: October 28, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas J.M. Castenmiller, Andreas B.G. Ariens, Martinus H.H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, Yim Bun P. Kwan
  • Position detection system for use in lithographic apparatus
    Publication number: 20010011712
    Abstract: A position detection apparatus comprises a radiation source mounted on an isolated reference frame and a two-dimensional detector mounted adjacent said radiation source. The object whose position is to be detected has a retro-reflector mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such apparatus can be combined in a system to measure the position of the object in all six degrees of freedom.
    Type: Application
    Filed: December 20, 2000
    Publication date: August 9, 2001
    Inventors: Thomas J.M. Castenmiller, Andreas B.G. Ariens, Martinus H.H. Hoeks, Patrick D. Vogelsang, Erik R. Loopstra, Yimbun P. Kwan