Abstract: An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.

Abstract: An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.

Abstract: A lithographic method and apparatus for determining operational parameters of a maskless lithography tool. In an embodiment, an amount of data in a datapath of the maskless lithography system is reduced. A maximum value of at least one operational parameter of the maskless lithography system is determined responsive to the reduced amount of data in the datapath.

Abstract: A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.

Abstract: A lithographic method and apparatus used to pattern an object. An illumination source supplies a beam of radiation. A pattern generator forms a pattern to pattern a beam of radiation using the pattern data. A projection system projects the patterned beam onto a target portion of a substrate supported by a stage during an exposure operation. A control module determines a respective maximum operational parameter for the illumination source, the pattern generator, and/or the stage.

Abstract: A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.

Abstract: A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.