Patents by Inventor Marvin L. Love, Jr.

Marvin L. Love, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
    Patent number: 5151219
    Abstract: A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:(a) spin coating a photoresist solution onto a surface of a substrate, thereby applying a photoresist coating which comprises a uniform film over substantially all of said substrate surface except for unwanted photoresist material deposits at the peripheral areas of said surface;(b) contacting said peripheral area of the coated substrate with a sufficient amount of a solvent mixture comprising a mixture of ethyl lactate and methyl ethyl ketone present in a volume ratio of about 65:35 to about 25:75, respectively, to selectively dissolve said unwanted deposits without adversely affecting said uniform film; and(c) separating said dissolved deposits from said coated substrate.
    Type: Grant
    Filed: July 31, 1989
    Date of Patent: September 29, 1992
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Thomas E. Salamy, Marvin L. Love, Jr., Mark E. Towner
  • Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
    Patent number: 4886728
    Abstract: A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:(a) spin coating a photoresist solution onto a surface of a substrate, thereby applying a photoresist coating which comprises a uniform film over substantially all of said substrate surface except for unwanted photoresist material deposits at the peripheral areas of said surface;(b) contacting said peripheral area of the coated substrate with a sufficient amount of a solvent mixture comprising a mixture of ethyl lactate and methyl ethyl ketone present in a volume ratio of about 65:35 to about 25:75, respectively, to selectively dissolve said unwanted deposits without adversely affecting said uniform film; and(c) separating said dissolved deposits from said coated substrate.
    Type: Grant
    Filed: January 6, 1988
    Date of Patent: December 12, 1989
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Thomas E. Salamy, Marvin L. Love, Jr., Mark E. Towner