Patents by Inventor Martinus Hendricus Henricus Hoeks

Martinus Hendricus Henricus Hoeks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator
    Patent number: 9594304
    Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: March 14, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendricus Henricus Hoeks, Arno Jan Bleeker
  • Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
    Patent number: 9513561
    Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.
    Type: Grant
    Filed: March 16, 2012
    Date of Patent: December 6, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Arno Jan Bleeker, Martinus Hendricus Henricus Hoeks, Theodorus Petrus Maria Cadee
  • Lithographic apparatus and device manufacturing method
    Patent number: 9494869
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Lithography Apparatus, a Device Manufacturing Method, a Method Of Manufacturing an Attenuator
    Publication number: 20150062547
    Abstract: There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target.
    Type: Application
    Filed: February 5, 2013
    Publication date: March 5, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Martinus Hendricus Henricus Hoeks, Arno Jan Bleeker
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140340666
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Application
    Filed: December 5, 2012
    Publication date: November 20, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • LITHOGRAPHIC APPARATUS, METHOD FOR MAINTAINING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20140009746
    Abstract: A lithographic apparatus having a plurality of individually controllable radiation source units each providing a portion of a patterned beam of radiation, a control system configured to monitor a parameter of performance of each of the individually controllable radiation source units, and a replacement mechanism configured to replace one of the individually controllable radiation source units with a replacement unit responsive to the control system determining that a criterion has been met based on the monitored parameter of performance.
    Type: Application
    Filed: March 16, 2012
    Publication date: January 9, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Arno Jan Bleeker, Martinus Hendricus Henricus Hoeks, Theodorus Petrus Maria Cadee