Abstract: A source magnet assembly for an ion source system of an ion implantation system. The source magnet assembly includes source magnetic poles that are operationally movable with respect to an arc chamber of the ion source system. In one example, the magnetic field produced by the source magnet is positionable in a two dimensional area. In another example, the magnetic field can be rotated. Some source magnet assemblies include plates that are slidable with respect to one another. The magnetic core is moved by moving the plates with respect to each other by a motorized force. With some assemblies, structures of the assembly are rotatable with respect to one another so that the core may be rotated around the arc chamber.

Abstract: A system for treating and removing toxic by-products of semiconductor plasma etching processes utilizes a collection box having various treatment chambers in seriatim. A heated inlet conducts a vaporous process stream into an expansion chamber where the gas is expanded. The expanded gas flows over a baffle weir into a packing chamber filled with plastic media spheres. In the upper reaches of the packing chamber but below the weir top, a deionized water atomizer sprays deionized water to humidify and cool the expanded gases which allows the water soluble toxic by-products, such as aluminum trichloride, to initially precipitate out and condense on the spheres. With continued water flow the by-products solubilize in the water and flow to an acid drain. Remaining vaporous gaseous exhaust products pass under a weir defining one side of the packing chamber up to an exhaust chamnber where a series of inclined staggered baffles and a strainer trap remove water from the gaseous exhaust and return it to the acid drain.