Patents by Inventor Martinus Hendrikus Leenders
Martinus Hendrikus Leenders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090027635Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).Type: ApplicationFiled: September 27, 2007Publication date: January 29, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
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Publication number: 20080007704Abstract: An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.Type: ApplicationFiled: May 17, 2007Publication date: January 10, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Leenders, Sjoerd Donders, Nicolaas Kate, Michel Riepen, Sergei Shulepov
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Publication number: 20070242245Abstract: A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.Type: ApplicationFiled: April 3, 2007Publication date: October 18, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Maurice Wijckmans, Martinus Agnes Cuijpers, Martinus Hendrikus Leenders, Frits Van Der Meulen, Joost Ottens, Theodorus Cadee, Frederik De Jong, Wilhelmus Franciscus Simons, Edwin Augustinus Van Gompel, Martin Smeets, Rob Jansen, Gerardus Adrianus Kusters, Martijn Van Baren
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Publication number: 20070243697Abstract: An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.Type: ApplicationFiled: April 12, 2006Publication date: October 18, 2007Applicant: ASML Netherlands B.V.Inventors: Martinus Hendrikus Leenders, Michel Riepen, Martin Bos
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Publication number: 20070114451Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: November 22, 2006Publication date: May 24, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Sebastiaan Maria Cornelissen, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Hernes Jacobs, Martinus Hendrikus Leenders, Jeroen Johannes Mertens, Bob Streefkerk, Jan-Gerard Van Der Toorn, Peter Smits, Franciscus Johannes Janssen, Michel Riepen
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Publication number: 20070110213Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.Type: ApplicationFiled: March 29, 2006Publication date: May 17, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Martinus Hendrikus Leenders, Nicolaas Kate, Nicolaas Kemper, Joost Ottens, Marcel Beckers, Johannes Smeulers, Michel Riepen, Sergei Shulepov
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Publication number: 20070109512Abstract: A barrier member is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.Type: ApplicationFiled: November 16, 2005Publication date: May 17, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Kate, Nicolaas Kemper, Martinus Hendrikus Leenders, Joost Ottens, Johannes Smeulers
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Publication number: 20060290908Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: ApplicationFiled: June 28, 2005Publication date: December 28, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Roelof De Graaf, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Martinus Hendrikus Leenders, Jeroen Johannes Mertens, Bob Streefkerk, Jan-Gerard Van Der Toorn, Michel Riepen
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Publication number: 20060250601Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.Type: ApplicationFiled: May 3, 2005Publication date: November 9, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Hans Jansen, Martinus Hendrikus Leenders, Paulus Martinus Liebregts, Jeroen Johannes Mertens, Jan-Gerard Van Der Toorn, Michel Riepen
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Publication number: 20060087630Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 29, 2005Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Kemper, Henrikus Cox, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Nicolaas Kate, Martinus Hendrikus Leenders, Jeroen Mertens, Frits Meulen, Joost Ottens, Franciscus Maria Teunissen, Jan-Gerard Toorn, Martinus Verhagen, Marco Polizzi, Edwin Augustinus Van Gompel, Johannes Smeulers, Stefan Belfroid
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Publication number: 20060072087Abstract: An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.Type: ApplicationFiled: October 1, 2004Publication date: April 6, 2006Applicant: ASML Netherlands B.V.Inventors: Jacob Frederik Klinkhamer, Anastasius Jacobus Bruinsma, Martinus Hendrikus Leenders, Hubert Van Mierlo
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Publication number: 20050218342Abstract: A lithographic apparatus includes a radiation source configured to provide radiation to an illumination system, the radiation source configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. A support is configured to support a patterning device, the patterning device is configured to impart the radiation with a pattern in its cross-section. A substrate table is configured to hold a substrate, and a projection system is configured to project the patterned radiation onto a target portion of a substrate. The first wavelength range is the primary wavelength of the lithographic apparatus. The second wavelength range is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.Type: ApplicationFiled: March 31, 2004Publication date: October 6, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Van Der Pasch, Marcel Hendrikus Beems, Martinus Hendrikus Leenders
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Publication number: 20050122490Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.Type: ApplicationFiled: December 8, 2003Publication date: June 9, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bernardus Luttikhuis, Pertrus Bartray, Wilhelmus Box, Martinus Hendrikus Leenders, Marc Maria Van Der Wijst